Sidlgata V. Sreenivasan

Best Publications

• Step and flash imprint lithography: a new approach to high-resolution patterning

  Matthew Colburn;Stephen C. Johnson;Michael D. Stewart;S. Damle

  962
  Citations

• Imprint Lithography Template Having a Feature Size Under 250 nm

  Todd C. Bailey;Byung-Jin Choi;Matthew E. Colburn;Sidlgata V. Sreenivasan

  541
  Citations

• Step and flash imprint lithography: Template surface treatment and defect analysis

  T. Bailey;B. J. Choi;M. Colburn;M. Meissl

  518
  Citations

• Method of determining alignment between substrate, and template spaced apart from the substrate at predetermined distance

  Byung Jin Choi;チョイ，ビュン・ジン;Matthew Colburn;コルバーン，マシュー

  499
  Citations

• Mammalian cells preferentially internalize hydrogel nanodiscs over nanorods and use shape-specific uptake mechanisms

  Rachit Agarwal;Vikramjit Singh;Patrick Jurney;Li Shi

  446
  Citations

• Step and repeat imprint lithography processes

  Sidlgata V. Sreenivasan;Byung-Jin Choi;Norman E. Schumaker;Ronald D. Voisin

  435
  Citations

• Step and repeat imprint lithography systems

  Sidlgata V. Sreenivasan;Michael P. C. Watts;Byung Jin Choi;Mario J. Meissl

  303
  Citations

• Alignment systems for imprint lithography

  Sidlgata V Sreenivasan;Michael P. C. Watts;Byung Jin Choi;Ronald D. Voisin

  259
  Citations

• Apparatus for imprint lithography using an electric field

  Sidlgata V. Sreenivasan;Roger T. Bonnecaze;Carlton Grant Willson

  254
  Citations

• Alignment methods for imprint lithography

  Sidlgata V Sreenivasan;Michael P. C. Watts;Byung J. Choi;Ronald D. Voisin

  243
  Citations

• A method and a mold to arrange features on a substrate to replicate features having minimal dimensional variability

  Sidlgata V. Sreenivasan;Michael P. C. Watts

  240
  Citations

• Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

  P. Ruchhoeft;M. Colburn;B. Choi;H. Nounu

  221
  Citations

• Design of orientation stages for step and flash imprint lithography

  B.J. Choi;S.V. Sreenivasan;S. Johnson;M. Colburn

  212
  Citations

• Step & flash imprint lithography

  Douglas J. Resnick;S.V. Sreenivasan;C. Grant Willson

  202
  Citations

• Forming a Layer on a Substrate

  Sidlgata V. Sreenivasan;Michael P. C. Watts

  185
  Citations

• Imprint lithography for integrated circuit fabrication

  D. J. Resnick;W. J. Dauksher;D. Mancini;K. J. Nordquist

  181
  Citations

• Step and flash imprint lithography for sub-100-nm patterning

  Matthew Colburn;Annette Grot;Marie N. Amistoso;Byung Jin Choi

  170
  Citations

• Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits.

  S.V. Sreenivasan

  166
  Citations

• High-resolution overlay alignment systems for imprint lithography

  Sidlgata V. Sreenivasan;Byung J. Choi;Matthew Colburn;Todd Bailey

  164
  Citations

• Development and advantages of step-and-flash lithography

  M. Colburn;T. Bailey;B. J. Choi;John G Ekerdt

  155
  Citations