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D-Index & Metrics

Materials Science

D-Index
52
Citations
8707
World Ranking
9640
National Ranking
2328

Andrew J. Kellock publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Andrew J. Kellock sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 161 publications — 17th percentile

17% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Andrew J. Kellock D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Andrew J. Kellock sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 52 D-Index — 27th percentile

27% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Andrew J. Kellock is affiliated with IBM in the United States. Their work is situated within the broader research environment of one of the leading technology companies worldwide.

There are no recent publications listed for Andrew J. Kellock, and also no records of co-authors or frequent venues associated with their research activities. Similarly, no specific fields or subfields of study or main research topics have been identified from the available data.

Information about book publications or any awards received is not available. The absence of this data suggests that either this information has not been documented or the scientist's profile is relatively limited in publicly accessible records.

Given the available data, Andrew J. Kellock's research profile is primarily defined by the association with IBM (United States) and there are no further documented contributions at this time.

Best Publications

  • Epitaxial growth and properties of ferromagnetic co-doped TiO2 anatase

    S. A. Chambers;S. Thevuthasan;R. F. C. Farrow;R. F. Marks

  • A High‐Efficiency Solution‐Deposited Thin‐Film Photovoltaic Device

    David B. Mitzi;Min Yuan;Wei Liu;Andrew J. Kellock

  • Temperature dependent magnetic properties of highly chemically ordered Fe55−xNixPt45L10 films

    J.-U. Thiele;K. R. Coffey;M. F. Toney;J. A. Hedstrom

  • Enhanced spin–orbit torques by oxygen incorporation in tungsten films

    Kai-Uwe Demasius;Kai-Uwe Demasius;Timothy Phung;Weifeng Zhang;Brian P. Hughes

  • On the relationship of magnetocrystalline anisotropy and stoichiometry in epitaxial L10 CoPt (001) and FePt (001) thin films

    K. Barmak;J. Kim;L. H. Lewis;K. R. Coffey

  • 12% Efficiency CuIn(Se,S)2 Photovoltaic Device Prepared Using a Hydrazine Solution Process†

    Wei Liu;David B. Mitzi;Min Yuan;Andrew J. Kellock

  • Crystallization properties of ultrathin phase change films

    Simone Raoux;Jean L. Jordan-Sweet;Andrew J. Kellock

  • Ion-beam patterning of magnetic films using stencil masks

    B. D. Terris;L. Folks;D. Weller;J. E. E. Baglin

  • METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES

    Andrew J. Kellock;Hyungjun Kim;Dae-Gyu Park;Satyanarayana V. Nitta

  • Negligible magnetism in excellent structural quality Cr(x)Ti(1-x)O(2) anatase: contrast with high-T(C) ferromagnetism in structurally defective Cr(x)Ti(1-x)O(2).

    Tiffany C. Kaspar;Steve M. Heald;Chong M. Wang;J. D. Bryan

  • Hydrazine-based deposition route for device-quality CIGS films

    David B. Mitzi;Min Yuan;Wei Liu;Andrew J. Kellock

  • Optimization of CIGS-Based PV Device through Antimony Doping

    Min Yuan;David B. Mitzi;Wei Liu;Andrew J. Kellock

  • Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films

    C. Lavoie;C. Detavernier;C. Cabral;F. M. d'Heurle

  • Thickness and growth temperature dependence of structure and magnetism in FePt thin films

    Michael F. Toney;Wen-Yaung Lee;Jonathan A. Hedstrom;Andrew Kellock

  • Highly-scalable novel access device based on Mixed Ionic Electronic conduction (MIEC) materials for high density phase change memory (PCM) arrays

    K. Gopalakrishnan;R. S. Shenoy;C. T. Rettner;K. Virwani

  • Direct observation of amorphous to crystalline phase transitions in nanoparticle arrays of phase change materials

    Simone Raoux;Charles T. Rettner;Jean L. Jordan-Sweet;Andrew J. Kellock

  • Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition

    H. Kim;C. Detavenier;O. van der Straten;S. M. Rossnagel

  • Influence of defects on structural and magnetic properties of multifunctionalLa2NiMnO6thin films

    H. Z. Guo;J. Burgess;E. Ada;S. Street

  • Absolute cross section for hydrogen forward scattering

    J.E.E. Baglin;A.J. Kellock;M.A. Crockett;A.H. Shih

  • Ion induced magnetization reorientation in Co/Pt multilayers for patterned media

    D. Weller;J. E. E. Baglin;A. J. Kellock;K. A. Hannibal

Frequent Co-Authors

Michael F. Toney
Michael F. Toney University of Colorado Boulder
Stuart S. P. Parkin
Stuart S. P. Parkin Max Planck Institute of Microstructure Physics
Charles T. Rettner
Charles T. Rettner IBM (United States)
Dieter Weller
Dieter Weller University of York
Geoffrey W. Burr
Geoffrey W. Burr IBM (United States)
Bruce David Terris
Bruce David Terris Western Digital (Japan)
Donald S. Bethune
Donald S. Bethune IBM (United States)
Christian Lavoie
Christian Lavoie IBM (United States)
David B. Mitzi
David B. Mitzi Duke University
Simone Raoux
Simone Raoux Helmholtz-Zentrum Berlin für Materialien und Energie

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