World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
61
Citations
15860
World Ranking
1518
National Ranking
620

Leland Chang publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Leland Chang sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 251 publications — 45th percentile

45% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Leland Chang D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Leland Chang sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 61 D-Index — 78th percentile

78% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Leland Chang is affiliated with IBM Research - Thomas J. Watson Research Center in the United States. Their research spans across multiple fields including Medicine and Engineering, with a focus on subfields such as Radiology, Nuclear Medicine and Imaging, Mechanics of Materials, Materials Chemistry, Electrical and Electronic Engineering, and Health Informatics.

The main topics addressed in their work include:

  • Radiomics and Machine Learning in Medical Imaging
  • Metal and Thin Film Mechanics
  • Fuel Cells and Related Materials
  • Artificial Intelligence in Healthcare and Education
  • Machine Learning in Healthcare
  • Diamond and Carbon-based Materials Research
  • Boron and Carbon Nanomaterials Research

Recent papers authored or coauthored by Chang cover a variety of areas and include:

  • Research on the Cultivation Strategies of Management Psychology Students' Abilities under the Background of "Four Integrations", 2024, Journal of Higher Education Research
  • Unleashing the Power of Language Models in Clinical Settings: A Trailblazing Evaluation Unveiling Novel Test Design, 2023, bioRxiv (Cold Spring Harbor Laboratory)
  • Effects of DC pulse mode on the performance of nitride coatings: a case study of NbN coatings, 2025, Applied Surface Science
  • Unveiling the Failure Mechanism of Pt Coating on Ti Porous Transport Layer in Simulated PEMEC Environment, 2025, ACS Applied Materials & Interfaces
  • Editorial for "Differentiating Benign Thyroid Nodules and Papillary Thyroid Carcinoma Using Time-Dependent Diffusion MRI: A Feasibility Study", 2025, Journal of Magnetic Resonance Imaging

Chang's frequent coauthors include Jing Li, Jih-Jen Wu, Xingyuan Lu, Xiaoping Li, and Li Lin. These collaborations have contributed to interdisciplinary research outputs spanning medical imaging, materials science, and engineering.

Their work is regularly published in venues such as:

  • bioRxiv (Cold Spring Harbor Laboratory)
  • Applied Surface Science
  • ACS Applied Materials & Interfaces
  • Journal of Higher Education Research
  • Journal of Magnetic Resonance Imaging

Best Publications

  • Stable SRAM cell design for the 32 nm node and beyond

    L. Chang;D.M. Fried;J. Hergenrother;J.W. Sleight

  • New Transport Phenomenon in a Semiconductor "Superlattice"

    L. Esaki;L. L. Chang

  • FinFET scaling to 10 nm gate length

    Bin Yu;Leland Chang;S. Ahmed;Haihong Wang

  • Sub 50-nm FinFET: PMOS

    Xuejue Huang;Wen-Chin Lee;Charles Kuo;D. Hisamoto

  • Finfet transistor structures having a double gate channel extending vertically from a substrate and methods of manufacture

    Chenming Hu;Tsu-Jae King;Vivek Subramanian;Leland Chang

  • Sub-50 nm P-channel FinFET

    Xuejue Huang;Wen-Chin Lee;C. Kuo;D. Hisamoto

  • An 8T-SRAM for Variability Tolerance and Low-Voltage Operation in High-Performance Caches

    L. Chang;R.K. Montoye;Y. Nakamura;K.A. Batson

  • A 45nm CMOS neuromorphic chip with a scalable architecture for learning in networks of spiking neurons

    Jae-sun Seo;Bernard Brezzo;Yong Liu;Benjamin D. Parker

  • Extremely scaled silicon nano-CMOS devices

    L. Chang;Yang-kyu Choi;D. Ha;P. Ranade

  • Ultralow-voltage, minimum-energy CMOS

    S. Hanson;B. Zhai;K. Bernstein;D. Blaauw

  • Content addressable memory array programmed to perform logic operations

    Leland Chang;Gary S. Ditlow;Brian L. Ji;Robert K. Montoye

  • In1−xGaxAs‐GaSb1−yAsy heterojunctions by molecular beam epitaxy

    H. Sakaki;L. L. Chang;R. Ludeke;Chin‐An Chang

  • Integrated Circuit Having Gates and Active Regions Forming a Regular Grating

    Leland Chang;Hon-Sum Philip Wong

  • Practical Strategies for Power-Efficient Computing Technologies

    L. Chang;D.J. Frank;R.K. Montoye;S.J. Koester

  • CMOS circuit performance enhancement by surface orientation optimization

    Leland Chang;Meikei Ieong;Min Yang

  • Gate length scaling and threshold voltage control of double-gate MOSFETs

    L. Chang;S. Tang;Tsu-Jae King;J. Bokor

  • Sub-60-nm quasi-planar FinFETs fabricated using a simplified process

    N. Lindert;L. Chang;Yang-Kyu Choi;E.H. Anderson

  • Optical absorption of In1−xGaxAsGaSb1−yAsy superlattices

    G.A. Sai-Halasz;L.L. Chang;J.-M. Welter;C.-A. Chang

  • 1 Mb 0.41 µm² 2T-2R Cell Nonvolatile TCAM With Two-Bit Encoding and Clocked Self-Referenced Sensing

    Jing Li;Robert K. Montoye;Masatoshi Ishii;Leland Chang

  • A fully-integrated switched-capacitor 2∶1 voltage converter with regulation capability and 90% efficiency at 2.3A/mm 2

    Leland Chang;Robert K. Montoye;Brian L. Ji;Alan J. Weger

Frequent Co-Authors

Jeffrey W. Sleight
Jeffrey W. Sleight IBM (United States)
Josephine B. Chang
Josephine B. Chang Northrop Grumman (United States)
Tsu-Jae King
Tsu-Jae King University of California, Berkeley
Chenming Hu
Chenming Hu University of California, Berkeley
Jeffrey Bokor
Jeffrey Bokor University of California, Berkeley
Yang-Kyu Choi
Yang-Kyu Choi Korea Advanced Institute of Science and Technology
Wilfried Haensch
Wilfried Haensch Argonne National Laboratory
Michael A. Guillorn
Michael A. Guillorn IBM (United States)
Swagath Venkataramani
Swagath Venkataramani IBM (United States)
Vijayalakshmi Srinivasan
Vijayalakshmi Srinivasan IBM (United States)

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