World's Best Scientists 2026 revealed!
Jun-ichi Fujita

Jun-ichi Fujita

D-Index & Metrics

Materials Science

D-Index
51
Citations
7616
World Ranking
10032
National Ranking
607

Jun-ichi Fujita publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Jun-ichi Fujita sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 289 publications — 57th percentile

57% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Jun-ichi Fujita D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Jun-ichi Fujita sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 51 D-Index — 24th percentile

24% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Jun-ichi Fujita is affiliated with the University of Tsukuba in Japan and has contributed extensively to the fields of Materials Science and Engineering. Their research primarily focuses on Materials Chemistry and Electrical and Electronic Engineering, with significant attention to Renewable Energy, Sustainability and the Environment, Biomedical Engineering, and Polymers and Plastics.

Fujita's work spans a variety of topics related to advanced materials and energy conversion technologies. Key areas of research include:

  • Electrocatalysts for Energy Conversion
  • Graphene Research and Applications
  • Carbon Nanotubes in Composites
  • Fuel Cells and Related Materials
  • Advanced Battery Technologies Research
  • Rheology and Fluid Dynamics Studies
  • Ionic Liquids Properties and Applications

The scientist has frequently published in several well-known academic journals, with recurring contributions to:

  • Scientific Reports
  • The Journal of Physical Chemistry B
  • ACS Catalysis
  • Advanced Functional Materials
  • ACS Photonics

Notable recent papers by Fujita include:

  • "Acceleration of Electrochemical CO2 Reduction to Formate at the Sn/Reduced Graphene Oxide Interface" (2021, ACS Catalysis)
  • "Catalytic Activity of Graphene-Covered Non-Noble Metals Governed by Proton Penetration in Electrochemical Hydrogen Evolution Reaction" (2021, Nature Communications)
  • "Corrosion-Resistant and High-Entropic Non-Noble-Metal Electrodes for Oxygen Evolution in Acidic Media" (2022, Advanced Materials)
  • "Phase-Dependent Reactivity of Nickel Molybdates for Electrocatalytic Urea Oxidation" (2020, ACS Applied Energy Materials)
  • "Inhibiting Surface Diffusion to Synthesize 3D Bicontinuous Nanoporous N-Doped Carbon for Boosting Oxygen Reduction Reaction in Flexible All-Solid-State Al-Air Batteries" (2021, Advanced Functional Materials)

In their collaborative research, Fujita has worked repeatedly with a number of coauthors, including:

  • Yoshikazu Ito
  • Samuel Jeong
  • Syogo Tejima
  • Tatsuhiko Ohto
  • Kailong Hu

Best Publications

  • Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition

    Shinji Matsui;Takashi Kaito;Jun-ichi Fujita;Masanori Komuro

  • Role of sp3 defect structures in graphite and carbon nanotubes

    H. Hiura;T. W. Ebbesen;J. Fujita;K. Tanigaki

  • Ultrahigh resolution of calixarene negative resist in electron beam lithography

    J. Fujita;Y. Ohnishi;Y. Ochiai;S. Matsui

  • Patterns in the bulk growth of carbon nanotubes

    T.W. Ebbesen;H. Hiura;J. Fujita;Y. Ochiai

  • Boosting electrochemical water splitting via ternary NiMoCo hybrid nanowire arrays

    Kailong Hu;Mingxing Wu;Satoshi Hinokuma;Satoshi Hinokuma;Tatsuhiko Ohto

  • Lithium intercalation into bilayer graphene

    Kemeng Ji;Jiuhui Han;Akihiko Hirata;Takeshi Fujita

  • Free-space-wiring fabrication in nano-space by focused-ion-beam chemical vapor deposition

    Takahiko Morita;Reo Kometani;Keiichiro Watanabe;Kazuhiro Kanda

  • Acceleration of Electrochemical CO2 Reduction to Formate at the Sn/Reduced Graphene Oxide Interface

    Takuya Tsujiguchi;Yusuke Kawabe;Samuel Jeong;Tatsuhiko Ohto

  • Preferentially oriented epitaxial Y‐Ba‐Cu‐O films prepared by the ion beam sputtering method

    J. Fujita;T. Yoshitake;A. Kamijo;T. Satoh

  • Catalytic activity of graphene-covered non-noble metals governed by proton penetration in electrochemical hydrogen evolution reaction

    Kailong Hu;Tatsuhiko Ohto;Yuki Nagata;Mitsuru Wakisaka;Mitsuru Wakisaka

  • Observation and characteristics of mechanical vibration in three-dimensional nanostructures and pillars grown by focused ion beam chemical vapor deposition

    J. Fujita;M. Ishida;T. Sakamoto;Y. Ochiai

  • Room temperature replication in spin on glass by nanoimprint technology

    S. Matsui;Y. Igaku;H. Ishigaki;J. Fujita

  • Cooperation between holey graphene and NiMo alloy for hydrogen evolution in an acidic electrolyte

    Yoshikazu Ito;Tatsuhiko Ohto;Daisuke Hojo;Mitsuru Wakisaka;Mitsuru Wakisaka

  • Room-temperature nanoimprint and nanotransfer printing using hydrogen silsequioxane

    S. Matsui;Y. Igaku;H. Ishigaki;J. Fujita

  • Crystal growth of C60 thin films on layered substrates

    Katsumi Tanigaki;Sadanori Kuroshima;Jun Ichi Fujita;Thomas W. Ebbesen

  • Near room temperature chemical vapor deposition of graphene with diluted methane and molten gallium catalyst.

    Jun-ichi Fujita;Takaki Hiyama;Ayaka Hirukawa;Takahiro Kondo

  • Chemical Dopants on Edge of Holey Graphene Accelerate Electrochemical Hydrogen Evolution Reaction.

    Akichika Kumatani;Chiho Miura;Hirotaka Kuramochi;Tatsuhiko Ohto

  • Development of three-dimensional pattern-generating system for focused-ion-beam chemical-vapor deposition

    T. Hoshino;K. Watanabe;R. Kometani;T. Morita

  • Sub-10-nm-scale lithography using p-chloromethyl-methoxy-calix[4]arene resist

    Masahiko Ishida;Jun-ichi Fujita;Takashi Ogura;Yukinori Ochiai

  • Holographic Manipulation of a Cold Atomic Beam

    Makoto Morinaga;Masami Yasuda;Tetsuo Kishimoto;Fujio Shimizu

  • Manipulation of an atomic beam by a computer-generated hologram

    J. Fujita;M. Morinaga;T. Kishimoto;M. Yasuda

Frequent Co-Authors

Yukinori Ochiai
Yukinori Ochiai NEC (Japan)
Yoshikazu Ito
Yoshikazu Ito University of Tsukuba
Katsumi Tanigaki
Katsumi Tanigaki Beijing Academy of Quantum Information Sciences
Yoshimi Kubo
Yoshimi Kubo National Institute for Materials Science
Yoshichika Bando
Yoshichika Bando Kyoto University
Takahito Terashima
Takahito Terashima Kyoto University
Yasunobu Nakamura
Yasunobu Nakamura University of Tokyo
Thomas W. Ebbesen
Thomas W. Ebbesen University of Strasbourg
Paul Chaikin
Paul Chaikin New York University
Shin-ya Koshihara
Shin-ya Koshihara Tokyo Institute of Technology

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