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Electronics and Electrical Engineering
USA
2026
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Materials Science
USA
2026

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 150 17 17 8 8 1288 85423
Materials Science 144 205 197 86 80 1170 75848

Chenming Hu publications per year

The chart shows the history of publications by Chenming Hu between 1971 and 2024, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Chenming Hu published across 54 years, from 1971 to 2024, averaging 24.3 papers a year. Output peaked at 62 publications in 1996. 2 of the 1,313 publications appeared in the last two years.

No. of publications
20 40 60
Bar chart. Horizontal axis: year, 1971 to 2024. Vertical axis: number of publications, 0 to 62. Peak 62 publications in 1996. 1971: 1 publication 1972: 2 publications 1973: 3 publications 1974: 3 publications 1975: 1 publication 1976: 2 publications 1977: 3 publications 1978: 4 publications 1979: 7 publications 1980: 5 publications 1981: 4 publications 1982: 13 publications 1983: 14 publications 1984: 16 publications 1985: 10 publications 1986: 23 publications 1987: 26 publications 1988: 24 publications 1989: 21 publications 1990: 25 publications 1991: 40 publications 1992: 42 publications 1993: 55 publications 1994: 47 publications 1995: 46 publications 1996: 62 publications 1997: 61 publications 1998: 60 publications 1999: 45 publications 2000: 40 publications 2001: 54 publications 2002: 52 publications 2003: 48 publications 2004: 52 publications 2005: 24 publications 2006: 19 publications 2007: 25 publications 2008: 22 publications 2009: 21 publications 2010: 17 publications 2011: 30 publications 2012: 29 publications 2013: 24 publications 2014: 16 publications 2015: 24 publications 2016: 39 publications 2017: 23 publications 2018: 24 publications 2019: 25 publications 2020: 25 publications 2021: 13 publications 2022: 0 publications 2023: 0 publications 2024: 2 publications
1971 2024

1,313 publications in total across all disciplines

View publications per year as a table
Chenming Hu: publications per year, 1971 to 2024
Year Publications
1971 1
1972 2
1973 3
1974 3
1975 1
1976 2
1977 3
1978 4
1979 7
1980 5
1981 4
1982 13
1983 14
1984 16
1985 10
1986 23
1987 26
1988 24
1989 21
1990 25
1991 40
1992 42
1993 55
1994 47
1995 46
1996 62
1997 61
1998 60
1999 45
2000 40
2001 54
2002 52
2003 48
2004 52
2005 24
2006 19
2007 25
2008 22
2009 21
2010 17
2011 30
2012 29
2013 24
2014 16
2015 24
2016 39
2017 23
2018 24
2019 25
2020 25
2021 13
2022 0
2023 0
2024 2
Total 1,313
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Chenming Hu publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Chenming Hu sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 1,065+ publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 1,288 publications — 99th percentile

99% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403
174–193 445
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99 1,288
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Chenming Hu D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Chenming Hu sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 111+ D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 150 D-Index — 100th percentile

100% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220
38 214
39 214
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96 150
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Research.com Recognitions

  • 2026 - Research.com Electronics and Electrical Engineering in United States Leader Award
  • 2026 - Research.com Materials Science in United States Leader Award
  • 2025 - Research.com Electronics and Electrical Engineering in United States Leader Award
  • 2025 - Research.com Materials Science in United States Leader Award
  • 2022 - Research.com Electronics and Electrical Engineering in United States Leader Award
  • 2022 - Research.com Materials Science in United States Leader Award
  • 2020 - IEEE Medal of Honor For a distinguished career of developing and putting into practice semiconductor models, particularly 3-D device structures, that have helped keep Moore's Law going over many decades.
  • 2015 - Fellow, National Academy of Inventors
  • 2012 - Fellow, The World Academy of Sciences
  • 2011 - Semiconductor Industry Association University Researcher Award
  • 2009 - IEEE Jun-ichi Nishizawa Medal "For technical contributions to MOS device reliability, scaling of CMOS and compact device modeling."
  • 2002 - IEEE Donald O. Pederson Award in Solid-State Circuits "For contributions to MOSFET physics and development of the BSIM model for CMOS circuit simulation."
  • 1998 - Monie A. Ferst Award, Sigma Xi
  • 1997 - Member of the National Academy of Engineering For contributions to the modeling integration-circuit devices and to the reliability and performance of VLSI systems.
  • 1990 - IEEE Fellow For contributions to the understanding of hot-electron effects in MOS devices.

Overview

Chenming Hu is affiliated with the University of California, Berkeley in the United States. Their research primarily focuses on the field of engineering, with a specialization in electrical and electronic engineering.

The scientist has contributed to several main topics in semiconductor research, which include:

  • Semiconductor materials and devices
  • Advancements in Semiconductor Devices and Circuit Design
  • Integrated Circuits and Semiconductor Failure Analysis
  • 3D IC and TSV technologies
  • Thin-Film Transistor Technologies

Chenming Hu's publications are concentrated in venues such as the Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials. The scientist's recently documented paper is titled "Effect of Dielectric Layer Scheme for High-Quality Silicon Channel in Monolithic 3DIC," published in 2020 within this venue.

The list of frequent co-authors collaborating with Chenming Hu includes:

  • Yogesh Singh Chauhan
  • Girish Pahwa
  • Avirup Dasgupta
  • Darsen D. Lu
  • Sriramkumar Venugopalan

Chenming Hu's awards and recognitions comprise several notable honors:

  • IEEE Medal of Honor (2020): For a distinguished career developing semiconductor models and 3-D device structures facilitating Moore's Law
  • Fellow, National Academy of Inventors (2015)
  • Fellow, The World Academy of Sciences (2012)
  • Semiconductor Industry Association University Researcher Award (2011)
  • IEEE Jun-ichi Nishizawa Medal (2009): For contributions to MOS device reliability, CMOS scaling, and device modeling
  • IEEE Donald O. Pederson Award in Solid-State Circuits (2002): For contributions to MOSFET physics and BSIM model development
  • Monie A. Ferst Award, Sigma Xi (1998)
  • Member of the National Academy of Engineering (1997): For contributions to modeling integrated-circuit devices and VLSI systems reliability
  • IEEE Fellow (1990): For understanding hot-electron effects in MOS devices

Best Publications

  • Hot-electron-induced MOSFET degradation—Model, monitor, and improvement

    Chenming Hu;Simon C. Tam;Fu-Chieh Hsu;Ping-Keung Ko

  • FinFET-a self-aligned double-gate MOSFET scalable to 20 nm

    D. Hisamoto;Wen-Chin Lee;J. Kedzierski;H. Takeuchi

  • MoS2 transistors with 1-nanometer gate lengths

    Sujay B. Desai;Sujay B. Desai;Surabhi R. Madhvapathy;Surabhi R. Madhvapathy;Angada B. Sachid;Angada B. Sachid;Juan Pablo Llinas;Juan Pablo Llinas

  • Electrical Breakdown in Thin Gate and Tunneling Oxides

    Ih-Chin Chen;S.E. Holland;Chenming Hu

  • A unified model for the flicker noise in metal-oxide-semiconductor field-effect transistors

    K.K. Hung;P.K. Ko;C. Hu;Y.C. Cheng

  • FinFET scaling to 10 nm gate length

    Bin Yu;Leland Chang;S. Ahmed;Haihong Wang

  • Sub 50-nm FinFET: PMOS

    Xuejue Huang;Wen-Chin Lee;Charles Kuo;D. Hisamoto

  • Enhanced ferroelectricity in ultrathin films grown directly on silicon.

    Suraj S. Cheema;Daewoong Kwon;Daewoong Kwon;Nirmaan Shanker;Roberto dos Reis

  • Modern Semiconductor Devices for Integrated Circuits

    Chenming Hu

  • Field-Effect Transistors Built from All Two-Dimensional Material Components

    Tania Roy;Mahmut Tosun;Mahmut Tosun;Jeong Seuk Kang;Jeong Seuk Kang;Angada B. Sachid

  • New paradigm of predictive MOSFET and interconnect modeling for early circuit simulation

    Y. Cao;T. Sato;M. Orshansky;D. Sylvester

  • Hole injection SiO/sub 2/ breakdown model for very low voltage lifetime extrapolation

    K.F. Schuegraf;Chenming Hu

  • Finfet transistor structures having a double gate channel extending vertically from a substrate and methods of manufacture

    Chenming Hu;Tsu-Jae King;Vivek Subramanian;Leland Chang

  • MOS capacitance measurements for high-leakage thin dielectrics

    K.J. Yang;Chenming Hu

  • Dynamic threshold-voltage MOSFET (DTMOS) for ultra-low voltage VLSI

    F. Assaderaghi;D. Sinitsky;S.A. Parke;J. Bokor

  • Sub-50 nm P-channel FinFET

    Xuejue Huang;Wen-Chin Lee;C. Kuo;D. Hisamoto

  • MOSFET Modeling & BSIM3 User's Guide

    Yuhua Cheng;Chenming Hu

  • Lucky-electron model of channel hot-electron injection in MOSFET'S

    Simon Tam;Ping-Keung Ko;Chenming Hu

  • Metal-dielectric band alignment and its implications for metal gate complementary metal-oxide-semiconductor technology

    Yee Chia Yeo;Tsu Jae King;Chen-Ming Hu

  • Immersion Fluid for Immersion Lithography, and Method of Performing Immersion Lithography

    Yee-Chia Yeo;Burn-Jeng Lin;Chenming Hu

Frequent Co-Authors

Tsu-Jae King
Tsu-Jae King University of California, Berkeley
Fu-Liang Yang
Fu-Liang Yang Academia Sinica
Ping-Keung Ko
Ping-Keung Ko Hong Kong University of Science and Technology
Sayeef Salahuddin
Sayeef Salahuddin University of California, Berkeley
Mansun Chan
Mansun Chan Hong Kong University of Science and Technology
Ali M. Niknejad
Ali M. Niknejad University of California, Berkeley
Yogesh Singh Chauhan
Yogesh Singh Chauhan Indian Institute of Technology Kanpur
Sourabh Khandelwal
Sourabh Khandelwal Macquarie University
Jeffrey Bokor
Jeffrey Bokor University of California, Berkeley
Nathan W. Cheung
Nathan W. Cheung University of California, Berkeley

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