What is he best known for?
The fields of study he is best known for:
- Organic chemistry
- Oxygen
- Hydrogen
His primary areas of study are Inorganic chemistry, Catalysis, Lithography, Nanotechnology and Thin film.
His studies deal with areas such as Acetaldehyde, Photochemistry, Molecule, Oxygen and Copper as well as Inorganic chemistry.
His Catalysis research is multidisciplinary, incorporating perspectives in Chemical reaction, Adsorption and Zirconium dioxide.
His Lithography research includes elements of Wafer, Flash, Aspect ratio, Photolithography and Reactive-ion etching.
In most of his Nanotechnology studies, his work intersects topics such as Amorphous solid.
His Thin film research incorporates elements of Molecular beam epitaxy, Group 2 organometallic chemistry, Chemical vapor deposition and Semiconductor.
His most cited work include:
- Step and flash imprint lithography: a new approach to high-resolution patterning (595 citations)
- Step and flash imprint lithography: Template surface treatment and defect analysis (407 citations)
- Electrical and spectroscopic comparison of HfO2/Si interfaces on nitrided and un-nitrided Si(100) (249 citations)
What are the main themes of his work throughout his whole career to date?
John G. Ekerdt focuses on Analytical chemistry, Inorganic chemistry, Thin film, Chemical vapor deposition and X-ray photoelectron spectroscopy.
John G. Ekerdt has included themes like Silicon, Epitaxy, Desorption, Thermal desorption spectroscopy and Atomic layer deposition in his Analytical chemistry study.
His work in Inorganic chemistry addresses issues such as Catalysis, which are connected to fields such as Methanol, Chemical reaction and Molybdenum.
As part of one scientific family, John G. Ekerdt deals mainly with the area of Thin film, narrowing it down to issues related to the Amorphous solid, and often Alloy and Dielectric.
The X-ray photoelectron spectroscopy study combines topics in areas such as Monolayer, Transmission electron microscopy, Substrate and Nitride.
His study in Nanotechnology is interdisciplinary in nature, drawing from both Nanoimprint lithography and Flash.
He most often published in these fields:
- Analytical chemistry (29.23%)
- Inorganic chemistry (23.50%)
- Thin film (18.85%)
What were the highlights of his more recent work (between 2012-2021)?
- Atomic layer deposition (15.85%)
- Epitaxy (15.57%)
- Thin film (18.85%)
In recent papers he was focusing on the following fields of study:
John G. Ekerdt mainly investigates Atomic layer deposition, Epitaxy, Thin film, Analytical chemistry and Optoelectronics.
His Atomic layer deposition study is related to the wider topic of Nanotechnology.
His Epitaxy research integrates issues from Polarization, Annealing, Strontium titanate and Scanning electron microscope.
His Thin film research incorporates themes from Deposition, Chemical vapor deposition, Nucleation, Diffraction and Electrical resistivity and conductivity.
John G. Ekerdt works on Analytical chemistry which deals in particular with X-ray photoelectron spectroscopy.
Within one scientific family, John G. Ekerdt focuses on topics pertaining to Oxide under Optoelectronics, and may sometimes address concerns connected to Metal and Inorganic chemistry.
Between 2012 and 2021, his most popular works were:
- A silicon-based photocathode for water reduction with an epitaxial SrTiO3 protection layer and a nanostructured catalyst (228 citations)
- Highly controllable and stable quantized conductance and resistive switching mechanism in single-crystal TiO2 resistive memory on silicon. (91 citations)
- Atomic layer deposition of photoactive CoO/SrTiO3 and CoO/TiO2 on Si(001) for visible light driven photoelectrochemical water oxidation (74 citations)
In his most recent research, the most cited papers focused on:
- Organic chemistry
- Oxygen
- Hydrogen
Atomic layer deposition, Analytical chemistry, X-ray photoelectron spectroscopy, Epitaxy and Thin film are his primary areas of study.
His work carried out in the field of Atomic layer deposition brings together such families of science as Inorganic chemistry and Etching.
His Analytical chemistry research is multidisciplinary, relying on both Electron diffraction, Transmission electron microscopy and Molecular beam epitaxy.
His studies in X-ray photoelectron spectroscopy integrate themes in fields like Crystallinity, Cobalt and Crystallite.
John G. Ekerdt combines subjects such as Amorphous solid and Annealing with his study of Epitaxy.
The study incorporates disciplines such as Optoelectronics, Plasmon and Silicon in addition to Nanotechnology.
This overview was generated by a machine learning system which analysed the scientist’s
body of work. If you have any feedback, you can
contact us
here.
