World's Best Scientists 2026 revealed!
Jun Hatakeyama

Jun Hatakeyama

D-Index & Metrics

Materials Science

D-Index
54
Citations
10537
World Ranking
8906
National Ranking
518

Overview

Jun Hatakeyama is affiliated with Kumamoto University in Japan and has contributed to research primarily in the fields of Biochemistry, Genetics and Molecular Biology, Neuroscience, and Engineering. Their work spans various subfields including Molecular Biology, Cellular and Molecular Neuroscience, Biomedical Engineering, Developmental Neuroscience, and Cell Biology.

Their research topics cover several areas, notably:

  • Neurogenesis and neuroplasticity mechanisms
  • Cellular Mechanics and Interactions
  • Microfluidic and Bio-sensing Technologies
  • 3D Printing in Biomedical Research
  • Cerebrospinal fluid and hydrocephalus
  • Spinal Dysraphism and Malformations
  • Hedgehog Signaling Pathway Studies

Jun Hatakeyama has contributed to multiple research articles, including the following recent papers:

  • "Dysfunction of the proteoglycan Tsukushi causes hydrocephalus through altered neurogenesis in the subventricular zone in mice," 2021, Science Translational Medicine
  • "Two-Phase Lineage Specification of Telencephalon Progenitors Generated From Mouse Embryonic Stem Cells," 2021, Frontiers in Cell and Developmental Biology
  • "Microdifferential Pressure Measurement Device for Cellular Microenvironments," 2024, Bioengineering
  • "The Retinal Pigment Epithelium Is a Notch Signaling Niche in the Mouse Retina," 2022, Cell Reports
  • "Thalamocortical axons control the cytoarchitecture of neocortical layers by area-specific supply of secretory proteins," 2021, bioRxiv (Cold Spring Harbor Laboratory)

The scientist frequently collaborates with several coauthors, including:

  • Kenji Shimamura
  • Mami Akaike
  • Yuta Nakashima
  • Yoshitaka NAKANISHI
  • Naofumi Ito

Jun Hatakeyama's publications appear in a variety of scientific venues, such as:

  • Science Translational Medicine
  • Frontiers in Cell and Developmental Biology
  • Bioengineering
  • Cell Reports
  • bioRxiv (Cold Spring Harbor Laboratory)

Best Publications

  • Resist composition and patterning process

    Jun Hatakeyama

  • Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern

    Jun Hatakeyama;Takafumi Ueda;Tsutomu Ogihara;Motoaki Iwabuchi

  • Polymers, resist compositions and patterning process

    Yuji Harada;Jun Hatakeyama;Yoshio Kawai;Masaru Sasago

  • Resist material and pattern forming method using the same

    Jun Hatakeyama;Seiichiro Tachibana;誠一郎 橘;畠山 潤

  • Patterning process and resist composition

    Jun Hatakeyama;Kazuhiro Katayama;Youichi Ohsawa;Masaki Ohashi

  • Chemically amplified positive resist composition

    Jun Hatakeyama;Shigehiro Nagura;Kiyoshi Motomi;Takeshi Nagata

  • Photoresist undercoat-forming material and patterning process

    Jun Hatakeyama;Satoshi Watanabe

  • Positive resist composition and patterning process

    Jun Hatakeyama;Koji Hasegawa

  • Double patterning process

    Katsuya Takemura;Jun Hatakeyama;Tsunehiro Nishi;Kazuhiro Katayama

  • Resist underlayer film material and pattern forming method

    Jun Hatakeyama;畠山 潤

  • Ester compounds, polymers, resist compositions and patterning process

    Koji Shin-Etsu Chemicals Co. Ltd. Hasegawa;Tsunehiro Shin-Etsu Chemicals Co. Ltd. Nishi;Takeshi Shin-Etsu Chemical Co. Ltd. Kinsho;Takeru Shin-Etsu Chemical Co. Ltd. Watanabe

  • Resist protective film material and pattern formation method

    Jun Hatakeyama;Yuji Harada;Takeru Watanabe

  • Resist compositions and patterning process

    Yuji Harada;Jun Hatakeyama;Yoshio Kawai;Masaru Sasago

  • Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process

    Masaki Ohashi;Youichi Ohsawa;Takeshi Kinsho;Jun Hatakeyama

  • Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process

    Youichi Ohsawa;Masaki Ohashi;Seiichiro Tachibana;Jun Hatakeyama

  • Photoresist underlayer film forming material and pattern forming method

    Toshihiko Fujii;Jun Hatakeyama;Katsuhiro Kobayashi;Takeshi Watanabe

  • Positive resist material and pattern forming method using the same

    Koji Hasegawa;Jun Hatakeyama;Takashi Nagata;Takanobu Takeda

  • Antireflection film material, substrate having antireflection film and pattern forming method

    Jun Hatakeyama;Motoaki Iwabuchi;Tsutomu Ogiwara;Takashi Ueda

  • Pattern forming method and resist composition

    Jun Hatakeyama;畠山 潤;Koji Hasegawa;幸士 長谷川

  • Material for forming photoresist lower layer film and method for forming pattern

    Jun Hatakeyama;Satoshi Watanabe;聡 渡邉;畠山 潤

Frequent Co-Authors

Osamu Watanabe
Osamu Watanabe Tokyo Institute of Technology

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Best Scientists Citing Jun Hatakeyama

Trending Scientists

Recently Published Articles