World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
78
Citations
24819
World Ranking
573
National Ranking
257

Materials Science

D-Index
78
Citations
24649
World Ranking
2938
National Ranking
828

Tsu-Jae King publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Tsu-Jae King sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 446 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 290 publications — 55th percentile

55% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Tsu-Jae King D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Tsu-Jae King sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 263 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 78 D-Index — 92nd percentile

92% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 2007 - IEEE Fellow For applications of silicon-germanium thin films to metal oxide semiconductor transistors and microelectro mechanical systems

Overview

Tsu-Jae King is affiliated with the University of California, Berkeley in the United States. Their research primarily spans the fields of Physics and Astronomy as well as Engineering. Within these broad areas, their subfields of study include Nuclear and High Energy Physics, Radiation, Biomedical Engineering, Radiology, Nuclear Medicine and Imaging, and Electrical and Electronic Engineering.

The scientist's work focuses on several main topics related to imaging and detection technologies. These topics include Particle Detector Development and Performance, Advanced X-ray and CT Imaging, Medical Imaging Techniques and Applications, CCD and CMOS Imaging Sensors, Radiation Detection and Scintillator Technologies, and Advanced X-ray Imaging Techniques.

The recent published papers by this researcher have appeared mostly in the Journal of Instrumentation, as well as other specialized venues. Notable recent publications include:

  • Development of LGAD sensors with a thin entrance window for soft X-ray detection, 2022, Journal of Instrumentation
  • Advancing the JUNGFRAU detector toward low-energy X-ray applications, 2022, Journal of Instrumentation
  • Study of the internal quantum efficiency of FBK sensors with optimized entrance windows, 2023, Journal of Instrumentation
  • Optimizing charge transport simulation for hybrid pixel detectors, 2024, Journal of Instrumentation
  • Balancing gain and dynamic range in a 25 µm pitch hybrid pixel detector, 2024, Journal of Instrumentation

The researcher has collaborated frequently with colleagues such as A. Bergamaschi, Martin Brückner, Simon Ebner, D. Greiffenberg, and S. Hasanaj. Their publications have also appeared in other venues including IEEE Transactions on Electron Devices, Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment, and arXiv (Cornell University).

In recognition of their contributions to technology development, Tsu-Jae King was named an IEEE Fellow in 2007 for applications of silicon-germanium thin films to metal oxide semiconductor transistors and microelectro mechanical systems.

Best Publications

  • FinFET-a self-aligned double-gate MOSFET scalable to 20 nm

    D. Hisamoto;Wen-Chin Lee;J. Kedzierski;H. Takeuchi

  • FinFET scaling to 10 nm gate length

    Bin Yu;Leland Chang;S. Ahmed;Haihong Wang

  • Sub 50-nm FinFET: PMOS

    Xuejue Huang;Wen-Chin Lee;Charles Kuo;D. Hisamoto

  • Methods of designing an integrated circuit on corrugated substrate

    Tsu-Jae King;Victor Moroz

  • Finfet transistor structures having a double gate channel extending vertically from a substrate and methods of manufacture

    Chenming Hu;Tsu-Jae King;Vivek Subramanian;Leland Chang

  • Sub-50 nm P-channel FinFET

    Xuejue Huang;Wen-Chin Lee;C. Kuo;D. Hisamoto

  • Metal-dielectric band alignment and its implications for metal gate complementary metal-oxide-semiconductor technology

    Yee Chia Yeo;Tsu Jae King;Chen-Ming Hu

  • The end of CMOS scaling: toward the introduction of new materials and structural changes to improve MOSFET performance

    T. Skotnicki;J.A. Hutchby;Tsu-Jae King;H.-S.P. Wong

  • Frequency-independent equivalent-circuit model for on-chip spiral inductors

    Yu Cao;R.A. Groves;Xuejue Huang;N.D. Zamdmer

  • Sub-20 nm CMOS FinFET technologies

    Yang-Kyu Choi;N. Lindert;Peiqi Xuan;S. Tang

  • Frequency-independent equivalent circuit model for on-chip spiral inductors

    Yu Cao;R.A. Groves;N.D. Zamdmer;J.-O. Plouchart

  • Polycrystalline silicon germanium films for forming micro-electromechanical systems

    Andrea Franke;Roger T Howe;Tsu-Jae King

  • A folded-channel MOSFET for deep-sub-tenth micron era

    D. Hisamoto;Wen-Chin Lee;J. Kedzierski;E. Anderson

  • Segmented channel MOS transistor

    Tsu-Jae King;Victor Moroz

  • Extremely scaled silicon nano-CMOS devices

    L. Chang;Yang-kyu Choi;D. Ha;P. Ranade

  • A spacer patterning technology for nanoscale CMOS

    Yang-Kyu Choi;Tsu-Jae King;Chenming Hu

  • Ultra-thin body SOI MOSFET for deep-sub-tenth micron era

    Yang-Kyu Choi;K. Asano;N. Lindert;V. Subramanian

  • Nanoscale CMOS spacer FinFET for the terabit era

    Yang-Kyu Choi;Tsu-Jae King;Chenming Hu

  • Observation of bulk HfO2 defects by spectroscopic ellipsometry

    Hideki Takeuchi;Daewon Ha;Tsu-Jae King

  • Charge-trap memory device fabricated by oxidation of Si/sub 1-x/Ge/sub x/

    Ya-Chin King;Tsu-Jae King;Chenming Hu

Frequent Co-Authors

Chenming Hu
Chenming Hu University of California, Berkeley
Jeffrey Bokor
Jeffrey Bokor University of California, Berkeley
Yang-Kyu Choi
Yang-Kyu Choi Korea Advanced Institute of Science and Technology
Roger T. Howe
Roger T. Howe Stanford University
Leland Chang
Leland Chang IBM Research - Thomas J. Watson Research Center
Vivek Subramanian
Vivek Subramanian École Polytechnique Fédérale de Lausanne
Krishna C. Saraswat
Krishna C. Saraswat Stanford University
Ya-Chin King
Ya-Chin King National Tsing Hua University
Erik H. Anderson
Erik H. Anderson Lawrence Berkeley National Laboratory
Yu Cao
Yu Cao University of Minnesota

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