World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
52
Citations
8707
World Ranking
9642
National Ranking
2330

Overview

Andrew J. Kellock is affiliated with IBM in the United States. Their work is situated within the broader research environment of one of the leading technology companies worldwide.

There are no recent publications listed for Andrew J. Kellock, and also no records of co-authors or frequent venues associated with their research activities. Similarly, no specific fields or subfields of study or main research topics have been identified from the available data.

Information about book publications or any awards received is not available. The absence of this data suggests that either this information has not been documented or the scientist's profile is relatively limited in publicly accessible records.

Given the available data, Andrew J. Kellock's research profile is primarily defined by the association with IBM (United States) and there are no further documented contributions at this time.

Best Publications

  • Epitaxial growth and properties of ferromagnetic co-doped TiO2 anatase

    S. A. Chambers;S. Thevuthasan;R. F. C. Farrow;R. F. Marks

  • A High‐Efficiency Solution‐Deposited Thin‐Film Photovoltaic Device

    David B. Mitzi;Min Yuan;Wei Liu;Andrew J. Kellock

  • Temperature dependent magnetic properties of highly chemically ordered Fe55−xNixPt45L10 films

    J.-U. Thiele;K. R. Coffey;M. F. Toney;J. A. Hedstrom

  • Enhanced spin–orbit torques by oxygen incorporation in tungsten films

    Kai-Uwe Demasius;Kai-Uwe Demasius;Timothy Phung;Weifeng Zhang;Brian P. Hughes

  • On the relationship of magnetocrystalline anisotropy and stoichiometry in epitaxial L10 CoPt (001) and FePt (001) thin films

    K. Barmak;J. Kim;L. H. Lewis;K. R. Coffey

  • 12% Efficiency CuIn(Se,S)2 Photovoltaic Device Prepared Using a Hydrazine Solution Process†

    Wei Liu;David B. Mitzi;Min Yuan;Andrew J. Kellock

  • Crystallization properties of ultrathin phase change films

    Simone Raoux;Jean L. Jordan-Sweet;Andrew J. Kellock

  • Ion-beam patterning of magnetic films using stencil masks

    B. D. Terris;L. Folks;D. Weller;J. E. E. Baglin

  • METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES

    Andrew J. Kellock;Hyungjun Kim;Dae-Gyu Park;Satyanarayana V. Nitta

  • Negligible magnetism in excellent structural quality Cr(x)Ti(1-x)O(2) anatase: contrast with high-T(C) ferromagnetism in structurally defective Cr(x)Ti(1-x)O(2).

    Tiffany C. Kaspar;Steve M. Heald;Chong M. Wang;J. D. Bryan

  • Hydrazine-based deposition route for device-quality CIGS films

    David B. Mitzi;Min Yuan;Wei Liu;Andrew J. Kellock

  • Optimization of CIGS-Based PV Device through Antimony Doping

    Min Yuan;David B. Mitzi;Wei Liu;Andrew J. Kellock

  • Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films

    C. Lavoie;C. Detavernier;C. Cabral;F. M. d'Heurle

  • Thickness and growth temperature dependence of structure and magnetism in FePt thin films

    Michael F. Toney;Wen-Yaung Lee;Jonathan A. Hedstrom;Andrew Kellock

  • Highly-scalable novel access device based on Mixed Ionic Electronic conduction (MIEC) materials for high density phase change memory (PCM) arrays

    K. Gopalakrishnan;R. S. Shenoy;C. T. Rettner;K. Virwani

  • Direct observation of amorphous to crystalline phase transitions in nanoparticle arrays of phase change materials

    Simone Raoux;Charles T. Rettner;Jean L. Jordan-Sweet;Andrew J. Kellock

  • Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition

    H. Kim;C. Detavenier;O. van der Straten;S. M. Rossnagel

  • Influence of defects on structural and magnetic properties of multifunctionalLa2NiMnO6thin films

    H. Z. Guo;J. Burgess;E. Ada;S. Street

  • Absolute cross section for hydrogen forward scattering

    J.E.E. Baglin;A.J. Kellock;M.A. Crockett;A.H. Shih

  • Ion induced magnetization reorientation in Co/Pt multilayers for patterned media

    D. Weller;J. E. E. Baglin;A. J. Kellock;K. A. Hannibal

Frequent Co-Authors

Michael F. Toney
Michael F. Toney University of Colorado Boulder
Stuart S. P. Parkin
Stuart S. P. Parkin Max Planck Institute of Microstructure Physics
Charles T. Rettner
Charles T. Rettner IBM (United States)
Dieter Weller
Dieter Weller University of York
Geoffrey W. Burr
Geoffrey W. Burr IBM (United States)
Bruce David Terris
Bruce David Terris Western Digital (Japan)
Donald S. Bethune
Donald S. Bethune IBM (United States)
Christian Lavoie
Christian Lavoie IBM (United States)
David B. Mitzi
David B. Mitzi Duke University
Simone Raoux
Simone Raoux Helmholtz-Zentrum Berlin für Materialien und Energie

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