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D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Materials Science 81 2630 2539 746 701 413 20466
Chemistry 79 3689 3346 1181 989 361 19095

Scott A. Chambers publications per year

The chart shows the history of publications by Scott A. Chambers between 1977 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Scott A. Chambers published across 49 years, from 1977 to 2025, averaging 9.1 papers a year. Output peaked at 24 publications in 2015. 17 of the 444 publications appeared in the last two years.

No. of publications
5 10 15 20
Bar chart. Horizontal axis: year, 1977 to 2025. Vertical axis: number of publications, 0 to 24. Peak 24 publications in 2015. 1977: 1 publication 1978: 1 publication 1979: 1 publication 1980: 1 publication 1981: 1 publication 1982: 2 publications 1983: 1 publication 1984: 1 publication 1985: 2 publications 1986: 3 publications 1987: 3 publications 1988: 3 publications 1989: 2 publications 1990: 8 publications 1991: 5 publications 1992: 8 publications 1993: 3 publications 1994: 5 publications 1995: 4 publications 1996: 9 publications 1997: 11 publications 1998: 9 publications 1999: 17 publications 2000: 10 publications 2001: 8 publications 2002: 11 publications 2003: 10 publications 2004: 11 publications 2005: 17 publications 2006: 9 publications 2007: 14 publications 2008: 12 publications 2009: 12 publications 2010: 20 publications 2011: 10 publications 2012: 13 publications 2013: 16 publications 2014: 17 publications 2015: 24 publications 2016: 23 publications 2017: 18 publications 2018: 16 publications 2019: 14 publications 2020: 11 publications 2021: 10 publications 2022: 13 publications 2023: 7 publications 2024: 9 publications 2025: 8 publications
1977 2025

444 publications in total across all disciplines

View publications per year as a table
Scott A. Chambers: publications per year, 1977 to 2025
Year Publications
1977 1
1978 1
1979 1
1980 1
1981 1
1982 2
1983 1
1984 1
1985 2
1986 3
1987 3
1988 3
1989 2
1990 8
1991 5
1992 8
1993 3
1994 5
1995 4
1996 9
1997 11
1998 9
1999 17
2000 10
2001 8
2002 11
2003 10
2004 11
2005 17
2006 9
2007 14
2008 12
2009 12
2010 20
2011 10
2012 13
2013 16
2014 17
2015 24
2016 23
2017 18
2018 16
2019 14
2020 11
2021 10
2022 13
2023 7
2024 9
2025 8
Total 444
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Scott A. Chambers publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Scott A. Chambers sits on this spectrum.

No. of scientists
200 400 600 800
Bar chart with 57 bars. Horizontal axis: publications, 50–69 to 1,163+. Vertical axis: number of scientists, 0 to 891. Most scientists, 891, have 190–209 publications. The last bar groups every scientist with 1,163 publications or more. The highlighted bar, 410–429 publications, is where this scientist sits. 50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50–69 publications 1,163+

This scientist: 413 publications — 79th percentile

79% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table
Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications Scientists This scientist
50–69 28
70–89 152
90–109 356
110–129 487
130–149 723
150–169 835
170–189 850
190–209 891
210–229 862
230–249 766
250–269 726
270–289 665
290–309 593
310–329 537
330–349 477
350–369 440
370–389 356
390–409 321
410–429 256 413
430–449 246
450–469 216
470–489 212
490–509 174
510–529 194
530–549 162
550–569 131
570–589 111
590–609 103
610–629 99
630–649 77
650–669 92
670–689 56
690–709 53
710–729 53
730–749 38
750–769 52
770–789 43
790–809 38
810–829 34
830–849 25
850–869 18
870–889 20
890–909 24
910–929 27
930–949 20
950–969 17
970–989 10
990–1,009 16
1,010–1,029 13
1,030–1,049 12
1,050–1,069 9
1,070–1,089 8
1,090–1,109 7
1,110–1,129 9
1,130–1,149 2
1,150–1,162 5
1,163+ 100
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Scott A. Chambers D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Scott A. Chambers sits on this spectrum.

No. of scientists
200 400 600
Bar chart with 64 bars. Horizontal axis: D-Index, 40–41 to 165+. Vertical axis: number of scientists, 0 to 667. Most scientists, 667, have 52–53 D-Index. The last bar groups every scientist with 165 D-Index or more. The highlighted bar, 80–81 D-Index, is where this scientist sits. 40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40–41 D-Index 165+

This scientist: 81 D-Index — 80th percentile

80% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table
Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index Scientists This scientist
40–41 211
42–43 450
44–45 612
46–47 612
48–49 598
50–51 657
52–53 667
54–55 621
56–57 597
58–59 610
60–61 587
62–63 606
64–65 533
66–67 490
68–69 469
70–71 378
72–73 421
74–75 359
76–77 323
78–79 299
80–81 230 81
82–83 210
84–85 195
86–87 203
88–89 175
90–91 175
92–93 142
94–95 121
96–97 117
98–99 107
100–101 88
102–103 85
104–105 68
106–107 62
108–109 57
110–111 45
112–113 49
114–115 50
116–117 34
118–119 38
120–121 37
122–123 29
124–125 28
126–127 24
128–129 33
130–131 28
132–133 21
134–135 20
136–137 23
138–139 17
140–141 12
142–143 17
144–145 21
146–147 13
148–149 11
150–151 14
152–153 13
154–155 9
156–157 10
158–159 7
160–161 4
162–163 4
164 3
165+ 98
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Research.com Recognitions

  • 2015 - Fellow of American Physical Society (APS) Citation For pioneering contributions in the growth and properties of crystalline oxide films, particularly the fundamental relationships between composition and structure, and the resulting electronic, magnetic, and photochemical properties
  • 2009 - Fellow of the American Association for the Advancement of Science (AAAS)

Overview

Scott A. Chambers is affiliated with the Pacific Northwest National Laboratory in the United States. Their research primarily focuses on materials science and engineering, with a significant number of publications in the intersection of these fields. The scientist has explored a range of specialized topics within these domains.

The main fields of study for Scott A. Chambers include:

  • Materials Science
  • Engineering

Within these fields, the subfields of study cover:

  • Materials Chemistry
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films

Scott A. Chambers' main topics of work include:

  • Electronic and Structural Properties of Oxides
  • Magnetic and transport properties of perovskites and related materials
  • Semiconductor materials and devices
  • Ferroelectric and Piezoelectric Materials
  • Electron and X-Ray Spectroscopy Techniques
  • Electrocatalysts for Energy Conversion
  • Catalytic Processes in Materials Science

Some of the notable recent papers authored or co-authored by the scientist are:

  • Dynamic Lattice Oxygen Participation on Perovskite LaNiO3 during Oxygen Evolution Reaction, 2020, The Journal of Physical Chemistry C
  • Understanding the Electronic Structure Evolution of Epitaxial LaNi1-xFexO3 Thin Films for Water Oxidation, 2021, Nano Letters
  • Epitaxial Design of Complex Nickelates as Electrocatalysts for the Oxygen Evolution Reaction, 2023, Advanced Energy Materials
  • Observation of Quantum Anomalous Hall Effect and Exchange Interaction in Topological Insulator/Antiferromagnet Heterostructure, 2020, Advanced Materials
  • Freestanding epitaxial SrTiO3 nanomembranes via remote epitaxy using hybrid molecular beam epitaxy, 2022, Science Advances

The scientist frequently publishes in the following venues:

  • Physical Review Materials
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Advanced Materials
  • Science Advances
  • Nano Letters

Frequent co-authors collaborating with Scott A. Chambers include:

  • Yingge Du
  • Le Wang
  • Mark Bowden
  • Peter V. Sushko
  • Steven R. Spurgeon

Regarding scholarly contributions outside of articles, Scott A. Chambers has several book publications with World Scientific. These include multiple editions of the Handbook of Molecular Beam Epitaxy of Oxide Materials, published in 2024.

Scott A. Chambers has received recognition from professional societies, including being named a Fellow of the American Physical Society (APS) in 2015, with a citation related to contributions in crystalline oxide films and their properties. In 2009, they were also named a Fellow of the American Association for the Advancement of Science (AAAS).

Best Publications

  • Epitaxial growth and properties of thin film oxides

    Scott A. Chambers

  • Epitaxial growth and properties of ferromagnetic co-doped TiO2 anatase

    S. A. Chambers;S. Thevuthasan;R. F. C. Farrow;R. F. Marks

  • Experimental determination of valence band maxima for SrTiO3, TiO2, and SrO and the associated valence band offsets with Si(001)

    Scott A. Chambers;Timothy C. Droubay;Tiffany C. Kaspar;Maciej S. Gutowski

  • Direct kinetic correlation of carriers and ferromagnetism in Co2+: ZnO.

    Kevin R. Kittilstved;Dana A. Schwartz;Allan C. Tuan;Steve M. Heald

  • Reaction of water vapor with α-Al2O3(0001) and α-Fe2O3(0001) surfaces : synchrotron X-ray photoemission studies and thermodynamic calculations

    Ping N. Liu;Thomas Kendelewicz;Gordon E. Brown;Eric J. Nelson

  • Instability, intermixing and electronic structure at the epitaxial LaAlO3/SrTiO3(001) heterojunction

    Scott A. Chambers;Mark H. Engelhard;V. Shutthanandan;Zihua Zhu

  • Band discontinuities at epitaxial SrTiO3/Si(001) heterojunctions

    Scott A. Chambers;Yong Liang;Z Yu;R Droopad

  • Clusters and magnetism in epitaxial Co-doped TiO2 anatase

    Scott A. Chambers;Timothy C. Droubay;Chong M. Wang;Alan S. Lea

  • Ferromagnetism in doped thin-film oxide and nitride semiconductors and dielectrics

    Scott A. Chambers

  • Strong Room-Temperature Ferromagnetism in Co2+-Doped TiO2 Made from Colloidal Nanocrystals

    J. Daniel Bryan;Steve M. Heald;Scott A. Chambers;Daniel R. Gamelin

  • Epitaxial film crystallography by high-energy Auger and X-ray photoelectron diffraction

    Scott A. Chambers

  • Elastic scattering and interference of backscattered primary, Auger and X-ray photoelectrons at high kinetic energy: principles and applications

    Scott A. Chambers

  • Carrier dynamics in α‐Fe2O3 (0001) thin films and single crystals probed by femtosecond transient absorption and reflectivity

    Alan G. Joly;Joshua R. Williams;Scott A. Chambers;Gang Xiong

  • Absence of intrinsic ferromagnetic interactions of isolated and paired Co dopant atoms in Zn1-xCoxO with high structural perfection.

    A. Ney;K. Ollefs;S. Ye;T. Kammermeier

  • Epitaxial Growth and Properties of Doped Transition Metal and Complex Oxide Films

    Scott A. Chambers

  • Spectroscopic Evidence for Ag(III) in Highly Oxidized Silver Films by X-ray Photoelectron Spectroscopy

    Tiffany C. Kaspar;Timothy C. Droubay;Scott A. Chambers;Paul S. Bagus

  • Epitaxial growth and properties of cobalt-doped ZnO on α − Al 2 O 3 single-crystal substrates

    Allan C. Tuan;John D. Bryan;Alexandre Pakhomov;V. Shutthanandan

  • Surface structure of anatase TiO 2 ( 001 ) : Reconstruction, atomic steps, and domains

    Yong Liang;Shupan Gan;Scott A. Chambers;Eric I. Altman

  • Measurement of the band offsets between amorphous LaAlO3 and silicon

    Lisa F. Edge;Darrell G. Schlom;Scott A. Chambers;E. Cicerrella

  • Selective growth and characterization of pure, epitaxial α-Fe2O3(0001) and Fe3O4(001) films by plasma-assisted molecular beam epitaxy

    Y.J. Kim;Y. Gao;S.A. Chambers

  • Oxide Dilute Magnetic Semiconductors—Fact or Fiction?

    J.M.D. Coey;S.A. Chambers

Frequent Co-Authors

Timothy C. Droubay
Timothy C. Droubay Pacific Northwest National Laboratory
Peter V. Sushko
Peter V. Sushko Pacific Northwest National Laboratory
Mark E. Bowden
Mark E. Bowden Pacific Northwest National Laboratory
Yingge Du
Yingge Du Pacific Northwest National Laboratory
Steve M. Heald
Steve M. Heald Argonne National Laboratory
Suntharampillai Thevuthasan
Suntharampillai Thevuthasan Pacific Northwest National Laboratory
Liang Qiao
Liang Qiao University of Electronic Science and Technology of China
Daniel R. Gamelin
Daniel R. Gamelin University of Washington
Mark H. Engelhard
Mark H. Engelhard Pacific Northwest National Laboratory
Kelsey A. Stoerzinger
Kelsey A. Stoerzinger Oregon State University

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