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Materials Science

D-Index
79
Citations
25406
World Ranking
2788
National Ranking
790

Research.com Recognitions

  • 2016 - Monie A. Ferst Award, Sigma Xi
  • 2012 - Fellow of the Materials Research Society
  • 2007 - SPIE Fellow
  • 1992 - Member of the National Academy of Engineering For the development and advancement of understanding of new photoresist materials for the microelectronics industry.

Overview

C. Grant Willson is affiliated with The University of Texas at Austin in the United States. Their research primarily spans the fields of Materials Science, Medicine, and Chemistry, with a particular focus on Materials Chemistry and Organic Chemistry within these broader areas.

The scientist's research interests encompass various topics, including:

  • Block Copolymer Self-Assembly
  • Advanced Polymer Synthesis and Characterization
  • Machine Learning in Materials Science
  • Synthesis and properties of polymers
  • Cancer survivorship and care
  • Lymphatic System and Diseases
  • Childhood Cancer Survivors' Quality of Life

A selection of recent publications highlights the range of their work:

  • Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces, 2020, ACS Applied Materials & Interfaces
  • Unusual Thermal Properties of Certain Poly(3,5-disubstituted styrene)s, 2020, Macromolecules
  • Co-development of a programme to improve physical activity support for women after breast cancer treatment: a pre-protocol for PURE-EX, 2025, NIHR Open Research

The scientist frequently collaborates with other researchers, including:

  • Michael J. Maher
  • Yusuke Asano
  • Nathaniel A. Lynd
  • Christopher J. Ellison
  • Ji Yeon Kim

Publication venues where the scientist has contributed work include:

  • ACS Applied Materials & Interfaces
  • Macromolecules
  • NIHR Open Research

Throughout their career, the scientist has received multiple awards and honors:

  • Monie A. Ferst Award, Sigma Xi (2016)
  • Fellow of the Materials Research Society (2012)
  • SPIE Fellow (2007)
  • Member of the National Academy of Engineering (1992) for the development and advancement of understanding of new photoresist materials for the microelectronics industry

Best Publications

  • New approaches to nanofabrication: molding, printing, and other techniques.

    Byron D. Gates;Qiaobing Xu;Michael Stewart;Declan Ryan

  • Step and flash imprint lithography: a new approach to high-resolution patterning

    Matthew Colburn;Stephen C. Johnson;Michael D. Stewart;S. Damle

  • Chemical amplification in the design of dry developing resist materials

    Hiroshi Ito;C. Grant Willson

  • Block Copolymer Lithography

    Christopher M. Bates;Michael J. Maher;Dustin W. Janes;Christopher J. Ellison

  • Introduction to microlithography

    L. F. Thompson;C. G. Willson;M. J. Bowden

  • Step and flash imprint lithography

    Carlton Grant Willson;Matthew Earl Colburn

  • Imprint Lithography Template Having a Feature Size Under 250 nm

    Todd C. Bailey;Byung-Jin Choi;Matthew E. Colburn;Sidlgata V. Sreenivasan

  • Step and flash imprint lithography: Template surface treatment and defect analysis

    T. Bailey;B. J. Choi;M. Colburn;M. Meissl

  • High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire.

    Brandon J DeKosky;Gregory C Ippolito;Ryan P Deschner;Jason J Lavinder

  • Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains.

    Christopher M. Bates;Takehiro Seshimo;Michael J. Maher;William J. Durand

  • Novel second‐order nonlinear optical polymers via chemical cross‐linking‐induced vitrification under electric field

    Manfred Eich;Bernd Reck;Do Y. Yoon;C. Grant Willson

  • Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins

    Jean M.J. Fréchet;Eva Eichler;Hiroshi Ito;C.Grant Willson

  • Chemical Amplification in High-Resolution Imaging Systems

    Scott A. MacDonald;C. Grant Willson;Jean M. J. Frechet

  • Electrochromic and optical waveguide studies of corona-poled electro-optic polymer films

    Ralph H. Page;M. C. Jurich;B. Reck;A. Sen

  • Apparatus for imprint lithography using an electric field

    Sidlgata V. Sreenivasan;Roger T. Bonnecaze;Carlton Grant Willson

  • Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications

    Julia D. Cushen;Issei Otsuka;Christopher M. Bates;Sami Halila

  • Highly efficient and stable nonlinear optical polymers via chemical cross‐linking under electric field

    D. Jungbauer;B. Reck;R. Twieg;D. Y. Yoon

  • Approaches to the Design of Radiation‐Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution

    C. Grant Willson;Hiroshi Ito;Hiroshi Ito;Jean M. J. Fréchet;Theodore G. Tessier

  • Airborne chemical contamination of a chemically amplified resist

    Scott A. MacDonald;Nicholas J. Clecak;H. R. Wendt;C. Grant Willson

  • Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

    P. Ruchhoeft;M. Colburn;B. Choi;H. Nounu

Frequent Co-Authors

Christopher J. Ellison
Christopher J. Ellison University of Minnesota
Jean M. J. Fréchet
Jean M. J. Fréchet University of California, Berkeley
Matthew E. Colburn
Matthew E. Colburn Facebook (United States)
Paul S. Weiss
Paul S. Weiss University of California, Los Angeles
Michael D. Dickey
Michael D. Dickey North Carolina State University
Mark C. Hersam
Mark C. Hersam Northwestern University
Nicholas A. Kotov
Nicholas A. Kotov University of Michigan–Ann Arbor
John G. Ekerdt
John G. Ekerdt The University of Texas at Austin
Roger T. Bonnecaze
Roger T. Bonnecaze The University of Texas at Austin

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