World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
51
Citations
15141
World Ranking
3761
National Ranking
1098

Overview

Erik H. Anderson is affiliated with Lawrence Berkeley National Laboratory in the United States. Their research spans multiple fields, primarily focusing on engineering and materials science, with specific subfields in electrical and electronic engineering as well as electronic, optical, and magnetic materials.

The scientist's work covers several main topics related to semiconductor and device technologies. These include copper interconnects and reliability, semiconductor materials and devices, and thin-film transistor technologies.

Among Anderson's recent publications is the paper titled Full characterization of ultrathin 5-nm low-k dielectric bilayers: Influence of dopants and surfaces on the mechanical properties, published in 2020 in the journal Physical Review Materials. This paper has been cited 14 times.

Erik H. Anderson frequently collaborates with a number of co-authors, including:

  • Travis D. Frazer
  • Joshua L. Knobloch
  • Jorge N. Hernández-Charpak
  • Kathleen Hoogeboom-Pot
  • Damiano Nardi

The principal publication venue for Anderson's work is Physical Review Materials, where the scientist has multiple contributions.

Best Publications

  • FinFET-a self-aligned double-gate MOSFET scalable to 20 nm

    D. Hisamoto;Wen-Chin Lee;J. Kedzierski;H. Takeuchi

  • Nanomechanical oscillations in a single-C60 transistor

    Hongkun Park;Hongkun Park;Jiwoong Park;Andrew K. L. Lim;Erik H. Anderson

  • Scanned probe microscopy of electronic transport in carbon nanotubes.

    A. Bachtold;A. Bachtold;M. S. Fuhrer;M. S. Fuhrer;S. Plyasunov;S. Plyasunov;M. Forero;M. Forero

  • Interferometer‐controlled scanning transmission X‐ray microscopes at the Advanced Light Source

    A.L.D. Kilcoyne;T. Tyliszczak;T. Tyliszczak;W.F. Steele;S. Fakra

  • Sub-50 nm P-channel FinFET

    Xuejue Huang;Wen-Chin Lee;C. Kuo;D. Hisamoto

  • Quasi-ballistic thermal transport from nanoscale interfaces observed using ultrafast coherent soft x-ray beams

    Mark E. Siemens;Mark E. Siemens;Qing Li;Ronggui Yang;Keith A. Nelson

  • Nanoscale molecular-switch devices fabricated by imprint lithography

    Yong Chen;Douglas A. A. Ohlberg;Xuema Li;Duncan R. Stewart

  • Demonstration of 12 nm resolution Fresnel zone plate lens based soft x-ray microscopy

    Weilun Chao;Jihoon Kim;Senajith Rekawa;Peter Fischer

  • Diffraction-limited imaging in a scanning transmission x-ray microscope

    C. Jacobsen;S. Williams;E. Anderson;M.T. Browne

  • Real space soft x-ray imaging at 10 nm spatial resolution.

    Weilun Chao;Peter Fischer;T. Tyliszczak;Senajith Rekawa

  • A new regime of nanoscale thermal transport: Collective diffusion increases dissipation efficiency

    Kathleen M. Hoogeboom-Pot;Jorge N. Hernandez-Charpak;Xiaokun Gu;Travis D. Frazer

  • Sub-60-nm quasi-planar FinFETs fabricated using a simplified process

    N. Lindert;L. Chang;Yang-Kyu Choi;E.H. Anderson

  • Dynamics of freely swimming flexible foils

    Silas Alben;Charles Witt;T. Vernon Baker;Erik Anderson

  • Circularly symmetric operation of a concentric‐circle‐grating, surface‐ emitting, AlGaAs/GaAs quantum‐well semiconductor laser

    T. Erdogan;O. King;G. W. Wicks;D. G. Hall

  • Nanofabrication and diffractive optics for high-resolution x-ray applications

    Erik H. Anderson;Deirdre L. Olynick;Bruce Harteneck;Eugene Veklerov

  • Magnetic soft x-ray microscopy at 15 nm resolution probing nanoscale local magnetic hysteresis "invited…

    Dong-Hyun Kim;Peter Fischer;Weilun Chao;Erik Anderson

  • Soft X-ray microscopy of nanomagnetism

    Peter Fischer;Dong-Hyun Kim;Weilun Chao;J. Alexander Liddle

  • Chemical profiling of single nanotubes: Intramolecular p-n-p junctions and on-tube single-electron transistors

    Jing Kong;Jien Cao;Hongjie Dai;Erik Anderson

  • Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution

    Courtney A. Brewer;Fernando Brizuela;Przemyslaw Wachulak;Dale H. Martz

  • Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic

    Patrick Naulleau;Kenneth A. Goldberg;Erik H. Anderson;Kevin Bradley

Frequent Co-Authors

Jeffrey Bokor
Jeffrey Bokor University of California, Berkeley
Peter Fischer
Peter Fischer Lawrence Berkeley National Laboratory
Henry C. Kapteyn
Henry C. Kapteyn University of Colorado Boulder
Margaret M. Murnane
Margaret M. Murnane University of Colorado Boulder
Ronggui Yang
Ronggui Yang Peking University
Harald Ade
Harald Ade North Carolina State University
Chenming Hu
Chenming Hu University of California, Berkeley
Tsu-Jae King
Tsu-Jae King University of California, Berkeley

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