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Materials Science

D-Index
71
Citations
18762
World Ranking
4231
National Ranking
1135

Research.com Recognitions

  • 2013 - Fellow, National Academy of Inventors
  • 1993 - Member of the National Academy of Engineering For contributions to ion beam and plasma processing of thin film materials.

Overview

Jerome J. Cuomo is affiliated with North Carolina State University in the United States. Over the course of their academic career, they have been recognized by notable institutions for their contributions to the field of engineering and material science.

They were elected a Member of the National Academy of Engineering in 1993 for contributions to ion beam and plasma processing of thin film materials. Additionally, they are a Fellow of the National Academy of Inventors, an honor awarded in 2013.

They have no recent papers, co-authors, or lists of frequent publication venues publicly recorded at this time. Their areas of research and publication have not been detailed through available subfields or topics of study.

There is no publicly listed information concerning book publications or aggregated fields of study directly associated with their name.

Their work primarily revolves around ion beam and plasma processing techniques, which relate to thin film material treatments in engineering and applied sciences.

Although detailed recent academic outputs are not documented here, the recognition by the National Academy of Engineering and the National Academy of Inventors indicates influence within specialized areas of material processing technologies.

Best Publications

  • Infrared and Raman spectra of the silicon-hydrogen bonds in amorphous silicon prepared by glow discharge and sputtering

    M. H. Brodsky;Manuel Cardona;J. J. Cuomo

  • Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

    Stephen M. Rossnagel;J. J. Cuomo;William D. Westwood

  • Amorphous metallic films for magneto-optic applications

    P. Chaudhari;J.J. Cuomo;R.J. Gambino

  • Pulsed laser deposition of diamond‐like carbon films

    David L. Pappas;Katherine L. Saenger;John Bruley;William Krakow

  • Electron‐beam fabrication of 80‐Å metal structures

    A. N. Broers;W. W. Molzen;J. J. Cuomo;N. D. Wittels

  • Langmuir probe measurements of a radio frequency induction plasma

    J. Hopwood;C. R. Guarnieri;S. J. Whitehair;J. J. Cuomo

  • Amorphous metallic films for bubble domain applications

    P. Chaudhari;J. J. Cuomo;R. J. Gambino

  • Methods and apparatus for producing m'n based materials

    Jerome J. Cuomo;N. Mark Williams;Eric P. Carlson;Andrew D. Hanser

  • Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification and Synthesis

    J. J. Cuomo;S. M. Rossnagel;H. R. Haufman;Ranga Komanduri

  • Vapor deposition processes for amorphous carbon films with sp3 fractions approaching diamond

    Jerome J. Cuomo;David L. Pappas;John Bruley;James P. Doyle

  • Technology and applications of broad-beam ion sources used in sputtering. Part I. Ion source technology

    H. R. Kaufman;J. J. Cuomo;J. M. E. Harper

  • Sputter deposition of dense diamond-like carbon films at low temperature

    Jerome J. Cuomo;James P. Doyle;John Bruley;Joyce C. Liu

  • Picosecond optical studies of amorphous diamond and diamondlike carbon: Thermal conductivity and longitudinal sound velocity

    Christopher J. Morath;Humphrey J. Maris;Jerome J. Cuomo;David L. Pappas

  • Technology and applications of broad-beam ion sources used in sputtering. Part II. Applications

    J. M. E. Harper;J. J. Cuomo;H. R. Kaufman

  • Electromagnetic fields in a radio-frequency induction plasma

    J. Hopwood;C. R. Guarnieri;S. J. Whitehair;J. J. Cuomo

  • Reactive sputtering of carbon and carbide targets in nitrogen

    J. J. Cuomo;P. A. Leary;D. Yu;W. Reuter

  • Observation of a negative electron affinity for boron nitride

    M. J. Powers;M. C. Benjamin;L. M. Porter;R. J. Nemanich

  • Modification of niobium film stress by low‐energy ion bombardment during deposition

    J. J. Cuomo;J. M. E. Harper;C. R. Guarnieri;D. S. Yee

  • Collimated magnetron sputter deposition

    S. M. Rossnagel;D. Mikalsen;H. Kinoshita;J. J. Cuomo

  • Filtered arc deposition of amorphous diamond

    Richard Lossy;David L. Pappas;Ronnen A. Roy;Jerome J. Cuomo

Frequent Co-Authors

Wonbong Choi
Wonbong Choi University of North Texas
James Mckell Edwin Harper
James Mckell Edwin Harper IBM (United States)
Victor V. Zhirnov
Victor V. Zhirnov Semiconductor Research Corporation
Robert Nemanich
Robert Nemanich Arizona State University
Katherine L. Saenger
Katherine L. Saenger Auburn University
Stephen M. Rossnagel
Stephen M. Rossnagel IBM (United States)
Jerry M. Woodall
Jerry M. Woodall University of California, Davis
Thomas H. DiStefano
Thomas H. DiStefano Centipede Systems
Robert Benjamin Laibowitz
Robert Benjamin Laibowitz IBM (United States)
Jagdish Narayan
Jagdish Narayan North Carolina State University

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