The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where William J. Schaff sits on this spectrum.
This scientist: 532 publications — 87th percentile
87% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where William J. Schaff sits on this spectrum.
This scientist: 80 D-Index — 93rd percentile
93% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
William J. Schaff is affiliated with Cornell University in the United States. Their research primarily spans the fields of Materials Science and Physics and Astronomy, with a focus on subdomains such as Condensed Matter Physics, Electronic, Optical and Magnetic Materials, and Materials Chemistry.
The scientist's work extensively covers topics related to GaN-based semiconductor devices and materials, Ga2O3 and related materials, and ZnO doping and properties. These areas form the basis of their published research contributions.
William J. Schaff has contributed to the following recent paper:
Throughout their research career, they have frequently collaborated with several co-authors, including:
Their work has appeared in the journal Applied Physics Letters, among other venues, marking this publication as a frequent outlet for the dissemination of their research findings.
O. Ambacher;J. Smart;J. R. Shealy;N. G. Weimann
O. Ambacher;B. Foutz;J. Smart;J. R. Shealy
J. Wu;W. Walukiewicz;K. M. Yu;J. W. Ager
J. Wu;W. Walukiewicz;K. M. Yu;J. W. Ager
J. Wu;W. Walukiewicz;K. M. Yu;W. Shan
I Mahboob;TD Veal;Christopher F McConville;H Lu
J. Wu;J. Wu;W. Walukiewicz;W. Shan;K. M. Yu
M. Asif Khan;J. N. Kuznia;D. T. Olson;W. J. Schaff
J. Wu;W. Walukiewicz;W. Shan;K. M. Yu
L.F. Eastman;V. Tilak;J. Smart;B.M. Green
Hai Lu;William J. Schaff;Lester F. Eastman;C. E. Stutz
S. X. Li;S. X. Li;K. M. Yu;J. Wu;R. E. Jones;R. E. Jones
M. Asif Khan;Michael S. Shur;John N. Kuznia;Q. Chen
Hai Lu;William J. Schaff;Jeonghyun Hwang;Hong Wu
G. Steinhoff;M. Hermann;W. J. Schaff;L. F. Eastman
J. Wu;W. Walukiewicz;S. X. Li;R. Armitage
R. E. Jones;R. E. Jones;K. M. Yu;S. X. Li;S. X. Li;W. Walukiewicz
Hai Lu;William J. Schaff;Jeonghyun Hwang;Hong Wu
K. L. Kavanagh;M. A. Capano;L. W. Hobbs;J. C. Barbour
I Mahboob;TD Veal;Lfj Piper;Christopher F McConville
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