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Yukinori Ochiai

Yukinori Ochiai

D-Index & Metrics

Materials Science

D-Index
40
Citations
4777
World Ranking
12849
National Ranking
817

Overview

Yukinori Ochiai is affiliated with NEC in Japan, contributing to research primarily in engineering and materials science. Their work spans several subfields, including electrical and electronic engineering, materials chemistry, industrial and manufacturing engineering, artificial intelligence, and surfaces, coatings, and films.

The scientist's research interests focus on a variety of topics such as 3D IC and through-silicon via (TSV) technologies, manufacturing process and optimization, advancements in semiconductor devices and circuit design, photonic and optical devices, neural networks and reservoir computing, thin-film transistor technologies, and machine learning in materials science.

Yukinori Ochiai has published in several notable venues reflecting their diverse research contributions, including:

  • IEEE Transactions on Very Large Scale Integration (VLSI) Systems
  • IEEJ Transactions on Sensors and Micromachines
  • arXiv (Cornell University)

Recent publications demonstrate a mix of applied semiconductor fabrication and data platform development in materials science. These papers include:

  • "Agile-X: A Structured-ASIC Created With a Mask-Less Lithography System Enabling Low-Cost and Agile Chip Fabrication" (2024, IEEE Transactions on Very Large Scale Integration (VLSI) Systems)
  • "Edge Quality Control of an Optical Racetrack Resonator by Character Projection/Variable-shaped Beam Method to Optimize Pattern Approximation in F7000S-VD02" (2022, IEEJ Transactions on Sensors and Micromachines)
  • "ARIM-mdx Data System: Towards a Nationwide Data Platform for Materials Science" (2024, arXiv (Cornell University))

Throughout these works, Yukinori has collaborated with a range of coauthors, frequently working alongside Yoshio Mita, as well as Atsutake Kosuge, Hirofumi Sumi, Naonobu Shimamoto, and Yurie Inoue.

Best Publications

  • Ultrahigh resolution of calixarene negative resist in electron beam lithography

    J. Fujita;Y. Ohnishi;Y. Ochiai;S. Matsui

  • Patterns in the bulk growth of carbon nanotubes

    T.W. Ebbesen;H. Hiura;J. Fujita;Y. Ochiai

  • Focused ion beam applications to solid state devices

    Shinji Matsui;Yukinori Ochiai

  • Free-space-wiring fabrication in nano-space by focused-ion-beam chemical vapor deposition

    Takahiko Morita;Reo Kometani;Keiichiro Watanabe;Kazuhiro Kanda

  • Effects of thermal annealing on porous silicon photoluminescence dynamics

    Norio Ookubo;Haruhiko Ono;Yukinori Ochiai;Yasunori Mochizuki

  • Observation and characteristics of mechanical vibration in three-dimensional nanostructures and pillars grown by focused ion beam chemical vapor deposition

    J. Fujita;M. Ishida;T. Sakamoto;Y. Ochiai

  • Room temperature replication in spin on glass by nanoimprint technology

    S. Matsui;Y. Igaku;H. Ishigaki;J. Fujita

  • Room-temperature nanoimprint and nanotransfer printing using hydrogen silsequioxane

    S. Matsui;Y. Igaku;H. Ishigaki;J. Fujita

  • Sub-10-nm planar-bulk-CMOS devices using lateral junction control

    H. Wakabayashi;S. Yamagami;N. Ikezawa;A. Ogura

  • Diameter-Controlled Carbon Nanotubes Grown from Lithographically Defined Nanoparticles

    Masahiko Ishida;Hiroo Hongo;Fumiyuki Nihey;Yukinori Ochiai

  • Development of three-dimensional pattern-generating system for focused-ion-beam chemical-vapor deposition

    T. Hoshino;K. Watanabe;R. Kometani;T. Morita

  • Sub-10-nm-scale lithography using p-chloromethyl-methoxy-calix[4]arene resist

    Masahiko Ishida;Jun-ichi Fujita;Takashi Ogura;Yukinori Ochiai

  • In situ observation of carbon-nanopillar tubulization caused by liquidlike iron particles.

    Toshinari Ichihashi;Jun-ichi Fujita;Masahiko Ishida;Yukinori Ochiai

  • Growth of three-dimensional nano-structures using FIB-CVD and its mechanical properties

    J. Fujita;M. Ishida;T. Ichihashi;Y. Ochiai

  • Nanomanipulator and actuator fabrication on glass capillary by focused-ion-beam-chemical vapor deposition

    Reo Kometani;Takahiko Morita;Keiichiro Watanabe;Takayuki Hoshino

  • Focused ion beam-induced fabrication of tungsten structures

    M. Ishida;J. Fujita;T. Ichihashi;Y. Ochiai

  • Carbon nanopillar laterally grown with electron beam-induced chemical vapor deposition

    J. Fujita;M. Ishida;T. Ichihashi;Y. Ochiai

  • Nature of phase transitions of superconducting wire networks in a magnetic field.

    X. S. Ling;H. J. Lezec;M. J. Higgins;Jaw Shen Tsai

  • Nanometer‐scale resolution of calixarene negative resist in electron beam lithography

    J. Fujita;Y. Ohnishi;Y. Ochiai;E. Nomura

  • Bi-layer resist method for room-temperature nanoimprint lithography

    K. Nakamatsu;K. Watanabe;K. Tone;T. Katase

  • Liquid metal alloy ion sources for B, Sb, and Si

    K. Gamo;T. Ukegawa;Y. Inomoto;Y. Ochiai

Frequent Co-Authors

Jun-ichi Fujita
Jun-ichi Fujita University of Tsukuba
Sumio Iijima
Sumio Iijima Meijo University
Masako Yudasaka
Masako Yudasaka National Institute of Advanced Industrial Science and Technology
Katsumi Tanigaki
Katsumi Tanigaki Beijing Academy of Quantum Information Sciences
Seiji Samukawa
Seiji Samukawa Tohoku University
Yasunobu Nakamura
Yasunobu Nakamura University of Tokyo
Yoshimi Kubo
Yoshimi Kubo National Institute for Materials Science
Paul Chaikin
Paul Chaikin New York University
Toru Tatsumi
Toru Tatsumi NEC (Japan)
Ken Takeuchi
Ken Takeuchi University of Tokyo

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