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Takahiro Kozawa

Takahiro Kozawa

Takahiro Kozawa publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Takahiro Kozawa sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

The last bar groups every scientist with 1,163 publications or more.

Takahiro Kozawa D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Takahiro Kozawa sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

The last bar groups every scientist with 165 D-Index or more.

Overview

Takahiro Kozawa is affiliated with Osaka University in Japan and conducts research primarily in the fields of Engineering and Materials Science. Their work focuses on areas including Electrical and Electronic Engineering, Mechanical Engineering, and Materials Chemistry. Specific research topics cover advancements in battery materials, supercapacitor materials and fabrication, as well as extraction and separation processes.

The scientist has contributed to several publications in well-known venues, including:

  • Advanced Powder Technology
  • Journal of the Society of Powder Technology Japan
  • Scientific Reports
  • Materials & Design
  • International Journal of Applied Ceramic Technology

Some of Takahiro Kozawa's recent papers include:

  • "Effect of ball collision direction on a wet mechanochemical reaction," 2021, Scientific Reports
  • "Wet milling synthesis of NH4CoPO4·H2O platelets: Formation reaction, growth mechanism, and conversion into high-voltage LiCoPO4 cathode for Li-ion batteries," 2020, Materials Research Bulletin
  • "Carbon nanoparticle-entrapped macroporous Mn3O4 microsphere anodes with improved cycling stability for Li-ion batteries," 2022, Scientific Reports

Their research collaborations include frequent coauthors such as Makio Naito, Akira Kondo, Kayo Fukuyama, Junya Kano, and Kizuku Kushimoto.

Kozawa's publications focus notably on advanced battery materials and technologies, including supercapacitor materials and fabrication, with interests expanding to advanced materials and composites as well as photolithography techniques.

Best Publications

  • Raman scattering from LO phonon‐plasmon coupled modes in gallium nitride

    T. Kozawa;T. Kachi;H. Kano;Y. Taga

  • Radiation Chemistry in Chemically Amplified Resists

    Takahiro Kozawa;Seiichi Tagawa

  • Schottky barriers and contact resistances on p‐type GaN

    T. Mori;T. Kozawa;T. Ohwaki;Y. Taga

  • Resist Materials and Processes for Extreme Ultraviolet Lithography

    Toshiro Itani;Takahiro Kozawa

  • Acid distribution in chemically amplified extreme ultraviolet resist

    Takahiro Kozawa;Seiichi Tagawa;Heidi B. Cao;Hai Deng

  • Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography

    Hiroki Yamamoto;Takahiro Kozawa;Atsuro Nakano;Kazumasa Okamoto

  • Requirements for laser-induced desorption/ionization on submicrometer structures.

    Shoji Okuno;Ryuichi Arakawa;Kazumasa Okamoto;Yoshinori Matsui

  • Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes

    Takahiro Kozawa;Akinori Saeki;Seiichi Tagawa

  • Study of Acid-Base Equilibrium in Chemically Amplified Resist

    Kenichiro Natsuda;Takahiro Kozawa;Kazumasa Okamoto;Seiichi Tagawa

  • Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography

    Ryo Hirose;Takahiro Kozawa;Seiichi Tagawa;Toshiyuki Kai

  • Electron beam effects on blue luminescence of zinc-doped GaN

    Hiroshi Amano;Isamu Akasaki;Takahiro Kozawa;Kazumasa Hiramatsu

  • Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography

    Takahiro Kozawa;Hiroaki Oizumi;Toshiro Itani;Seiichi Tagawa

  • Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist

    Takahiro Kozawa;Hiroaki Oizumi;Toshiro Itani;Seiichi Tagawa

  • Analysis of acid yield generated in chemically amplified electron beam resist

    Takahiro Kozawa;Takumi Shigaki;Kazumasa Okamoto;Akinori Saeki

  • Monoclinic Li2TiO3 nano-particles via hydrothermal reaction: Processing and structure

    Cheng-Long Yu;Kazumichi Yanagisawa;Sumio Kamiya;Takahiro Kozawa

  • Analysis of Stochastic Effect in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography

    Takahiro Kozawa;Julius Joseph Santillan;Toshiro Itani

  • Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist

    Takahiro Kozawa;Hiroaki Oizumi;Toshiro Itani;Seiichi Tagawa

  • Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists

    Hiroki Yamamoto;Takahiro Kozawa;Seiichi Tagawa;Heidi B. Cao

  • Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography

    Takahiro Kozawa;Hiroaki Oizumi;Toshiro Itani;Seiichi Tagawa

  • Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography: Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)

    Atsuro Nakano;Takahiro Kozawa;Kazumasa Okamoto;Seiichi Tagawa

Frequent Co-Authors

Akinori Saeki
Akinori Saeki Osaka University
Shu Seki
Shu Seki Kyoto University
Kazuyuki Horie
Kazuyuki Horie University of Tokyo
Nobuhiko Sawaki
Nobuhiko Sawaki Aichi Institute of Technology

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