Carlton G Willson

Best Publications

• Step and flash imprint lithography: a new approach to high-resolution patterning

  Matthew Colburn;Stephen C. Johnson;Michael D. Stewart;S. Damle

  962
  Citations

• Block Copolymer Lithography

  Christopher M. Bates;Michael J. Maher;Dustin W. Janes;Christopher J. Ellison

  685
  Citations

• Introduction to microlithography

  L. F. Thompson;C. G. Willson;M. J. Bowden

  661
  Citations

• Step and flash imprint lithography

  Carlton Grant Willson;Matthew Earl Colburn

  655
  Citations

• Imprint Lithography Template Having a Feature Size Under 250 nm

  Todd C. Bailey;Byung-Jin Choi;Matthew E. Colburn;Sidlgata V. Sreenivasan

  541
  Citations

• Step and flash imprint lithography: Template surface treatment and defect analysis

  T. Bailey;B. J. Choi;M. Colburn;M. Meissl

  518
  Citations

• Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains.

  Christopher M. Bates;Takehiro Seshimo;Michael J. Maher;William J. Durand

  442
  Citations

• Novel second‐order nonlinear optical polymers via chemical cross‐linking‐induced vitrification under electric field

  Manfred Eich;Bernd Reck;Do Y. Yoon;C. Grant Willson

  426
  Citations

• Apparatus for imprint lithography using an electric field

  Sidlgata V. Sreenivasan;Roger T. Bonnecaze;Carlton Grant Willson

  254
  Citations

• Airborne chemical contamination of a chemically amplified resist

  Scott A. MacDonald;Nicholas J. Clecak;H. R. Wendt;C. Grant Willson

  228
  Citations

• Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

  P. Ruchhoeft;M. Colburn;B. Choi;H. Nounu

  221
  Citations

• Step & flash imprint lithography

  Douglas J. Resnick;S.V. Sreenivasan;C. Grant Willson

  202
  Citations

• Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication

  Elizabeth A. Costner;Michael W. Lin;Wei-Lun Jen;C. Grant Willson

  196
  Citations

• Imprint lithography for integrated circuit fabrication

  D. J. Resnick;W. J. Dauksher;D. Mancini;K. J. Nordquist

  181
  Citations

• Step and flash imprint lithography for sub-100-nm patterning

  Matthew Colburn;Annette Grot;Marie N. Amistoso;Byung Jin Choi

  170
  Citations

• Design of high‐χ block copolymers for lithography

  William J. Durand;Gregory Blachut;Michael J. Maher;Stephen Sirard

  169
  Citations

• The Mechanism of Phenolic Polymer Dissolution: A New Perspective

  Pavlos C. Tsiartas;Lewis W. Flanagin;Clifford L. Henderson;William D. Hinsberg

  164
  Citations

• High resolution templates for step and flash imprint lithography

  D. J. Resnick;W. J. Dauksher;D. Mancini;K. J. Nordquist

  143
  Citations

• Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

  Austin P. Lane;XiaoMin Yang;Michael J. Maher;Gregory Blachut

  139
  Citations

• Step and flash imprint lithography: Defect analysis

  T. Bailey;B. Smith;B. J. Choi;M. Colburn

  138
  Citations

• Interfacial Design for Block Copolymer Thin Films

  Michael J. Maher;Christopher M. Bates;Gregory Blachut;Stephen Sirard

  131
  Citations

• Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology

  T.C. Bailey;S.C. Johnson;S.V. Sreenivasan;J.G. Ekerdt

  130
  Citations

• Method and system for imprint lithography using an electric field

  Sidlgata Sreenivasan;Roger Bonnecaze;Carlton Willson

  126
  Citations

• Second‐order nonlinear optical properties and relaxation characteristics of poled linear epoxy polymers with tolane chromophores

  D. Jungbauer;I. Teraoka;D. Y. Yoon;B. Reck

  123
  Citations

• Template fabrication schemes for step and flash imprint lithography

  T.C. Bailey;D.J. Resnick;D. Mancini;K.J. Nordquist

  113
  Citations

• Preparation of oriented multilayers of poly(silanes) by the Langmuir-Blodgett technique

  F. W. Embs;G. Wegner;D. Neher;D. Neher;P. Albouy

  112
  Citations

• Apparatus for fabricating nanoscale patterns in light curable compositions using an electric field

  Carlton Grant Willson;Sidlgata V. Sreenivasan;Roger T. Bonnecaze

  101
  Citations

• Vinyl ethers in ultraviolet curable formulations for step and flash imprint lithography

  E. K. Kim;N. A. Stacey;B. J. Smith;M. D. Dickey

  97
  Citations

• Imprint lithography templates having alignment marks

  Todd C Bailey;Stephen C Johnson;Matthew E Colburn;Byung-Jin Choi

  85
  Citations

• Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

  R. L. Bruce;S. Engelmann;T. Lin;T. Kwon

  79
  Citations

• Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates

  D. P. Mancini;K. A. Gehoski;E. Ainley;K. J. Nordquist

  78
  Citations

• Method and system for fabricating nanoscale patterns in light curable compositions using an electric field

  Carlton Willson;Sidlgata Sreenivasan;Roger Bonnecaze

  70
  Citations