World's Best Scientists 2026 revealed!

D-Index & Metrics

Physics

D-Index
88
Citations
28034
World Ranking
2403
National Ranking
1207

Research.com Recognitions

  • 2011 - Member of the National Academy of Engineering For contributions to low-temperature plasmas for semiconductors, optics, and thin-film manufacturing.
  • 1990 - Fellow of American Physical Society (APS) Citation For scientific contribution to laser physics and spectroscopy, plasma chemistry, plasma and photochemical processing of materials, and pulsepowerswitch technology

Overview

Mark J. Kushner is affiliated with the University of Michigan-Ann Arbor in the United States. Their research primarily spans across engineering with a strong focus on electrical and electronic engineering. Other notable subfields include radiology, nuclear medicine and imaging, mechanics of materials, materials chemistry, and atomic and molecular physics, and optics.

Their work addresses several main topics including plasma diagnostics and applications, plasma applications and diagnostics, semiconductor materials and devices, electrohydrodynamics and fluid dynamics, metal and thin film mechanics, laser-induced spectroscopy and plasma, and dust and plasma wave phenomena.

Frequent publication venues for this researcher include:

  • Journal of Physics D Applied Physics
  • Plasma Sources Science and Technology
  • Journal of Applied Physics
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • 2022 IEEE International Conference on Plasma Science (ICOPS)

Notable recent papers authored or co-authored by Mark J. Kushner are:

  • The 2022 Plasma Roadmap: low temperature plasma science and technology (2022), Journal of Physics D Applied Physics
  • Plasma-driven solution electrolysis (2021), Journal of Applied Physics
  • Future of plasma etching for microelectronics: Challenges and opportunities (2024), Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
  • Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2 (2020), Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Generation of reactive species in water film dielectric barrier discharges sustained in argon, helium, air, oxygen and nitrogen (2020), Journal of Physics D Applied Physics

Frequent collaborators in their work include Sang Ki Nam, Mackenzie Meyer, Jordyn Polito, Steven J. Lanham, and Peter Bruggeman. This indicates active research partnerships with colleagues specializing in related plasma and materials science fields.

Mark J. Kushner has been recognized with professional honors such as being named a Member of the National Academy of Engineering in 2011 for their work involving low-temperature plasmas applied to semiconductors, optics, and thin-film manufacturing. Additionally, they were made a Fellow of the American Physical Society in 1990, acknowledging contributions in laser physics, spectroscopy, plasma chemistry, plasma and photochemical processing of materials, and pulse power switch technology.

Best Publications

  • Plasma-liquid interactions: A review and roadmap

    PJ Peter Bruggeman;MJ Kushner;BR Locke;Jge Gardeniers

  • The 2017 Plasma Roadmap: Low temperature plasma science and technology

    I. Adamovich;S. D. Baalrud;A. Bogaerts;P. J. Bruggeman

  • The 2012 Plasma Roadmap

    Seiji Samukawa;Masaru Hori;Shahid Rauf;Kunihide Tachibana

  • A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon

    Mark J. Kushner

  • A model for plasma modification of polypropylene using atmospheric pressure discharges

    Rajesh Dorai;Mark J Kushner

  • The Gaseous Electronics Conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing discharges

    P. J. Hargis;K. E. Greenberg;P. A. Miller;J. B. Gerardo

  • Two‐dimensional modeling of high plasma density inductively coupled sources for materials processing

    Peter L. G. Ventzek;Robert J. Hoekstra;Mark J. Kushner

  • Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design

    Mark J Kushner

  • O2(Δ1) production in He∕O2 mixtures in flowing low pressure plasmas

    D. Shane Stafford;Mark J. Kushner

  • Atmospheric pressure dielectric barrier discharges interacting with liquid covered tissue

    Wei Tian;Mark J Kushner

  • Numerical investigation of the kinetics and chemistry of rf glow discharge plasmas sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3 using a Monte Carlo-fluid hybrid model

    Timothy J. Sommerer;Mark J. Kushner

  • Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation

    Shahid Rauf;Mark J. Kushner

  • Modelling of microdischarge devices: plasma and gas dynamics

    Mark J Kushner

  • Large-bore copper-vapor lasers : Kinetics and scaling issues

    M. J. Kushner;B. E. Warner

  • Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical discharges

    Shahid Rauf;Mark J. Kushner

  • Reaction chemistry and optimization of plasma remediation of NxOy from gas streams

    Ann C. Gentile;Mark J. Kushner

  • Distribution of ion energies incident on electrodes in capacitively coupled rf discharges

    M. J. Kushner

  • Plasma remediation of trichloroethylene in silent discharge plasmas

    Diane Evans;Louis A. Rosocha;Graydon K. Anderson;John J. Coogan

  • Monte‐Carlo simulation of electron properties in rf parallel plate capacitively coupled discharges

    M. J. Kushner

  • Removal of SO2 from gas streams using a dielectric barrier discharge and combined plasma photolysis

    Moo Been Chang;Jeanne H. Balbach;Mark J. Rood;Mark J. Kushner

Frequent Co-Authors

Shahid Rauf
Shahid Rauf Applied Materials (United States)
Jonathan Tennyson
Jonathan Tennyson University College London
Fred E. C. Culick
Fred E. C. Culick California Institute of Technology
John R. Abelson
John R. Abelson University of Illinois at Urbana-Champaign
Yogesh B. Gianchandani
Yogesh B. Gianchandani University of Michigan–Ann Arbor
Uwe R. Kortshagen
Uwe R. Kortshagen University of Minnesota
James Gary Eden
James Gary Eden University of Illinois at Urbana-Champaign
Mark J. Rood
Mark J. Rood University of Illinois at Urbana-Champaign
Geun Young Yeom
Geun Young Yeom Sungkyunkwan University
Igor V. Adamovich
Igor V. Adamovich The Ohio State University

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Best Scientists Citing Mark J. Kushner

Trending Scientists

Recently Published Articles