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Kohei M. Itoh

Kohei M. Itoh

D-Index & Metrics

Materials Science

D-Index
54
Citations
15262
World Ranking
8777
National Ranking
510

Kohei M. Itoh publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Kohei M. Itoh sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 374 publications — 74th percentile

74% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Kohei M. Itoh D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Kohei M. Itoh sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 54 D-Index — 32nd percentile

32% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Kohei M. Itoh is a researcher affiliated with Keio University in Japan whose work spans several interconnected fields, including physics, engineering, and computer science. Their publications focus mainly on quantum physics and advancements relevant to quantum computing and semiconductor technology.

The main fields of study for Kohei M. Itoh include:

  • Physics and Astronomy
  • Engineering
  • Computer Science

Within these broader fields, their research specializes in several subfields:

  • Atomic and Molecular Physics, and Optics
  • Artificial Intelligence
  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Condensed Matter Physics

The primary research topics encompass:

  • Quantum and electron transport phenomena
  • Quantum Computing Algorithms and Architecture
  • Advancements in Semiconductor Devices and Circuit Design
  • Quantum Information and Cryptography
  • Semiconductor materials and devices
  • Semiconductor Quantum Structures and Devices
  • Diamond and Carbon-based Materials Research

The scientist has published in a range of venues, with notable frequent publication outlets including:

  • arXiv (Cornell University)
  • Nature Communications
  • Physical Review Applied
  • Nature
  • Physical Review B

Representative recent papers with publication year and venue are:

  • Materials challenges and opportunities for quantum computing hardware (2021, Science)
  • Operation of a silicon quantum processor unit cell above one kelvin (2020, Nature)
  • Precision tomography of a three-qubit donor quantum processor in silicon (2022, Nature)
  • Pauli Blockade in Silicon Quantum Dots with Spin-Orbit Control (2021, PRX Quantum)
  • On-demand electrical control of spin qubits (2023, Nature Nanotechnology)

Frequent coauthors collaborating with Kohei M. Itoh include:

  • Fay E. Hudson
  • Andrew S. Dzurak
  • Arne Laucht
  • Chih Hwan Yang
  • André Saraiva

Best Publications

  • An addressable quantum dot qubit with fault-tolerant control-fidelity

    M. Veldhorst;J. C. C. Hwang;C. H. Yang;A. W. Leenstra

  • A two-qubit logic gate in silicon

    M. Veldhorst;C. H. Yang;J. C. C. Hwang;W. Huang

  • A quantum-dot spin qubit with coherence limited by charge noise and fidelity higher than 99.9.

    Jun Yoneda;Kenta Takeda;Tomohiro Otsuka;Tomohiro Otsuka;Takashi Nakajima

  • Electron spin coherence exceeding seconds in high-purity silicon

    Alexei M. Tyryshkin;Shinichi Tojo;John J.L. Morton;Helge Riemann

  • Storing quantum information for 30 seconds in a nanoelectronic device

    Juha T. Muhonen;Juan P. Dehollain;Arne Laucht;Fay E. Hudson

  • Materials challenges and opportunities for quantum computing hardware

    Nathalie P. de Leon;Kohei M. Itoh;Dohun Kim;Karan K. Mehta

  • A >99.9%-fidelity quantum-dot spin qubit with coherence limited by charge noise

    J. Yoneda;K. Takeda;T. Otsuka;T. Nakajima

  • Thermal conductivity of germanium crystals with different isotopic compositions

    M. Asen-Palmer;K. Bartkowski;E. Gmelin;M. Cardona

  • All-silicon quantum computer.

    T. D. Ladd;J. R. Goldman;F. Yamaguchi;Y. Yamamoto

  • Operation of a silicon quantum processor unit cell above one kelvin

    C. H. Yang;R. C. C. Leon;J. C. C. Hwang;J. C. C. Hwang;A. Saraiva

  • Spectroscopy of surface-induced noise using shallow spins in diamond.

    Y. Romach;C. Müller;T. Unden;L. J. Rogers

  • Poisoning of SOFC anodes by various fuel impurities

    K. Haga;S. Adachi;Y. Shiratori;K. Itoh

  • Investigation of surface magnetic noise by shallow spins in diamond.

    T Rosskopf;A Dussaux;K Ohashi;M Loretz

  • Thin film photoelectrochemistry: Iron oxide

    K. Itoh;J. O'm. Bockris

  • Isotope engineering of silicon and diamond for quantum computing and sensing applications

    Kohei M. Itoh;Hideyuki Watanabe

  • Silicon qubit fidelities approaching incoherent noise limits via pulse engineering

    C. H. Yang;K. W. Chan;R. Harper;W. Huang

  • Negatively Charged Nitrogen-Vacancy Centers in a 5 nm Thin 12C Diamond Film

    K. Ohashi;T. Rosskopf;H. Watanabe;M. Loretz

  • High-sensitivity magnetometry based on quantum beats in diamond nitrogen-vacancy centers.

    Kejie Fang;Victor M. Acosta;Charles Santori;Zhihong Huang

  • Optical and Spin Coherence Properties of Nitrogen-Vacancy Centers Placed in a 100 nm Thick Isotopically Purified Diamond Layer

    Toyofumi Ishikawa;Kai Mei C. Fu;Charles Santori;Victor M. Acosta

  • Mechanism of superconductivity in the polyhedral-network compound Ba8Si46

    K. Tanigaki;T. Shimizu;K. M. Itoh;K. M. Itoh;J. Teraoka

  • Silicon quantum processor unit cell operation above one Kelvin

    C. H. Yang;R. C. C. Leon;J. C. C. Hwang;A. Saraiva

  • Stacked thin‐film photoelectrode using iron oxide

    K. Itoh;J. O’M. Bockris

  • Electron-spin phase relaxation of phosphorus donors in nuclear-spin-enriched silicon

    Eisuke Abe;Kohei M. Itoh;Junichi Isoya;Satoshi Yamasaki

  • Hopping Conduction and Metal-Insulator Transition in Isotopically Enriched Neutron-Transmutation-Doped 70 Ge:Ga

    K. M. Itoh;E. E. Haller;E. E. Haller;J. W. Beeman;W. L. Hansen

Frequent Co-Authors

Eugene E. Haller
Eugene E. Haller Lawrence Berkeley National Laboratory
David N. Jamieson
David N. Jamieson University of Melbourne
Martin S. Brandt
Martin S. Brandt Technical University of Munich
Yoshichika Onuki
Yoshichika Onuki Osaka University
Joel W. Ager
Joel W. Ager Lawrence Berkeley National Laboratory
Manuel Cardona
Manuel Cardona Max Planck Society
Peter B. Becker
Peter B. Becker Ludwig-Maximilians-Universität München
Shinichi Shikata
Shinichi Shikata Kwansei Gakuin University
Yasuo Takahashi
Yasuo Takahashi Hokkaido University
Kenji Shiraishi
Kenji Shiraishi Nagoya University

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