World's Best Scientists 2026 revealed!

D-Index & Metrics

Physics

D-Index
88
Citations
28034
World Ranking
2403
National Ranking
1207

Mark J. Kushner publication distribution in Physics in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Physics in 2026. The highlighted bar marks where Mark J. Kushner sits on this spectrum.

103–122 publications: 7 scientists 123–142 publications: 10 scientists 143–162 publications: 31 scientists 163–182 publications: 35 scientists 183–202 publications: 53 scientists 203–222 publications: 81 scientists 223–242 publications: 85 scientists 243–262 publications: 112 scientists 263–282 publications: 114 scientists 283–302 publications: 126 scientists 303–322 publications: 136 scientists 323–342 publications: 162 scientists 343–362 publications: 155 scientists 363–382 publications: 156 scientists 383–402 publications: 134 scientists 403–422 publications: 145 scientists 423–442 publications: 147 scientists 443–462 publications: 131 scientists 463–482 publications: 131 scientists 483–502 publications: 116 scientists 503–522 publications: 106 scientists 523–542 publications: 103 scientists 543–562 publications: 87 scientists 563–582 publications: 84 scientists 583–602 publications: 94 scientists 603–622 publications: 70 scientists 623–642 publications: 76 scientists 643–662 publications: 60 scientists 663–682 publications: 54 scientists 683–702 publications: 60 scientists 703–722 publications: 48 scientists 723–742 publications: 64 scientists 743–762 publications: 48 scientists 763–782 publications: 37 scientists 783–802 publications: 43 scientists 803–822 publications: 34 scientists 823–842 publications: 36 scientists 843–862 publications: 32 scientists 863–882 publications: 32 scientists 883–902 publications: 31 scientists 903–922 publications: 25 scientists 923–942 publications: 15 scientists 943–962 publications: 24 scientists 963–982 publications: 13 scientists 983–1,002 publications: 21 scientists 1,003–1,022 publications: 21 scientists 1,023–1,042 publications: 16 scientists 1,043–1,062 publications: 9 scientists 1,063–1,082 publications: 19 scientists 1,083–1,102 publications: 11 scientists 1,103–1,122 publications: 17 scientists 1,123–1,142 publications: 11 scientists 1,143–1,162 publications: 7 scientists 1,163–1,182 publications: 4 scientists 1,183–1,202 publications: 10 scientists 1,203–1,222 publications: 8 scientists 1,223–1,242 publications: 16 scientists 1,243–1,262 publications: 4 scientists 1,263–1,282 publications: 10 scientists 1,283–1,302 publications: 5 scientists 1,303–1,322 publications: 7 scientists 1,323–1,342 publications: 4 scientists 1,343–1,362 publications: 8 scientists 1,363–1,382 publications: 6 scientists 1,383–1,402 publications: 7 scientists 1,403–1,422 publications: 3 scientists 1,423–1,442 publications: 4 scientists 1,443–1,462 publications: 4 scientists 1,463–1,468 publications: 3 scientists 1,469+ publications: 100 scientists
103 publications 1,469+

This scientist: 797 publications — 84th percentile

84% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,469 publications or more.

Mark J. Kushner D-index placement in Physics in 2026

The chart shows the D-index (discipline H-index) distribution of Physics scientists ranked by Research.com in 2026. The highlighted bar marks where Mark J. Kushner sits on this spectrum.

70–71 D-Index: 76 scientists 72–73 D-Index: 110 scientists 74–75 D-Index: 143 scientists 76–77 D-Index: 153 scientists 78–79 D-Index: 144 scientists 80–81 D-Index: 167 scientists 82–83 D-Index: 167 scientists 84–85 D-Index: 166 scientists 86–87 D-Index: 132 scientists 88–89 D-Index: 155 scientists 90–91 D-Index: 134 scientists 92–93 D-Index: 137 scientists 94–95 D-Index: 102 scientists 96–97 D-Index: 112 scientists 98–99 D-Index: 110 scientists 100–101 D-Index: 116 scientists 102–103 D-Index: 97 scientists 104–105 D-Index: 103 scientists 106–107 D-Index: 87 scientists 108–109 D-Index: 90 scientists 110–111 D-Index: 67 scientists 112–113 D-Index: 78 scientists 114–115 D-Index: 75 scientists 116–117 D-Index: 67 scientists 118–119 D-Index: 69 scientists 120–121 D-Index: 60 scientists 122–123 D-Index: 59 scientists 124–125 D-Index: 53 scientists 126–127 D-Index: 42 scientists 128–129 D-Index: 41 scientists 130–131 D-Index: 33 scientists 132–133 D-Index: 32 scientists 134–135 D-Index: 45 scientists 136–137 D-Index: 19 scientists 138–139 D-Index: 24 scientists 140–141 D-Index: 28 scientists 142–143 D-Index: 31 scientists 144–145 D-Index: 22 scientists 146–147 D-Index: 20 scientists 148–149 D-Index: 12 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 24 scientists 154–155 D-Index: 23 scientists 156–157 D-Index: 15 scientists 158–159 D-Index: 15 scientists 160–161 D-Index: 11 scientists 162–163 D-Index: 17 scientists 164–165 D-Index: 12 scientists 166–167 D-Index: 11 scientists 168–169 D-Index: 9 scientists 170–171 D-Index: 9 scientists 172–173 D-Index: 11 scientists 174–175 D-Index: 4 scientists 176–177 D-Index: 8 scientists 178–179 D-Index: 5 scientists 180–181 D-Index: 3 scientists 182–183 D-Index: 4 scientists 184 D-Index: 4 scientists 185+ D-Index: 99 scientists
70 D-Index 185+

This scientist: 88 D-Index — 36th percentile

36% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 185 D-Index or more.

Research.com Recognitions

  • 2011 - Member of the National Academy of Engineering For contributions to low-temperature plasmas for semiconductors, optics, and thin-film manufacturing.
  • 1990 - Fellow of American Physical Society (APS) Citation For scientific contribution to laser physics and spectroscopy, plasma chemistry, plasma and photochemical processing of materials, and pulsepowerswitch technology

Overview

Mark J. Kushner is affiliated with the University of Michigan-Ann Arbor in the United States. Their research primarily spans across engineering with a strong focus on electrical and electronic engineering. Other notable subfields include radiology, nuclear medicine and imaging, mechanics of materials, materials chemistry, and atomic and molecular physics, and optics.

Their work addresses several main topics including plasma diagnostics and applications, plasma applications and diagnostics, semiconductor materials and devices, electrohydrodynamics and fluid dynamics, metal and thin film mechanics, laser-induced spectroscopy and plasma, and dust and plasma wave phenomena.

Frequent publication venues for this researcher include:

  • Journal of Physics D Applied Physics
  • Plasma Sources Science and Technology
  • Journal of Applied Physics
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • 2022 IEEE International Conference on Plasma Science (ICOPS)

Notable recent papers authored or co-authored by Mark J. Kushner are:

  • The 2022 Plasma Roadmap: low temperature plasma science and technology (2022), Journal of Physics D Applied Physics
  • Plasma-driven solution electrolysis (2021), Journal of Applied Physics
  • Future of plasma etching for microelectronics: Challenges and opportunities (2024), Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
  • Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2 (2020), Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Generation of reactive species in water film dielectric barrier discharges sustained in argon, helium, air, oxygen and nitrogen (2020), Journal of Physics D Applied Physics

Frequent collaborators in their work include Sang Ki Nam, Mackenzie Meyer, Jordyn Polito, Steven J. Lanham, and Peter Bruggeman. This indicates active research partnerships with colleagues specializing in related plasma and materials science fields.

Mark J. Kushner has been recognized with professional honors such as being named a Member of the National Academy of Engineering in 2011 for their work involving low-temperature plasmas applied to semiconductors, optics, and thin-film manufacturing. Additionally, they were made a Fellow of the American Physical Society in 1990, acknowledging contributions in laser physics, spectroscopy, plasma chemistry, plasma and photochemical processing of materials, and pulse power switch technology.

Best Publications

  • Plasma-liquid interactions: A review and roadmap

    PJ Peter Bruggeman;MJ Kushner;BR Locke;Jge Gardeniers

  • The 2017 Plasma Roadmap: Low temperature plasma science and technology

    I. Adamovich;S. D. Baalrud;A. Bogaerts;P. J. Bruggeman

  • The 2012 Plasma Roadmap

    Seiji Samukawa;Masaru Hori;Shahid Rauf;Kunihide Tachibana

  • A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon

    Mark J. Kushner

  • A model for plasma modification of polypropylene using atmospheric pressure discharges

    Rajesh Dorai;Mark J Kushner

  • The Gaseous Electronics Conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing discharges

    P. J. Hargis;K. E. Greenberg;P. A. Miller;J. B. Gerardo

  • Two‐dimensional modeling of high plasma density inductively coupled sources for materials processing

    Peter L. G. Ventzek;Robert J. Hoekstra;Mark J. Kushner

  • Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design

    Mark J Kushner

  • O2(Δ1) production in He∕O2 mixtures in flowing low pressure plasmas

    D. Shane Stafford;Mark J. Kushner

  • Atmospheric pressure dielectric barrier discharges interacting with liquid covered tissue

    Wei Tian;Mark J Kushner

  • Numerical investigation of the kinetics and chemistry of rf glow discharge plasmas sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3 using a Monte Carlo-fluid hybrid model

    Timothy J. Sommerer;Mark J. Kushner

  • Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation

    Shahid Rauf;Mark J. Kushner

  • Modelling of microdischarge devices: plasma and gas dynamics

    Mark J Kushner

  • Large-bore copper-vapor lasers : Kinetics and scaling issues

    M. J. Kushner;B. E. Warner

  • Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical discharges

    Shahid Rauf;Mark J. Kushner

  • Reaction chemistry and optimization of plasma remediation of NxOy from gas streams

    Ann C. Gentile;Mark J. Kushner

  • Distribution of ion energies incident on electrodes in capacitively coupled rf discharges

    M. J. Kushner

  • Plasma remediation of trichloroethylene in silent discharge plasmas

    Diane Evans;Louis A. Rosocha;Graydon K. Anderson;John J. Coogan

  • Monte‐Carlo simulation of electron properties in rf parallel plate capacitively coupled discharges

    M. J. Kushner

  • Removal of SO2 from gas streams using a dielectric barrier discharge and combined plasma photolysis

    Moo Been Chang;Jeanne H. Balbach;Mark J. Rood;Mark J. Kushner

Frequent Co-Authors

Shahid Rauf
Shahid Rauf Applied Materials (United States)
Jonathan Tennyson
Jonathan Tennyson University College London
Fred E. C. Culick
Fred E. C. Culick California Institute of Technology
John R. Abelson
John R. Abelson University of Illinois at Urbana-Champaign
Yogesh B. Gianchandani
Yogesh B. Gianchandani University of Michigan–Ann Arbor
Uwe R. Kortshagen
Uwe R. Kortshagen University of Minnesota
James Gary Eden
James Gary Eden University of Illinois at Urbana-Champaign
Mark J. Rood
Mark J. Rood University of Illinois at Urbana-Champaign
Geun Young Yeom
Geun Young Yeom Sungkyunkwan University
Igor V. Adamovich
Igor V. Adamovich The Ohio State University

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