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Electronics and Electrical Engineering
USA
2026

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 109 112 109 53 50 804 44367

David Blaauw publications per year

The chart shows the history of publications by David Blaauw between 1988 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. David Blaauw published across 38 years, from 1988 to 2025, averaging 22.6 papers a year. Output peaked at 46 publications in 2017. 31 of the 859 publications appeared in the last two years.

No. of publications
10 20 30 40
Bar chart. Horizontal axis: year, 1988 to 2025. Vertical axis: number of publications, 0 to 46. Peak 46 publications in 2017. 1988: 1 publication 1989: 1 publication 1990: 5 publications 1991: 2 publications 1992: 0 publications 1993: 1 publication 1994: 2 publications 1995: 5 publications 1996: 4 publications 1997: 6 publications 1998: 6 publications 1999: 4 publications 2000: 14 publications 2001: 8 publications 2002: 35 publications 2003: 43 publications 2004: 38 publications 2005: 39 publications 2006: 26 publications 2007: 26 publications 2008: 40 publications 2009: 33 publications 2010: 37 publications 2011: 32 publications 2012: 37 publications 2013: 36 publications 2014: 40 publications 2015: 37 publications 2016: 44 publications 2017: 46 publications 2018: 31 publications 2019: 33 publications 2020: 38 publications 2021: 28 publications 2022: 31 publications 2023: 19 publications 2024: 18 publications 2025: 13 publications
1988 2025

859 publications in total across all disciplines

View publications per year as a table
David Blaauw: publications per year, 1988 to 2025
Year Publications
1988 1
1989 1
1990 5
1991 2
1992 0
1993 1
1994 2
1995 5
1996 4
1997 6
1998 6
1999 4
2000 14
2001 8
2002 35
2003 43
2004 38
2005 39
2006 26
2007 26
2008 40
2009 33
2010 37
2011 32
2012 37
2013 36
2014 40
2015 37
2016 44
2017 46
2018 31
2019 33
2020 38
2021 28
2022 31
2023 19
2024 18
2025 13
Total 859
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David Blaauw publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where David Blaauw sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 794–813 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 804 publications — 96th percentile

96% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403
174–193 445
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23 804
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
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David Blaauw D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where David Blaauw sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 109 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 109 D-Index — 98th percentile

98% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220
38 214
39 214
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10 109
110 8
111+ 96
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Research.com Recognitions

  • 2026 - Research.com Electronics and Electrical Engineering in United States Leader Award
  • 2025 - Research.com Electronics and Electrical Engineering in United States Leader Award
  • 2016 - Semiconductor Industry Association University Researcher Award

Overview

David Blaauw is affiliated with the University of Michigan-Ann Arbor in the United States. Their research spans multiple fields, primarily focusing on engineering and computer science, with significant contributions in electrical and electronic engineering, molecular biology, biomedical engineering, cellular and molecular neuroscience, and artificial intelligence.

The scientist's work encompasses diverse topics, including:

  • Advanced Memory and Neural Computing
  • Genomics and Phylogenetic Studies
  • Neuroscience and Neural Engineering
  • Analog and Mixed-Signal Circuit Design
  • Low-power High-Performance VLSI Design
  • CCD and CMOS Imaging Sensors
  • Parallel Computing and Optimization Techniques

Recent notable publications include:

  • "A low-power band of neuronal spiking activity dominated by local single units improves the performance of brain-machine interfaces," 2020, Nature Biomedical Engineering
  • "SquiggleNet: real-time, direct classification of nanopore signals," 2021, Genome Biology
  • "Bayesian Inference of RNA Velocity from Multi-Lineage Single-Cell Data," 2022, bioRxiv (Cold Spring Harbor Laboratory)
  • "A Light-Tolerant Wireless Neural Recording IC for Motor Prediction With Near-Infrared-Based Power and Data Telemetry," 2022, IEEE Journal of Solid-State Circuits
  • "Bridging the "Last Millimeter" Gap of Brain-Machine Interfaces via Near-Infrared Wireless Power Transfer and Data Communications," 2021, ACS Photonics

Blaauw frequently publishes in venues such as:

  • IEEE Journal of Solid-State Circuits
  • IEEE Solid-State Circuits Letters
  • bioRxiv (Cold Spring Harbor Laboratory)
  • 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
  • arXiv (Cornell University)

The scientist collaborates regularly with researchers including Hun-Seok Kim, Dennis Sylvester, Hyochan An, Reetuparna Das, and Satish Narayanasamy.

Among their recognitions, Blaauw received the Semiconductor Industry Association University Researcher Award in 2016.

Best Publications

  • Razor: a low-power pipeline based on circuit-level timing speculation

    Dan Ernst;Nam Sung Kim;Shidhartha Das;Sanjay Pant

  • Leakage current: Moore's law meets static power

    N.S. Kim;T. Austin;D. Baauw;T. Mudge

  • Drowsy caches: simple techniques for reducing leakage power

    Krisztián Flautner;Nam Sung Kim;Steve Martin;David Blaauw

  • Near-Threshold Computing: Reclaiming Moore's Law Through Energy Efficient Integrated Circuits

    R.G. Dreslinski;M. Wieckowski;D. Blaauw;D. Sylvester

  • RazorII: In Situ Error Detection and Correction for PVT and SER Tolerance

    S. Das;C. Tokunaga;S. Pant;W.-H. Ma

  • Combined dynamic voltage scaling and adaptive body biasing for lower power microprocessors under dynamic workloads

    Steven M. Martin;Krisztian Flautner;Trevor Mudge;David Blaauw

  • Statistical Timing Analysis for Intra-Die Process Variations with Spatial Correlations

    Aseem Agarwal;David Blaauw;Vladimir Zolotov

  • A self-tuning DVS processor using delay-error detection and correction

    S. Das;D. Roberts;Seokwoo Lee;S. Pant

  • Theoretical and practical limits of dynamic voltage scaling

    Bo Zhai;David Blaauw;Dennis Sylvester;Krisztian Flautner

  • Razor: circuit-level correction of timing errors for low-power operation

    D. Ernst;S. Das;S. Lee;D. Blaauw

  • Statistical Timing Analysis: From Basic Principles to State of the Art

    D. Blaauw;K. Chopra;A. Srivastava;L. Scheffer

  • A Portable 2-Transistor Picowatt Temperature-Compensated Voltage Reference Operating at 0.5 V

    Mingoo Seok;Gyouho Kim;D. Blaauw;D. Sylvester

  • Hierarchical analysis of power distribution networks

    M. Zhao;R.V. Panda;S.S. Sapatnekar;D. Blaauw

  • Statistical Analysis and Optimization for VLSI: Timing and Power

    Ashish Srivastava;Dennis Sylvester;David Blaauw

  • A 28 nm Configurable Memory (TCAM/BCAM/SRAM) Using Push-Rule 6T Bit Cell Enabling Logic-in-Memory

    Supreet Jeloka;Naveen Bharathwaj Akesh;Dennis Sylvester;David Blaauw

  • A highly resilient routing algorithm for fault-tolerant NoCs

    David Fick;Andrew DeOrio;Gregory Chen;Valeria Bertacco

  • Analysis and mitigation of variability in subthreshold design

    Bo Zhai;Scott Hanson;David Blaauw;Dennis Sylvester

  • Compute Caches

    Shaizeen Aga;Supreet Jeloka;Arun Subramaniyan;Satish Narayanasamy

  • Ultralow-voltage, minimum-energy CMOS

    S. Hanson;B. Zhai;K. Bernstein;D. Blaauw

  • Razor II: In Situ Error Detection and Correction for PVT and SER Tolerance

    D. Blaauw;S. Kalaiselvan;K. Lai;Wei-Hsiang Ma

  • A cubic-millimeter energy-autonomous wireless intraocular pressure monitor

    G Chen;H Ghaed;R Haque;M Wieckowski

  • Hierarchical analysis of power distribution networks

    Min Zhao;Rajendran V. Panda;Sachin S. Sapatnekar;Tim Edwards

Frequent Co-Authors

Dennis Sylvester
Dennis Sylvester University of Michigan–Ann Arbor
Trevor Mudge
Trevor Mudge University of Michigan–Ann Arbor
Yoonmyung Lee
Yoonmyung Lee Sungkyunkwan University
Vladimir Zolotov
Vladimir Zolotov IBM (United States)
Ronald G. Dreslinski
Ronald G. Dreslinski University of Michigan–Ann Arbor
Mingoo Seok
Mingoo Seok Columbia University
Krisztian Flautner
Krisztian Flautner University of Michigan–Ann Arbor
Todd Austin
Todd Austin University of Michigan–Ann Arbor
Reetuparna Das
Reetuparna Das University of Michigan–Ann Arbor
Sarma Vrudhula
Sarma Vrudhula Arizona State University

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Related Online Degrees & Career Pathways

For students pursuing Electronics and Electrical Engineering in the USA, exploring related online degrees can open diverse career opportunities. A bachelor's degree in project management is an excellent complement, equipping graduates with essential leadership and organizational skills valuable in engineering projects.

Working professionals often benefit from accelerated online degree programs for working adults, allowing them to enhance their qualifications without interrupting their careers. These flexible options help balance work, study, and personal commitments effectively.

Beyond technical expertise, skills in educational technology are increasingly important. Programs focused on instructional design prepare students to develop training materials and educational systems critical for corporate and academic environments involving technological learning.

Additionally, competency based master's degree programs provide a personalized learning approach, allowing students to progress by demonstrating mastery of skills. This model is particularly effective for engineers seeking to specialize or update their knowledge efficiently.

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