Takahiro Kozawa

Overview

Best Publications

• Raman scattering from LO phonon‐plasmon coupled modes in gallium nitride

  T. Kozawa;T. Kachi;H. Kano;Y. Taga

  500
  Citations

• Radiation Chemistry in Chemically Amplified Resists

  Takahiro Kozawa;Seiichi Tagawa

  395
  Citations

• Schottky barriers and contact resistances on p‐type GaN

  T. Mori;T. Kozawa;T. Ohwaki;Y. Taga

  292
  Citations

• Resist Materials and Processes for Extreme Ultraviolet Lithography

  Toshiro Itani;Takahiro Kozawa

  202
  Citations

• Acid distribution in chemically amplified extreme ultraviolet resist

  Takahiro Kozawa;Seiichi Tagawa;Heidi B. Cao;Hai Deng

  174
  Citations

• Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography

  Hiroki Yamamoto;Takahiro Kozawa;Atsuro Nakano;Kazumasa Okamoto

  161
  Citations

• Requirements for laser-induced desorption/ionization on submicrometer structures.

  Shoji Okuno;Ryuichi Arakawa;Kazumasa Okamoto;Yoshinori Matsui

  156
  Citations

• Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes

  Takahiro Kozawa;Akinori Saeki;Seiichi Tagawa

  154
  Citations

• Study of Acid-Base Equilibrium in Chemically Amplified Resist

  Kenichiro Natsuda;Takahiro Kozawa;Kazumasa Okamoto;Seiichi Tagawa

  139
  Citations

• Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography

  Ryo Hirose;Takahiro Kozawa;Seiichi Tagawa;Toshiyuki Kai

  124
  Citations

• Electron beam effects on blue luminescence of zinc-doped GaN

  Hiroshi Amano;Isamu Akasaki;Takahiro Kozawa;Kazumasa Hiramatsu

  118
  Citations

• Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography

  Takahiro Kozawa;Hiroaki Oizumi;Toshiro Itani;Seiichi Tagawa

  118
  Citations

• Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist

  Takahiro Kozawa;Hiroaki Oizumi;Toshiro Itani;Seiichi Tagawa

  117
  Citations

• Analysis of acid yield generated in chemically amplified electron beam resist

  Takahiro Kozawa;Takumi Shigaki;Kazumasa Okamoto;Akinori Saeki

  114
  Citations

• Monoclinic Li2TiO3 nano-particles via hydrothermal reaction: Processing and structure

  Cheng-Long Yu;Kazumichi Yanagisawa;Sumio Kamiya;Takahiro Kozawa

  103
  Citations

• Analysis of Stochastic Effect in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography

  Takahiro Kozawa;Julius Joseph Santillan;Toshiro Itani

  102
  Citations

• Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist

  Takahiro Kozawa;Hiroaki Oizumi;Toshiro Itani;Seiichi Tagawa

  101
  Citations

• Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists

  Hiroki Yamamoto;Takahiro Kozawa;Seiichi Tagawa;Heidi B. Cao

  97
  Citations

• Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography

  Takahiro Kozawa;Hiroaki Oizumi;Toshiro Itani;Seiichi Tagawa

  97
  Citations

• Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography: Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)

  Atsuro Nakano;Takahiro Kozawa;Kazumasa Okamoto;Seiichi Tagawa

  95
  Citations