2016 - Monie A. Ferst Award, Sigma Xi
2012 - Fellow of the Materials Research Society
2007 - SPIE Fellow
1992 - Member of the National Academy of Engineering For the development and advancement of understanding of new photoresist materials for the microelectronics industry.
C. Grant Willson mostly deals with Nanotechnology, Lithography, Polymer chemistry, Copolymer and Resist. His work blends Nanotechnology and New materials studies together. His Lithography research is multidisciplinary, incorporating elements of Substrate, Reactive-ion etching, Photolithography and Nanoimprint lithography.
His Photolithography study combines topics in areas such as Copper interconnect, Photoresist, Aspect ratio, Polymer and Integrated circuit. In Polymer chemistry, he works on issues like Polymerization, which are connected to Trifluoromethyl. His work deals with themes such as Thin film, Chemical engineering and Monomer, which intersect with Copolymer.
His scientific interests lie mostly in Resist, Lithography, Nanotechnology, Polymer and Polymer chemistry. His Resist study incorporates themes from Photoresist, Refractive index, Photolithography, Dissolution and Analytical chemistry. His study on Lithography is covered under Optoelectronics.
His research brings together the fields of Nanolithography and Nanotechnology. His research in Polymer intersects with topics in Photochemistry and Solubility. His study focuses on the intersection of Polymer chemistry and fields such as Copolymer with connections in the field of Thin film and Silicon.
His main research concerns Copolymer, Nanotechnology, Lithography, Thin film and Chemical engineering. His Copolymer research is multidisciplinary, incorporating perspectives in Silicon and Polymer chemistry. The various areas that he examines in his Polymer chemistry study include Trimethylsilyl and Glass transition, Polymer, Monomer.
He regularly ties together related areas like Nano- in his Nanotechnology studies. His studies deal with areas such as Resist, Surface finish, Substrate and Etching as well as Lithography. His Thin film research includes themes of Wetting, Polymerization, Lamellar structure and Layer, Trench.
C. Grant Willson mainly investigates Copolymer, Nanotechnology, Thin film, Lithography and Polymer chemistry. His Silicon research extends to Nanotechnology, which is thematically connected. C. Grant Willson interconnects Wetting, Layer, Directed self assembly and Hydrogen silsesquioxane in the investigation of issues within Thin film.
His Lithography study introduces a deeper knowledge of Optoelectronics. C. Grant Willson has included themes like Lamellar structure, Polymerization, Chain transfer, Tin and Block in his Polymer chemistry study. His work carried out in the field of Surface finish brings together such families of science as Resist and Critical dimension.
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New approaches to nanofabrication: molding, printing, and other techniques.
Byron D. Gates;Qiaobing Xu;Michael Stewart;Declan Ryan.
Chemical Reviews (2005)
Step and flash imprint lithography: a new approach to high-resolution patterning
Matthew Colburn;Stephen C. Johnson;Michael D. Stewart;S. Damle.
Proceedings of SPIE - The International Society for Optical Engineering (1999)
Chemical amplification in the design of dry developing resist materials
Hiroshi Ito;C. Grant Willson.
Polymer Engineering and Science (1983)
Block Copolymer Lithography
Christopher M. Bates;Michael J. Maher;Dustin W. Janes;Christopher J. Ellison.
Novel second‐order nonlinear optical polymers via chemical cross‐linking‐induced vitrification under electric field
Manfred Eich;Bernd Reck;Do Y. Yoon;C. Grant Willson.
Journal of Applied Physics (1989)
High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire.
Brandon J DeKosky;Gregory C Ippolito;Ryan P Deschner;Jason J Lavinder.
Nature Biotechnology (2013)
Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins
Jean M.J. Fréchet;Eva Eichler;Hiroshi Ito;C.Grant Willson.
Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains.
Christopher M. Bates;Takehiro Seshimo;Michael J. Maher;William J. Durand.
Chemical Amplification in High-Resolution Imaging Systems
Scott A. MacDonald;C. Grant Willson;Jean M. J. Frechet.
Accounts of Chemical Research (1994)
Approaches to the Design of Radiation‐Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
C. Grant Willson;Hiroshi Ito;Hiroshi Ito;Jean M. J. Fréchet;Theodore G. Tessier.
Journal of The Electrochemical Society (1986)
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