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D-Index & Metrics

Electronics and Electrical Engineering

D-Index
35
Citations
5204
World Ranking
5565
National Ranking
236

Overview

Kazuhiko Endo is a researcher affiliated with the National Institute of Advanced Industrial Science and Technology in Japan. Their work spans multiple fields including engineering and dentistry, addressing topics related to both materials science and biomedical applications.

The main fields of study for Kazuhiko Endo include:

  • Engineering
  • Dentistry

Their work touches on several specialized subfields such as:

  • Electrical and Electronic Engineering
  • Biomedical Engineering
  • Orthodontics
  • Oral Surgery
  • Condensed Matter Physics

Kazuhiko Endo's research covers a range of topics, including:

  • Dental materials and restorations
  • Bone Tissue Engineering Materials
  • Dental Implant Techniques and Outcomes
  • Semiconductor materials and devices
  • Advancements in Semiconductor Devices and Circuit Design
  • Superconducting Materials and Applications
  • Physics of Superconductivity and Magnetism

Their recent publications reflect these research interests, featuring studies such as:

  • Stereolithographic Surgical Guide with a Combination of Tooth and Bone Support: Accuracy of Guided Implant Surgery in Distal Extension Situation (2020, Journal of Clinical Medicine)
  • Protective Effects of GIC and S-PRG Filler Restoratives on Demineralization of Bovine Enamel in Lactic Acid Solution (2020, Materials)
  • High-quality nanodisk of InGaN/GaN MQWs fabricated by neutral-beam-etching and GaN regrowth: towards directional micro-LED in top-down structure (2020, Semiconductor Science and Technology)
  • Defect generation and recovery in high-k HfO2/SiO2/Si stack fabrication (2023, Applied Physics Express)
  • Effect of photofunctionalization on titanium bone-implant integration in ovariectomized rats (2022, Dental Materials Journal)

Frequent collaborators working alongside Kazuhiko Endo include:

  • Daisuke Ohori
  • Takashi Nezu
  • Seiji Samukawa
  • Yiming Li
  • Jenn-Hwan Tarng

Kazuhiko Endo publishes regularly in a selection of specialized journals, with multiple contributions to:

  • Dental Materials Journal
  • Applied Physics Express
  • IEEE Open Journal of Nanotechnology
  • Japanese Journal of Applied Physics
  • ECS Meeting Abstracts

Best Publications

  • Method for vapor deposition of a metal compound film

    Kazuhiko Endo;Motofumi Saitoh

  • Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

    Kazuhiko Endo;Toru Tatsumi

  • Grain-Orientation Induced Work Function Variation in Nanoscale Metal-Gate Transistors—Part I: Modeling, Analysis, and Experimental Validation

    Hamed F Dadgour;Kazuhiko Endo;Vivek K De;K Banerjee

  • Plasma deposition of low-dielectric-constant fluorinated amorphous carbon

    Kazuhiko Endo;Keisuke Shinoda;Toru Tatsumi

  • Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

    Kazuhiko Endo;Toru Tatsumi

  • Demonstration, analysis, and device design considerations for independent DG MOSFETs

    M. Masahara;Yongxun Liu;K. Sakamoto;K. Endo

  • Investigation of the TiN Gate Electrode With Tunable Work Function and Its Application for FinFET Fabrication

    Yongxun Liu;S. Kijima;E. Sugimata;M. Masahara

  • Modeling and analysis of grain-orientation effects in emerging metal-gate devices and implications for SRAM reliability

    H. Dadgour;K. Endo;V. De;K. Banerjee

  • A normally-off GaN FET with high threshold voltage uniformity using a novel piezo neutralization technique

    K. Ota;K. Endo;Y. Okamoto;Y. Ando

  • A novel method for the 3-dimensional simulation of orthognathic surgery by using a multimodal image-fusion technique.

    Jun Uechi;Miki Okayama;Takanori Shibata;Takeshi Muguruma

  • SEMICONDUCTOR DEVICE WITH AMORPHOUS CARBON LAYER

    Endo Kajuhikko

  • Thin film forming method and a semiconductor device manufacturing method

    Kazuhiko Endo

  • Chemical Modification of Metallic Implant Surfaces with Biofunctional Proteins

    Kazuhiko Endo

  • Grain-Orientation Induced Work Function Variation in Nanoscale Metal-Gate Transistors—Part II: Implications for Process, Device, and Circuit Design

    Hamed F Dadgour;Kazuhiko Endo;Vivek K De;Kaustav Banerjee

  • Fluorinated Amorphous Carbon as a Low-Dielectric-Constant Interlayer Dielectric

    Kazuhiko Endo

  • Ten-years degradation of resin-dentin bonds.

    Masanori Hashimoto;Shinichi Fujita;Futami Nagano;Hiroki Ohno

  • Cointegration of High-Performance Tied-Gate Three-Terminal FinFETs and Variable Threshold-Voltage Independent-Gate Four-Terminal FinFETs With Asymmetric Gate-Oxide Thicknesses

    Yongxun Liu;T. Matsukawa;K. Endo;M. Masahara

  • Suppressing V t and G m variability of FinFETs using amorphous metal gates for 14 nm and beyond

    Takashi Matsukawa;Yongxun Liu;Wataru Mizubayashi;Junichi Tsukada

  • Semiconductor device and its manufacturing method

    Heiji Watanabe;Kazuhiko Endo;Kenzo Manabe

  • Micro X-ray diffraction study of superelastic nickel-titanium orthodontic wires at different temperatures and stresses.

    M. Iijima;H. Ohno;I. Kawashima;K. Endo

  • Comprehensive analysis of variability sources of FinFET characteristics

    T. Matsukawa;S. O'uchi;K. Endo;Y. Ishikawa

Frequent Co-Authors

Toru Tatsumi
Toru Tatsumi NEC (Japan)
Seiji Samukawa
Seiji Samukawa Tohoku University
Kaustav Banerjee
Kaustav Banerjee University of California, Santa Barbara
Toyohiro Chikyow
Toyohiro Chikyow National Institute for Materials Science
Byung-Gook Park
Byung-Gook Park Seoul National University
Vivek De
Vivek De Intel (United States)
Sadafumi Yoshida
Sadafumi Yoshida National Institute of Advanced Industrial Science and Technology
Yasumitsu Miyata
Yasumitsu Miyata Tokyo Metropolitan University
Akira Toriumi
Akira Toriumi University of Tokyo
Yasuo Takahashi
Yasuo Takahashi Hokkaido University

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