World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
35
Citations
5204
World Ranking
5565
National Ranking
236

Kazuhiko Endo publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Kazuhiko Endo sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 398 publications — 74th percentile

74% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Kazuhiko Endo D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Kazuhiko Endo sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 35 D-Index — 21st percentile

21% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Kazuhiko Endo is a researcher affiliated with the National Institute of Advanced Industrial Science and Technology in Japan. Their work spans multiple fields including engineering and dentistry, addressing topics related to both materials science and biomedical applications.

The main fields of study for Kazuhiko Endo include:

  • Engineering
  • Dentistry

Their work touches on several specialized subfields such as:

  • Electrical and Electronic Engineering
  • Biomedical Engineering
  • Orthodontics
  • Oral Surgery
  • Condensed Matter Physics

Kazuhiko Endo's research covers a range of topics, including:

  • Dental materials and restorations
  • Bone Tissue Engineering Materials
  • Dental Implant Techniques and Outcomes
  • Semiconductor materials and devices
  • Advancements in Semiconductor Devices and Circuit Design
  • Superconducting Materials and Applications
  • Physics of Superconductivity and Magnetism

Their recent publications reflect these research interests, featuring studies such as:

  • Stereolithographic Surgical Guide with a Combination of Tooth and Bone Support: Accuracy of Guided Implant Surgery in Distal Extension Situation (2020, Journal of Clinical Medicine)
  • Protective Effects of GIC and S-PRG Filler Restoratives on Demineralization of Bovine Enamel in Lactic Acid Solution (2020, Materials)
  • High-quality nanodisk of InGaN/GaN MQWs fabricated by neutral-beam-etching and GaN regrowth: towards directional micro-LED in top-down structure (2020, Semiconductor Science and Technology)
  • Defect generation and recovery in high-k HfO2/SiO2/Si stack fabrication (2023, Applied Physics Express)
  • Effect of photofunctionalization on titanium bone-implant integration in ovariectomized rats (2022, Dental Materials Journal)

Frequent collaborators working alongside Kazuhiko Endo include:

  • Daisuke Ohori
  • Takashi Nezu
  • Seiji Samukawa
  • Yiming Li
  • Jenn-Hwan Tarng

Kazuhiko Endo publishes regularly in a selection of specialized journals, with multiple contributions to:

  • Dental Materials Journal
  • Applied Physics Express
  • IEEE Open Journal of Nanotechnology
  • Japanese Journal of Applied Physics
  • ECS Meeting Abstracts

Best Publications

  • Method for vapor deposition of a metal compound film

    Kazuhiko Endo;Motofumi Saitoh

  • Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

    Kazuhiko Endo;Toru Tatsumi

  • Grain-Orientation Induced Work Function Variation in Nanoscale Metal-Gate Transistors—Part I: Modeling, Analysis, and Experimental Validation

    Hamed F Dadgour;Kazuhiko Endo;Vivek K De;K Banerjee

  • Plasma deposition of low-dielectric-constant fluorinated amorphous carbon

    Kazuhiko Endo;Keisuke Shinoda;Toru Tatsumi

  • Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

    Kazuhiko Endo;Toru Tatsumi

  • Demonstration, analysis, and device design considerations for independent DG MOSFETs

    M. Masahara;Yongxun Liu;K. Sakamoto;K. Endo

  • Investigation of the TiN Gate Electrode With Tunable Work Function and Its Application for FinFET Fabrication

    Yongxun Liu;S. Kijima;E. Sugimata;M. Masahara

  • Modeling and analysis of grain-orientation effects in emerging metal-gate devices and implications for SRAM reliability

    H. Dadgour;K. Endo;V. De;K. Banerjee

  • A normally-off GaN FET with high threshold voltage uniformity using a novel piezo neutralization technique

    K. Ota;K. Endo;Y. Okamoto;Y. Ando

  • A novel method for the 3-dimensional simulation of orthognathic surgery by using a multimodal image-fusion technique.

    Jun Uechi;Miki Okayama;Takanori Shibata;Takeshi Muguruma

  • SEMICONDUCTOR DEVICE WITH AMORPHOUS CARBON LAYER

    Endo Kajuhikko

  • Thin film forming method and a semiconductor device manufacturing method

    Kazuhiko Endo

  • Chemical Modification of Metallic Implant Surfaces with Biofunctional Proteins

    Kazuhiko Endo

  • Grain-Orientation Induced Work Function Variation in Nanoscale Metal-Gate Transistors—Part II: Implications for Process, Device, and Circuit Design

    Hamed F Dadgour;Kazuhiko Endo;Vivek K De;Kaustav Banerjee

  • Fluorinated Amorphous Carbon as a Low-Dielectric-Constant Interlayer Dielectric

    Kazuhiko Endo

  • Ten-years degradation of resin-dentin bonds.

    Masanori Hashimoto;Shinichi Fujita;Futami Nagano;Hiroki Ohno

  • Cointegration of High-Performance Tied-Gate Three-Terminal FinFETs and Variable Threshold-Voltage Independent-Gate Four-Terminal FinFETs With Asymmetric Gate-Oxide Thicknesses

    Yongxun Liu;T. Matsukawa;K. Endo;M. Masahara

  • Suppressing V t and G m variability of FinFETs using amorphous metal gates for 14 nm and beyond

    Takashi Matsukawa;Yongxun Liu;Wataru Mizubayashi;Junichi Tsukada

  • Semiconductor device and its manufacturing method

    Heiji Watanabe;Kazuhiko Endo;Kenzo Manabe

  • Micro X-ray diffraction study of superelastic nickel-titanium orthodontic wires at different temperatures and stresses.

    M. Iijima;H. Ohno;I. Kawashima;K. Endo

  • Comprehensive analysis of variability sources of FinFET characteristics

    T. Matsukawa;S. O'uchi;K. Endo;Y. Ishikawa

Frequent Co-Authors

Toru Tatsumi
Toru Tatsumi NEC (Japan)
Seiji Samukawa
Seiji Samukawa Tohoku University
Kaustav Banerjee
Kaustav Banerjee University of California, Santa Barbara
Toyohiro Chikyow
Toyohiro Chikyow National Institute for Materials Science
Byung-Gook Park
Byung-Gook Park Seoul National University
Vivek De
Vivek De Intel (United States)
Sadafumi Yoshida
Sadafumi Yoshida National Institute of Advanced Industrial Science and Technology
Yasumitsu Miyata
Yasumitsu Miyata Tokyo Metropolitan University
Akira Toriumi
Akira Toriumi University of Tokyo
Yasuo Takahashi
Yasuo Takahashi Hokkaido University

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Related Online Degrees & Career Pathways

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Additionally, competency-based online colleges offer tailored learning experiences focused on mastering specific skills. This approach is especially beneficial for engineers seeking to update or deepen expertise without traditional classroom constraints.

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