2026 Yasin Ekinci: Materials Science Researcher – H-Index, Publications & Awards

Discipline name	D-Index	World Ranking	Current World Ranking	National Ranking	Current National Ranking	Publications	Citations
Materials Science	47	11110	10733	149	142	282	8502

Discipline name

D-Index

World Ranking

Current World Ranking

National Ranking

Current National Ranking

Publications

Citations

Materials Science

11110

10733

149

142

282

8502

Overview

Yasin Ekinci is affiliated with the Paul Scherrer Institute in Switzerland and has a research focus that spans several interconnected fields within engineering and materials science. Their body of work primarily addresses advances in photolithography and nanofabrication techniques as well as the study of semiconductor materials and devices. The integration of spectroscopy methods for material analysis also forms a significant part of their research portfolio.

The major fields of study associated with Ekinci's research include:

Engineering
Materials Science

They further specialize in subfields such as:

Electrical and Electronic Engineering
Biomedical Engineering
Surfaces, Coatings and Films
Materials Chemistry
Radiation

The scientist's research topics illustrate a focus on technological and analytical advancements, including:

Advancements in Photolithography Techniques
Nanofabrication and Lithography Techniques
Integrated Circuits and Semiconductor Failure Analysis
Electron and X-Ray Spectroscopy Techniques
Semiconductor materials and devices
Advanced X-ray Imaging Techniques
Microfluidic and Bio-sensing Technologies

Yasin Ekinci has collaborated extensively with several coauthors, establishing recurring research partnerships with:

Dimitrios Kazazis
Michaela Vockenhuber
Iacopo Mochi
Guoqiang Yang
Yi Li

The research has been published repeatedly in specific scientific venues, highlighting the areas of micro/nanopatterning and applied materials research. Key publication venues include:

Journal of Micro/Nanopatterning Materials and Metrology
ACS Applied Materials & Interfaces
Nanoscale
ACS Applied Nano Materials
ACS Applied Polymer Materials

Among notable recent publications are:

"Extreme ultraviolet lithography," 2024, Nature Reviews Methods Primers
"Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy," 2020, Journal of Materials Chemistry C
"Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography," 2020, Journal of Materials Chemistry C
"Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography," 2020, Nanoscale
"The Extent of Platinum-Induced Hydrogen Spillover on Cerium Dioxide," 2022, ACS Nano

Best Publications

Catalyst support effects on hydrogen spillover

Waiz Karim;Waiz Karim;Clelia Spreafico;Armin Kleibert;Jens Gobrecht

1015
Citations
Plasmon resonances of aluminum nanoparticles and nanorods

Y. Ekinci;H. H. Solak;Jörg F. Löffler

289
Citations
Symmetry Breaking in a Plasmonic Metamaterial at Optical Wavelength

Andre Christ;Olivier J. F. Martin;Yasin Ekinci;Nikolai A. Gippius

288
Citations
Deep-UV surface-enhanced resonance Raman scattering of adenine on aluminum nanoparticle arrays.

Shankar K. Jha;Zeeshan Ahmed;Mario Agio;Yasin Ekinci;Yasin Ekinci

274
Citations
Three-dimensional Si/Ge quantum dot crystals.

Detlev Grützmacher;Thomas Fromherz;Christian Dais;Julian Stangl

228
Citations
Controlling the Fano interference in a plasmonic lattice

A. Christ;Y. Ekinci;H. H. Solak;N. A. Gippius

219
Citations
Sub-10 nm patterning using EUV interference lithography.

Birgit Päivänranta;Andreas Langner;Eugenie Kirk;Christian David

210
Citations
Bilayer Al wire-grids as broadband and high-performance polarizers

Yasin Ekinci;Harun H. Solak;Christian David;Hans Sigg

203
Citations
Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5 nm)

Brian Cardineau;Ryan Del Re;Miles Marnell;Hashim Al-Mashat

190
Citations
Beyond EUV lithography: a comparative study of efficient photoresists' performance.

Nassir Mojarad;Jens Gobrecht;Yasin Ekinci

162
Citations
Nonlinear Superchiral Meta-Surfaces: Tuning Chirality and Disentangling Non-Reciprocity at the Nanoscale

Vk K. Valev;Jj J. Baumberg;B. De Clercq;N. Braz

160
Citations
Interference lithography at EUV and soft X-ray wavelengths

Nassir Mojarad;Jens Gobrecht;Yasin Ekinci

128
Citations
Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.

N. Mojarad;M. Hojeij;L. Wang;J. Gobrecht

108
Citations
High Aspect Ratio Plasmonic Nanostructures for Sensing Applications

Birgit Päivänranta;Hannes Merbold;Reto Giannini;Luca Büchi

106
Citations
Photon-beam lithography reaches 12.5nm half-pitch resolution

Harun H. Solak;Yasin Ekinci;Philipp Käser;Sunggook Park

104
Citations
Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

Roberto Fallica;Jason K. Stowers;Andrew Grenville;Andreas Frommhold

104
Citations
Engineering metal adhesion layers that do not deteriorate plasmon resonances.

Thomas Siegfried;Yasin Ekinci;Olivier J. F. Martin;Hans Sigg

98
Citations
Fabrication of sub-10 nm gap arrays over large areas for plasmonic sensors

Thomas Gerd Siegfried;Y. Ekinci;H. H. Solak;Olivier J. F. Martin

94
Citations
Gap plasmons and near-field enhancement in closely packed sub-10 nm gap resonators.

Thomas Siegfried;Yasin Ekinci;Olivier J. F. Martin;Hans Sigg

91
Citations
Electric and magnetic resonances in arrays of coupled gold nanoparticle in-tandem pairs

Y. Ekinci;A. Christ;M. Agio;O. J.F. Martin

87
Citations
Beyond EUV lithography: a comparative study of efficient photoresists'

Jens Gobrecht;Yasin Ekinci

0
Citations
Engineering Metal Adhesion Layers That Do Not Deteriorate Plasmon

Yasin Ekinci;Hans Sigg

0
Citations