What is he best known for?
The fields of study he is best known for:
- Organic chemistry
- Polymer
- Catalysis
C. Grant Willson mostly deals with Nanotechnology, Lithography, Polymer chemistry, Copolymer and Resist.
His work blends Nanotechnology and New materials studies together.
His Lithography research is multidisciplinary, incorporating elements of Substrate, Reactive-ion etching, Photolithography and Nanoimprint lithography.
His Photolithography study combines topics in areas such as Copper interconnect, Photoresist, Aspect ratio, Polymer and Integrated circuit.
In Polymer chemistry, he works on issues like Polymerization, which are connected to Trifluoromethyl.
His work deals with themes such as Thin film, Chemical engineering and Monomer, which intersect with Copolymer.
His most cited work include:
- New approaches to nanofabrication: molding, printing, and other techniques. (1586 citations)
- Step and flash imprint lithography: a new approach to high-resolution patterning (595 citations)
- High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire. (360 citations)
What are the main themes of his work throughout his whole career to date?
His scientific interests lie mostly in Resist, Lithography, Nanotechnology, Polymer and Polymer chemistry.
His Resist study incorporates themes from Photoresist, Refractive index, Photolithography, Dissolution and Analytical chemistry.
His study on Lithography is covered under Optoelectronics.
His research brings together the fields of Nanolithography and Nanotechnology.
His research in Polymer intersects with topics in Photochemistry and Solubility.
His study focuses on the intersection of Polymer chemistry and fields such as Copolymer with connections in the field of Thin film and Silicon.
He most often published in these fields:
- Resist (36.18%)
- Lithography (35.68%)
- Nanotechnology (34.92%)
What were the highlights of his more recent work (between 2013-2020)?
- Copolymer (18.34%)
- Nanotechnology (34.92%)
- Lithography (35.68%)
In recent papers he was focusing on the following fields of study:
His main research concerns Copolymer, Nanotechnology, Lithography, Thin film and Chemical engineering.
His Copolymer research is multidisciplinary, incorporating perspectives in Silicon and Polymer chemistry.
The various areas that he examines in his Polymer chemistry study include Trimethylsilyl and Glass transition, Polymer, Monomer.
He regularly ties together related areas like Nano- in his Nanotechnology studies.
His studies deal with areas such as Resist, Surface finish, Substrate and Etching as well as Lithography.
His Thin film research includes themes of Wetting, Polymerization, Lamellar structure and Layer, Trench.
Between 2013 and 2020, his most popular works were:
- Block Copolymer Lithography (336 citations)
- Design of high‐χ block copolymers for lithography (80 citations)
- Interfacial Design for Block Copolymer Thin Films (71 citations)
In his most recent research, the most cited papers focused on:
- Organic chemistry
- Polymer
- Catalysis
C. Grant Willson mainly investigates Copolymer, Nanotechnology, Thin film, Lithography and Polymer chemistry.
His Silicon research extends to Nanotechnology, which is thematically connected.
C. Grant Willson interconnects Wetting, Layer, Directed self assembly and Hydrogen silsesquioxane in the investigation of issues within Thin film.
His Lithography study introduces a deeper knowledge of Optoelectronics.
C. Grant Willson has included themes like Lamellar structure, Polymerization, Chain transfer, Tin and Block in his Polymer chemistry study.
His work carried out in the field of Surface finish brings together such families of science as Resist and Critical dimension.
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