Carlton G Willson

Carlton G Willson publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Carlton G Willson sits on this spectrum.

Carlton G Willson D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Carlton G Willson sits on this spectrum.

Best Publications

• Step and flash imprint lithography: a new approach to high-resolution patterning

  Matthew Colburn;Stephen C. Johnson;Michael D. Stewart;S. Damle

  962
  Citations

• Block Copolymer Lithography

  Christopher M. Bates;Michael J. Maher;Dustin W. Janes;Christopher J. Ellison

  685
  Citations

• Introduction to microlithography

  L. F. Thompson;C. G. Willson;M. J. Bowden

  661
  Citations

• Step and flash imprint lithography

  Carlton Grant Willson;Matthew Earl Colburn

  655
  Citations

• Imprint Lithography Template Having a Feature Size Under 250 nm

  Todd C. Bailey;Byung-Jin Choi;Matthew E. Colburn;Sidlgata V. Sreenivasan

  541
  Citations

• Step and flash imprint lithography: Template surface treatment and defect analysis

  T. Bailey;B. J. Choi;M. Colburn;M. Meissl

  518
  Citations

• Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains.

  Christopher M. Bates;Takehiro Seshimo;Michael J. Maher;William J. Durand

  442
  Citations

• Novel second‐order nonlinear optical polymers via chemical cross‐linking‐induced vitrification under electric field

  Manfred Eich;Bernd Reck;Do Y. Yoon;C. Grant Willson

  426
  Citations

• Apparatus for imprint lithography using an electric field

  Sidlgata V. Sreenivasan;Roger T. Bonnecaze;Carlton Grant Willson

  254
  Citations

• Airborne chemical contamination of a chemically amplified resist

  Scott A. MacDonald;Nicholas J. Clecak;H. R. Wendt;C. Grant Willson

  228
  Citations

• Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

  P. Ruchhoeft;M. Colburn;B. Choi;H. Nounu

  221
  Citations

• Step & flash imprint lithography

  Douglas J. Resnick;S.V. Sreenivasan;C. Grant Willson

  202
  Citations

• Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication

  Elizabeth A. Costner;Michael W. Lin;Wei-Lun Jen;C. Grant Willson

  196
  Citations

• Imprint lithography for integrated circuit fabrication

  D. J. Resnick;W. J. Dauksher;D. Mancini;K. J. Nordquist

  181
  Citations

• Step and flash imprint lithography for sub-100-nm patterning

  Matthew Colburn;Annette Grot;Marie N. Amistoso;Byung Jin Choi

  170
  Citations

• Design of high‐χ block copolymers for lithography

  William J. Durand;Gregory Blachut;Michael J. Maher;Stephen Sirard

  169
  Citations

• The Mechanism of Phenolic Polymer Dissolution: A New Perspective

  Pavlos C. Tsiartas;Lewis W. Flanagin;Clifford L. Henderson;William D. Hinsberg

  164
  Citations

• High resolution templates for step and flash imprint lithography

  D. J. Resnick;W. J. Dauksher;D. Mancini;K. J. Nordquist

  143
  Citations

• Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

  Austin P. Lane;XiaoMin Yang;Michael J. Maher;Gregory Blachut

  139
  Citations

• Step and flash imprint lithography: Defect analysis

  T. Bailey;B. Smith;B. J. Choi;M. Colburn

  138
  Citations

• Interfacial Design for Block Copolymer Thin Films

  Michael J. Maher;Christopher M. Bates;Gregory Blachut;Stephen Sirard

  131
  Citations

• Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology

  T.C. Bailey;S.C. Johnson;S.V. Sreenivasan;J.G. Ekerdt

  130
  Citations

• Method and system for imprint lithography using an electric field

  Sidlgata Sreenivasan;Roger Bonnecaze;Carlton Willson

  126
  Citations

• Second‐order nonlinear optical properties and relaxation characteristics of poled linear epoxy polymers with tolane chromophores

  D. Jungbauer;I. Teraoka;D. Y. Yoon;B. Reck

  123
  Citations

• Template fabrication schemes for step and flash imprint lithography

  T.C. Bailey;D.J. Resnick;D. Mancini;K.J. Nordquist

  113
  Citations

• Preparation of oriented multilayers of poly(silanes) by the Langmuir-Blodgett technique

  F. W. Embs;G. Wegner;D. Neher;D. Neher;P. Albouy

  112
  Citations

• Apparatus for fabricating nanoscale patterns in light curable compositions using an electric field

  Carlton Grant Willson;Sidlgata V. Sreenivasan;Roger T. Bonnecaze

  101
  Citations

• Vinyl ethers in ultraviolet curable formulations for step and flash imprint lithography

  E. K. Kim;N. A. Stacey;B. J. Smith;M. D. Dickey

  97
  Citations

• Imprint lithography templates having alignment marks

  Todd C Bailey;Stephen C Johnson;Matthew E Colburn;Byung-Jin Choi

  85
  Citations

• Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

  R. L. Bruce;S. Engelmann;T. Lin;T. Kwon

  79
  Citations

• Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates

  D. P. Mancini;K. A. Gehoski;E. Ainley;K. J. Nordquist

  78
  Citations

• Method and system for fabricating nanoscale patterns in light curable compositions using an electric field

  Carlton Willson;Sidlgata Sreenivasan;Roger Bonnecaze

  70
  Citations