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Seiji Samukawa

Seiji Samukawa

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
39
Citations
9179
World Ranking
4603
National Ranking
180

Research.com Recognitions

  • 2018 - IEEE Fellow For contributions to damage-free plasma processing for nano-device manufacturing

Overview

Seiji Samukawa is affiliated with Tohoku University in Japan and has contributed extensively to the field of engineering, with a focus on materials science. Their research spans several subfields, including electrical and electronic engineering, materials chemistry, condensed matter physics, biomedical engineering, and civil and structural engineering.

Their work primarily addresses semiconductor materials and devices, GaN-based semiconductor devices and materials, advancements in semiconductor devices and circuit design, nanowire synthesis and applications, as well as thermal radiation and cooling technologies. Thermal properties of materials and plasma diagnostics and applications are also significant topics within their research portfolio.

Seiji Samukawa has published in a variety of scientific journals. Frequent publication venues include:

  • IEEE Open Journal of Nanotechnology
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Japanese Journal of Applied Physics
  • IEEE Transactions on Electron Devices
  • Materials Today Advances

Their recent published papers include:

  • "The 2022 Plasma Roadmap: low temperature plasma science and technology," 2022, Journal of Physics D Applied Physics
  • "IEEE Transactions on Nanotechnology," 2021, IEEE Transactions on Nanotechnology
  • "Neutral oxygen irradiation enhanced forming-less ZnO-based transparent analog memristor devices for neuromorphic computing applications," 2020, Nanotechnology
  • "3.5 × 3.5 μm2 GaN blue micro-light-emitting diodes with negligible sidewall surface nonradiative recombination," 2023, Nature Communications
  • "First Demonstration of Heterogeneous IGZO/Si CFET Monolithic 3-D Integration With Dual Work Function Gate for Ultralow-Power SRAM and RF Applications," 2022, IEEE Transactions on Electron Devices

Among frequent co-authors, Seiji Samukawa has collaborated with the following researchers:

  • Yiming Li
  • Daisuke Ohori
  • Kazuhiko Endo
  • Yao-Jen Lee
  • Jenn-Hwan Tarng

Seiji Samukawa was awarded the IEEE Fellow distinction in 2018 for contributions to damage-free plasma processing for nano-device manufacturing.

Best Publications

  • The 2017 Plasma Roadmap: Low temperature plasma science and technology

    I. Adamovich;S. D. Baalrud;A. Bogaerts;P. J. Bruggeman

  • The 2012 Plasma Roadmap

    Seiji Samukawa;Masaru Hori;Shahid Rauf;Kunihide Tachibana

  • Plasma processing method and equipment used therefor

    Seiji Samukawa

  • Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching

    Seiji Samukawa

  • Time-modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species

    Seiji Samukawa;Shuichi Furuoya

  • Pulse-time-modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge-free etching

    Seiji Samukawa;Hiroto Ohtake;Tetsu Mieno

  • Highly Selective and Highly Anisotropic SiO2 Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma

    Seiji Samukawa

  • Pulse‐time‐modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch‐free polycrystalline silicon patterning

    Seiji Samukawa

  • Pulse‐time modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and less‐charging polycrystalline silicon patterning

    Seiji Samukawa;Kazuo Terada

  • Ultrahigh frequency versus inductively coupled chlorine plasmas: Comparisons of Cl and Cl2 concentrations and electron temperatures measured by trace rare gases optical emission spectroscopy

    M. V. Malyshev;M. V. Malyshev;V. M. Donnelly;Seiji Samukawa

  • Dynamics of pulsed-power chlorine plasmas

    M. V. Malyshev;V. M. Donnelly;J. I. Colonell;Seiji Samukawa

  • Low dielectric constant insulating film and method for forming the same

    Seiji Samukawa;Shigeo Yasuhara;Shingo Kadomura;Tsutomu Shimayama

  • Plasma-etching method and apparatus therefor

    Seiji Samukawa

  • Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias

    Seiji Samukawa

  • On-wafer monitoring system

    Seiji Samukawa;Tadashi Shinmura;Mitsuru Okigawa

  • Charge‐free etching process using positive and negative ions in pulse‐time modulated electron cyclotron resonance plasma with low‐frequency bias

    Hiroto Ohtake;Seiji Samukawa

  • New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes

    Seiji Samukawa;Yukito Nakagawa;Tsutomu Tsukada;Hiroyuki Ueyama

  • 50 nm gate electrode patterning using a neutral-beam etching system

    Shuichi Noda;Hirotomo Nishimori;Tohru Ida;Tsunetoshi Arikado

  • On-Wafer Monitoring of Vacuum-Ultraviolet Radiation Damage in High-Density Plasma Processes.

    Seiji Samukawa;Yasushi Ishikawa;Shinya Kumagai;Mitsuru Okigawa

  • Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique

    Butsurin Jinnai;Seiichi Fukuda;Hiroto Ohtake;Seiji Samukawa

  • A 7-nm nanocolumn structure fabricated by using a ferritin iron-core mask and low-energy Cl neutral beams

    Tomohiro Kubota;Tomohiro Baba;Seiji Samukawa;Hiroyuki Kawashima

  • Time-Modulated Electron Cyclotron Resonance Plasma Discharge For Controlling The Polymerization In sio2Etching

    Seiji Samukawa

  • New radical control method for high-performance dielectric etching with nonperfluorocompound gas chemistries in ultrahigh-frequency plasma

    Seiji Samukawa;Tomonori Mukai;Ken-ichiro Tsuda

  • First Demonstration of CMOS Inverter and 6T-SRAM Based on GAA CFETs Structure for 3D-IC Applications

    S.-W. Chang;J.-H. Li;M.-K. Huang;Y.-C. Huang

  • Ultimate top-down etching processes for future nanoscale devices

    S. Samukawa;T. Kubota

Frequent Co-Authors

Takashi Fuyuki
Takashi Fuyuki Nara Institute of Science and Technology
Noritaka Usami
Noritaka Usami Nagoya University
Satoshi Yamasaki
Satoshi Yamasaki Kanazawa University
Yoshiaki Nakano
Yoshiaki Nakano University of Tokyo
Tomokazu Matsue
Tomokazu Matsue Tohoku University
Kohei M. Itoh
Kohei M. Itoh Keio University
Masaki Tanemura
Masaki Tanemura Nagoya Institute of Technology
Taiichi Otsuji
Taiichi Otsuji Tohoku University
Shinichi Takagi
Shinichi Takagi University of Tokyo
Yukinori Ochiai
Yukinori Ochiai NEC (Japan)

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