World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
62
Citations
14063
World Ranking
6461
National Ranking
1642

Chemistry

D-Index
63
Citations
13985
World Ranking
8436
National Ranking
2427

John G. Ekerdt publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where John G. Ekerdt sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 385 publications — 75th percentile

75% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

John G. Ekerdt D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where John G. Ekerdt sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 62 D-Index — 51st percentile

51% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2012 - Fellow of the American Association for the Advancement of Science (AAAS)

Overview

John G. Ekerdt is affiliated with The University of Texas at Austin in the United States. Their research spans across the fields of Engineering and Materials Science, with significant contributions to Electrical and Electronic Engineering and Materials Chemistry as subfields. Their work is focused on topics such as semiconductor materials and devices, electronic and structural properties of oxides, and ferroelectric and piezoelectric materials.

Their research topics also include catalytic processes in materials science, advanced memory and neural computing, ferroelectric and negative capacitance devices, and ZnO doping and properties.

Some of the recent papers authored or coauthored by John G. Ekerdt include:

  • Anodized Nickel Foam for Oxygen Evolution Reaction in Fe-Free and Unpurified Alkaline Electrolytes at High Current Densities, 2021, ACS Nano
  • Long-life LiNi0.5Mn1.5O4/graphite lithium-ion cells with an artificial graphite-electrolyte interface, 2021, Energy storage materials
  • Materials for emergent silicon-integrated optical computing, 2021, Journal of Applied Physics
  • Composition and annealing effects on the linear electro-optic response of solution-deposited barium strontium titanate, 2020, Journal of the American Ceramic Society
  • Electro-optic response in epitaxially stabilized orthorhombic mm2 BaTiO3, 2021, Physical Review Materials

Frequent coauthors in their publications include Himamshu C. Nallan, Brennan M. Coffey, Alexander A. Demkov, Agham Posadas, and Chon Hei Lam.

Their work has been published in a range of venues, notably the Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Physical Review Materials, ACS Nano, Energy Storage Materials, and the Journal of Applied Physics.

John G. Ekerdt has also contributed to book publications, including the 2024 release of the Handbook of Molecular Beam Epitaxy of Oxide Materials, published by World Scientific.

Their work has been recognized with the Fellow of the American Association for the Advancement of Science (AAAS) award received in 2012.

Best Publications

  • Step and flash imprint lithography: a new approach to high-resolution patterning

    Matthew Colburn;Stephen C. Johnson;Michael D. Stewart;S. Damle

  • Step and flash imprint lithography: Template surface treatment and defect analysis

    T. Bailey;B. J. Choi;M. Colburn;M. Meissl

  • A silicon-based photocathode for water reduction with an epitaxial SrTiO3 protection layer and a nanostructured catalyst

    Li Ji;Martin D. Mcdaniel;Shijun Wang;Agham-Bayan S Posadas

  • Role of the oxygen molecule and of the photogenerated electron in TiO2- photocatalyzed air oxidation reactions

    Joerg Schwitzgebel;John G. Ekerdt;Heinz Gerischer;Adam Heller

  • Growth of Group III Nitrides. A Review of Precursors and Techniques

    Deborah A. Neumayer;John G. Ekerdt

  • Electrical and spectroscopic comparison of HfO2/Si interfaces on nitrided and un-nitrided Si(100)

    P. D. Kirsch;C. S. Kang;J. Lozano;J. C. Lee

  • Structure and Properties of Li―Si Alloys: A First-Principles Study

    Hyunwoo Kim;Chia Yun Chou;John G Ekerdt;Gyeong S Hwang

  • Synthesis of hydrocarbons from CO and H2 over silica-supported Ru: Reaction rate measurements and infrared spectra of adsorbed species

    John G. Ekerdt;Alexis T. Bell

  • Cleaving the β--O--4 bonds of lignin model compounds in an acidic ionic liquid, 1-H-3-methylimidazolium chloride: an optional strategy for the degradation of lignin.

    Songyan Jia;Blair J. Cox;Xinwen Guo;Z. Conrad Zhang

  • A Raman and ultraviolet diffuse reflectance spectroscopic investigation of alumina-supported molybdenum oxide

    Clark C. Williams;Clark C. Williams;John G. Ekerdt;Jih Mirn Jehng;Franklin D. Hardcastle;Franklin D. Hardcastle

  • Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

    P. Ruchhoeft;M. Colburn;B. Choi;H. Nounu

  • Infrared studies of the adsorption of synthesis gas on zirconium dioxide

    Ming-Yuan He;John G. Ekerdt

  • Attachment of TiO2 Powders to Hollow Glass Microbeads: Activity of the TiO2 ‐ Coated Beads in the Photoassisted Oxidation of Ethanol to Acetaldehyde

    N. B. Jackson;N. B. Jackson;C. M. Wang;C. M. Wang;Z. Luo;J. Schwitzgebel

  • Hydrolytic Cleavage of β-O-4 Ether Bonds of Lignin Model Compounds in an Ionic Liquid with Metal Chlorides

    Songyan Jia;Songyan Jia;Blair J. Cox;Xinwen Guo;Z. Conrad Zhang

  • Imprint lithography for integrated circuit fabrication

    D. J. Resnick;W. J. Dauksher;D. Mancini;K. J. Nordquist

  • Catalytic degradation of lignin model compounds in acidic imidazolium based ionic liquids: Hammett acidity and anion effects

    Blair J. Cox;Songyan Jia;Songyan Jia;Z. Conrad Zhang;John G. Ekerdt

  • Step and flash imprint lithography for sub-100-nm patterning

    Matthew Colburn;Annette Grot;Marie N. Amistoso;Byung Jin Choi

  • Nucleation and growth study of atomic layer deposited HfO 2 gate dielectrics resulting in improved scaling and electron mobility

    P. D. Kirsch;M. A. Quevedo-Lopez;H. J. Li;Y. Senzaki

  • Surface chemistry of organophosphorus compounds

    John G Ekerdt;K. J. Klabunde;J. R. Shapley;J. M. White

  • Highly controllable and stable quantized conductance and resistive switching mechanism in single-crystal TiO2 resistive memory on silicon.

    Chengqing Hu;Martin D. McDaniel;Agham-Bayan S Posadas;Alexander A Demkov

  • Depolymerization of oak wood lignin under mild conditions using the acidic ionic liquid 1-H-3-methylimidazolium chloride as both solvent and catalyst.

    Blair J. Cox;John G. Ekerdt

Frequent Co-Authors

Alexander A. Demkov
Alexander A. Demkov The University of Texas at Austin
J. M. White
J. M. White The University of Texas at Austin
Richard A. Jones
Richard A. Jones The University of Texas at Austin
Sanjay K. Banerjee
Sanjay K. Banerjee The University of Texas at Austin
Alan H. Cowley
Alan H. Cowley The University of Texas at Austin
C. Grant Willson
C. Grant Willson The University of Texas at Austin
Matthew E. Colburn
Matthew E. Colburn Facebook (United States)
Carlton G Willson
Carlton G Willson The University of Texas at Austin
Edward T. Yu
Edward T. Yu The University of Texas at Austin
Martha R. McCartney
Martha R. McCartney Arizona State University

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