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Seiji Samukawa

Seiji Samukawa

Tohoku University
Japan

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 39 4603 4418 180 171 591 9179

Seiji Samukawa publications per year

The chart shows the history of publications by Seiji Samukawa between 1988 and 2026, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Seiji Samukawa published across 39 years, from 1988 to 2026, averaging 17.2 papers a year. Output peaked at 58 publications in 2016. 4 of the 669 publications appeared in the last two years.

No. of publications
10 20 30 40 50
Bar chart. Horizontal axis: year, 1988 to 2026. Vertical axis: number of publications, 0 to 58. Peak 58 publications in 2016. 1988: 1 publication 1989: 1 publication 1990: 9 publications 1991: 9 publications 1992: 5 publications 1993: 6 publications 1994: 7 publications 1995: 3 publications 1996: 19 publications 1997: 11 publications 1998: 20 publications 1999: 14 publications 2000: 11 publications 2001: 8 publications 2002: 13 publications 2003: 13 publications 2004: 13 publications 2005: 13 publications 2006: 21 publications 2007: 17 publications 2008: 18 publications 2009: 25 publications 2010: 31 publications 2011: 22 publications 2012: 34 publications 2013: 36 publications 2014: 30 publications 2015: 25 publications 2016: 58 publications 2017: 34 publications 2018: 21 publications 2019: 40 publications 2020: 30 publications 2021: 19 publications 2022: 12 publications 2023: 10 publications 2024: 6 publications 2025: 3 publications 2026: 1 publication
1988 2026

669 publications in total across all disciplines

View publications per year as a table
Seiji Samukawa: publications per year, 1988 to 2026
Year Publications
1988 1
1989 1
1990 9
1991 9
1992 5
1993 6
1994 7
1995 3
1996 19
1997 11
1998 20
1999 14
2000 11
2001 8
2002 13
2003 13
2004 13
2005 13
2006 21
2007 17
2008 18
2009 25
2010 31
2011 22
2012 34
2013 36
2014 30
2015 25
2016 58
2017 34
2018 21
2019 40
2020 30
2021 19
2022 12
2023 10
2024 6
2025 3
2026 1
Total 669
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Seiji Samukawa publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Seiji Samukawa sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 574–593 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 591 publications — 90th percentile

90% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403
174–193 445
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58 591
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
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Seiji Samukawa D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Seiji Samukawa sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 39 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 39 D-Index — 33rd percentile

33% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220
38 214
39 214 39
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
Download as CSV

Research.com Recognitions

  • 2018 - IEEE Fellow For contributions to damage-free plasma processing for nano-device manufacturing

Overview

Seiji Samukawa is affiliated with Tohoku University in Japan and has contributed extensively to the field of engineering, with a focus on materials science. Their research spans several subfields, including electrical and electronic engineering, materials chemistry, condensed matter physics, biomedical engineering, and civil and structural engineering.

Their work primarily addresses semiconductor materials and devices, GaN-based semiconductor devices and materials, advancements in semiconductor devices and circuit design, nanowire synthesis and applications, as well as thermal radiation and cooling technologies. Thermal properties of materials and plasma diagnostics and applications are also significant topics within their research portfolio.

Seiji Samukawa has published in a variety of scientific journals. Frequent publication venues include:

  • IEEE Open Journal of Nanotechnology
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Japanese Journal of Applied Physics
  • IEEE Transactions on Electron Devices
  • Materials Today Advances

Their recent published papers include:

  • "The 2022 Plasma Roadmap: low temperature plasma science and technology," 2022, Journal of Physics D Applied Physics
  • "IEEE Transactions on Nanotechnology," 2021, IEEE Transactions on Nanotechnology
  • "Neutral oxygen irradiation enhanced forming-less ZnO-based transparent analog memristor devices for neuromorphic computing applications," 2020, Nanotechnology
  • "3.5 × 3.5 μm2 GaN blue micro-light-emitting diodes with negligible sidewall surface nonradiative recombination," 2023, Nature Communications
  • "First Demonstration of Heterogeneous IGZO/Si CFET Monolithic 3-D Integration With Dual Work Function Gate for Ultralow-Power SRAM and RF Applications," 2022, IEEE Transactions on Electron Devices

Among frequent co-authors, Seiji Samukawa has collaborated with the following researchers:

  • Yiming Li
  • Daisuke Ohori
  • Kazuhiko Endo
  • Yao-Jen Lee
  • Jenn-Hwan Tarng

Seiji Samukawa was awarded the IEEE Fellow distinction in 2018 for contributions to damage-free plasma processing for nano-device manufacturing.

Best Publications

  • The 2017 Plasma Roadmap: Low temperature plasma science and technology

    I. Adamovich;S. D. Baalrud;A. Bogaerts;P. J. Bruggeman

  • The 2012 Plasma Roadmap

    Seiji Samukawa;Masaru Hori;Shahid Rauf;Kunihide Tachibana

  • Plasma processing method and equipment used therefor

    Seiji Samukawa

  • Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching

    Seiji Samukawa

  • Time-modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species

    Seiji Samukawa;Shuichi Furuoya

  • Pulse-time-modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge-free etching

    Seiji Samukawa;Hiroto Ohtake;Tetsu Mieno

  • Highly Selective and Highly Anisotropic SiO2 Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma

    Seiji Samukawa

  • Pulse‐time‐modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch‐free polycrystalline silicon patterning

    Seiji Samukawa

  • Pulse‐time modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and less‐charging polycrystalline silicon patterning

    Seiji Samukawa;Kazuo Terada

  • Ultrahigh frequency versus inductively coupled chlorine plasmas: Comparisons of Cl and Cl2 concentrations and electron temperatures measured by trace rare gases optical emission spectroscopy

    M. V. Malyshev;M. V. Malyshev;V. M. Donnelly;Seiji Samukawa

  • Dynamics of pulsed-power chlorine plasmas

    M. V. Malyshev;V. M. Donnelly;J. I. Colonell;Seiji Samukawa

  • Low dielectric constant insulating film and method for forming the same

    Seiji Samukawa;Shigeo Yasuhara;Shingo Kadomura;Tsutomu Shimayama

  • Plasma-etching method and apparatus therefor

    Seiji Samukawa

  • Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias

    Seiji Samukawa

  • On-wafer monitoring system

    Seiji Samukawa;Tadashi Shinmura;Mitsuru Okigawa

  • Charge‐free etching process using positive and negative ions in pulse‐time modulated electron cyclotron resonance plasma with low‐frequency bias

    Hiroto Ohtake;Seiji Samukawa

  • New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes

    Seiji Samukawa;Yukito Nakagawa;Tsutomu Tsukada;Hiroyuki Ueyama

  • 50 nm gate electrode patterning using a neutral-beam etching system

    Shuichi Noda;Hirotomo Nishimori;Tohru Ida;Tsunetoshi Arikado

  • On-Wafer Monitoring of Vacuum-Ultraviolet Radiation Damage in High-Density Plasma Processes.

    Seiji Samukawa;Yasushi Ishikawa;Shinya Kumagai;Mitsuru Okigawa

  • Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique

    Butsurin Jinnai;Seiichi Fukuda;Hiroto Ohtake;Seiji Samukawa

  • A 7-nm nanocolumn structure fabricated by using a ferritin iron-core mask and low-energy Cl neutral beams

    Tomohiro Kubota;Tomohiro Baba;Seiji Samukawa;Hiroyuki Kawashima

  • Time-Modulated Electron Cyclotron Resonance Plasma Discharge For Controlling The Polymerization In sio2Etching

    Seiji Samukawa

  • New radical control method for high-performance dielectric etching with nonperfluorocompound gas chemistries in ultrahigh-frequency plasma

    Seiji Samukawa;Tomonori Mukai;Ken-ichiro Tsuda

  • First Demonstration of CMOS Inverter and 6T-SRAM Based on GAA CFETs Structure for 3D-IC Applications

    S.-W. Chang;J.-H. Li;M.-K. Huang;Y.-C. Huang

  • Ultimate top-down etching processes for future nanoscale devices

    S. Samukawa;T. Kubota

Frequent Co-Authors

Ichiro Yamashita
Ichiro Yamashita Osaka University
Kazuhiko Endo
Kazuhiko Endo National Institute of Advanced Industrial Science and Technology
Noritaka Usami
Noritaka Usami Nagoya University
Takashi Fuyuki
Takashi Fuyuki Nara Institute of Science and Technology
Takahito Ono
Takahito Ono Tohoku University
Satoshi Yamasaki
Satoshi Yamasaki Kanazawa University
Yoshiaki Nakano
Yoshiaki Nakano University of Tokyo
Yoshitaka Okada
Yoshitaka Okada University of Tokyo
Tomokazu Matsue
Tomokazu Matsue Tohoku University
Kohei M. Itoh
Kohei M. Itoh Keio University

External Links

Personal website of Seiji Samukawa Google Scholar page

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Best Scientists Citing Seiji Samukawa

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Publications: 70

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Dmitry Lubomirsky

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Publications: 37

Kenneth S. Collins

Kenneth S. Collins

Applied Materials (United States)

Publications: 32

Geun Young Yeom

Geun Young Yeom

Sungkyunkwan University

Publications: 32

Annemie Bogaerts

Annemie Bogaerts

University of Antwerp

Publications: 31

Julian Schulze

Julian Schulze

Ruhr University Bochum

Publications: 28

Shahid Rauf

Shahid Rauf

Applied Materials (United States)

Publications: 26

Mark J. Kushner

Mark J. Kushner

University of Michigan–Ann Arbor

Publications: 25

Takahito Ono

Takahito Ono

Tohoku University

Publications: 25

Mikhail R. Baklanov

Mikhail R. Baklanov

North China University of Technology

Publications: 22

Ichiro Yamashita

Ichiro Yamashita

Osaka University

Publications: 20

Kostya Ostrikov

Kostya Ostrikov

Queensland University of Technology

Publications: 18

Kartik Ramaswamy

Kartik Ramaswamy

Applied Materials (United States)

Publications: 16

Volker Hessel

Volker Hessel

University of Adelaide

Publications: 14

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Olivier Joubert

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Publications: 14

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Vladimir Stojanovic

University of California, Berkeley

Publications: 12

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