The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Tim D. Veal sits on this spectrum.
This scientist: 196 publications — 29th percentile
29% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Tim D. Veal sits on this spectrum.
This scientist: 62 D-Index — 51st percentile
51% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Tim D. Veal is affiliated with the University of Liverpool in the United Kingdom, focusing on research in materials science and engineering. Their work spans several subfields, including materials chemistry, electrical and electronic engineering, and electronic, optical, and magnetic materials. The topics covered in their research reflect a concentration on chalcogenide semiconductor thin films, quantum dots synthesis and properties, advanced semiconductor detectors and materials, ZnO doping and properties, phase-change materials and chalcogenides, electronic and structural properties of oxides, and the application of machine learning in materials science.
Veal has published extensively across multiple scientific journals, with frequent contributions to:
Recent notable papers include:
They often collaborate with other researchers, with frequent co-authors including Leanne A. H. Jones, Matthew J. Smiles, P. Thakur, Jack E. N. Swallow, and Jonathan D. Major. These collaborations underline the interdisciplinary nature of their research projects and the integration of materials chemistry with applied engineering approaches.
Their main fields of study emphasize the intersection of materials science and engineering, with particular focus on developing and characterizing new semiconductor materials and thin film technologies relevant to energy and electronic applications. The combination of work on chalcogenide semiconductor thin films, optical and electronic materials, and machine learning points to a broad and evolving research portfolio aimed at advancing understanding and applications of novel materials.
I Mahboob;TD Veal;Christopher F McConville;H Lu
P. D. C. King;T. D. Veal;F. Fuchs;Ch. Y. Wang
P D C King;T D Veal
Lee A. Burton;Thomas J. Whittles;David Hesp;Wojciech M. Linhart
I Mahboob;TD Veal;Lfj Piper;Christopher F McConville
Thomas J. Whittles;Lee A. Burton;Jonathan M. Skelton;Aron Walsh
Pdc King;TD Veal;DJ Payne;A Bourlange
Paul Harvey Jefferson;S. A. Hatfield;T. D. Veal;Philip David King
P. D. C. King;T. D. Veal;A. Schleife;J. Zúñiga-Pérez
Pdc King;RL Lichti;YG Celebi;JM Gil
Pdc King;TD Veal;CE Kendrick;LR Bailey
L. F. J. Piper;T. D. Veal;C. F. McConville;H. Lu
N. Feldberg;J. D. Aldous;W. M. Linhart;L. J. Phillips
MW Allen;CH Swartz;TH Myers;TH Myers;TD Veal
Pdc King;TD Veal;PH Jefferson;SA Hatfield
Jack E. N. Swallow;Benjamin A. D. Williamson;Thomas J. Whittles;Max Birkett
Leyla Colakerol;TD Veal;Hae-Kyung Jeong;Lukasz Plucinski
Tim D. Veal;Nathaniel Feldberg;Nicholas F. Quackenbush;Wojciech M. Linhart
Philip David King;T. D. Veal;Paul Harvey Jefferson;C. F. McConville
P. D. C. King;T. D. Veal;C. F. McConville;J. Zúñiga-Pérez
T. D. Veal;Paul Harvey Jefferson;L. F. J. Piper;C. F. McConville
Philip David King;T. D. Veal;C. F. McConville;Frank Fuchs
P. D. C. King;T. D. Veal;P. H. Jefferson;J. Zúñiga-Pérez
T. D. Veal;Philip David King;S. A. Hatfield;L. R. Bailey
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