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D-Index & Metrics

Materials Science

D-Index
57
Citations
12285
World Ranking
7936
National Ranking
1970

Joseph W. Lyding publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Joseph W. Lyding sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 290 publications — 57th percentile

57% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Joseph W. Lyding D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Joseph W. Lyding sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 57 D-Index — 39th percentile

39% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2014 - Fellow of the American Association for the Advancement of Science (AAAS)
  • 1997 - Fellow of American Physical Society (APS) Citation For contributions to STMbased nanofabrication schemes using hydrogen and deuterium on silicon

Overview

Joseph W. Lyding is affiliated with the University of Illinois at Urbana-Champaign in the United States. Their research primarily spans the fields of Materials Science, Engineering, and Physics and Astronomy, with a focus on subfields such as Materials Chemistry, Atomic and Molecular Physics and Optics, Electrical and Electronic Engineering, Biomedical Engineering, and Electronic, Optical and Magnetic Materials.

The scientist's work covers several prominent research topics including:

  • Graphene research and applications
  • Molecular Junctions and Nanostructures
  • Electronic and Structural Properties of Oxides
  • Semiconductor materials and devices
  • Semiconductor Quantum Structures and Devices
  • Surface and Thin Film Phenomena
  • Electromagnetic wave absorption materials

Joseph W. Lyding has contributed to research published in notable venues such as ACS Nano, Nano-Micro Letters, Nano Research, Nano Futures, and ACS Applied Nano Materials. The scientist has multiple publications including:

  • Printable Aligned Single-Walled Carbon Nanotube Film with Outstanding Thermal Conductivity and Electromagnetic Interference Shielding Performance, 2022, Nano-Micro Letters
  • Chevron-type graphene nanoribbons with a reduced energy band gap: Solution synthesis, scanning tunneling microscopy and electrical characterization, 2020, Nano Research
  • Coherent Atomic-Scale Ripples on Metallic Glasses Patterned by Low-Energy Ion Irradiation for Large-Area Surface Structuring, 2020, ACS Applied Nano Materials
  • Roadmap on atomic-scale semiconductor devices, 2025, Nano Futures
  • Synthesis and Self-Assembly of Monodisperse Graphene Nanoribbons: Access to Submicron Architectures with Long-Range Order and Uniform Orientation, 2025, ACS Nano

Frequent collaborators in scientific publishing include Alexander Sinitskii, Gang Li, N. R. Aluru, Steven R. Schofield, and A. J. Fisher.

Joseph W. Lyding has been recognized as a Fellow of the American Association for the Advancement of Science (AAAS) in 2014, and a Fellow of the American Physical Society (APS) in 1997, with the APS citation highlighting contributions to scanning tunneling microscopy-based nanofabrication schemes using hydrogen and deuterium on silicon.

Best Publications

  • The influence of edge structure on the electronic properties of graphene quantum dots and nanoribbons.

    Kyle A. Ritter;Joseph W. Lyding

  • Atomic scale desorption through electronic and vibrational excitation mechanisms

    T. C. Shen;C. Wang;G. C. Abeln;J. R. Tucker

  • Nanoscale patterning and oxidation of H‐passivated Si(100)‐2×1 surfaces with an ultrahigh vacuum scanning tunneling microscope

    J. W. Lyding;T.‐C. Shen;J. S. Hubacek;J. R. Tucker

  • Effects of Polycrystalline Cu Substrate on Graphene Growth by Chemical Vapor Deposition

    Joshua D. Wood;Scott W. Schmucker;Austin S. Lyons;Eric Pop

  • Reduction of hot electron degradation in metal oxide semiconductor transistors by deuterium processing

    J. W. Lyding;K. Hess;I. C. Kizilyalli

  • Silicon-based molecular nanotechnology

    M. C. Hersam;N. P. Guisinger;J. W. Lyding

  • Cryogenic UHV-STM Study of Hydrogen and Deuterium Desorption from Si(100)

    E. T. Foley;A. F. Kam;J. W. Lyding;Ph. Avouris

  • Cofacial Assembly of Partially Oxidized Metallomacrocycles as an Approach to Controlling Lattice Architecture in Low-Dimensional Molecular Solids. Chemical, Structural, Oxidation State, Transport, Magnetic, and Optical Properties of Halogen-Doped [M(phthalocyaninato)0] Macromolecules, Where M = Si, Ge, and Sn

    Bruce N. Diel;Tamotsu Inabe;Karl F. Schoch;Tobin J. Marks

  • STM-induced H atom desorption from Si(100): isotope effects and site selectivity

    Ph Avouris;R. E. Walkup;A. R. Rossi;T. C. Shen

  • Breaking individual chemical bonds via STM-induced excitations

    Ph. Avouris;R.E. Walkup;A.R. Rossi;H.C. Akpati

  • Giant isotope effect in hot electron degradation of metal oxide silicon devices

    K. Hess;I.C. Kizilyalli;J.W. Lyding

  • Variable temperature scanning tunneling microscope

    Joseph W. Lyding

  • Atomic-Scale Evidence for Potential Barriers and Strong Carrier Scattering at Graphene Grain Boundaries: A Scanning Tunneling Microscopy Study

    Justin C. Koepke;Joshua D. Wood;David Estrada;Zhun Yong Ong

  • Annealing free, clean graphene transfer using alternative polymer scaffolds.

    Joshua D Wood;Gregory P Doidge;Enrique A Carrion;Justin C Koepke

  • Laterally extended atomically precise graphene nanoribbons with improved electrical conductivity for efficient gas sensing.

    Mohammad Mehdi Pour;Andrey Lashkov;Adrian Radocea;Ximeng Liu

  • Deuterium post-metal annealing of MOSFET's for improved hot carrier reliability

    I.C. Kizilyalli;J.W. Lyding;K. Hess

  • Computer automated charge transport measurement system

    J.W. Lyding;H.O. Marcy;T.J. Marks;C.R. Kannewurf

  • InxGa1–xAs Nanowire Growth on Graphene: van der Waals Epitaxy Induced Phase Segregation

    Parsian K. Mohseni;Ashkan Behnam;Joshua D. Wood;Christopher D. English

  • Ultrahigh-vacuum scanning tunneling microscopy and spectroscopy of single-walled carbon nanotubes on hydrogen-passivated Si(100) surfaces

    P. M. Albrecht;Joseph W Lyding

  • Scanning tunneling microscopy study and nanomanipulation of graphene-coated water on mica.

    Kevin T. He;Joshua D. Wood;Gregory P. Doidge;Eric Pop

  • Nanometer scale patterning and oxidation of silicon surfaces with an ultrahigh vacuum scanning tunneling microscope

    J. W. Lyding;G. C. Abeln;T. C. Shen;C. Wang

  • Forming of deuterium containing nitride spacers and fabrication of semiconductor devices

    Joseph W. Lyding;Karl Hess

Frequent Co-Authors

Martin Gruebele
Martin Gruebele University of Illinois at Urbana-Champaign
Eric Pop
Eric Pop Stanford University
Tobin J. Marks
Tobin J. Marks Northwestern University
Carl R. Kannewurf
Carl R. Kannewurf Northwestern University
Tamotsu Inabe
Tamotsu Inabe Hokkaido University
Zhi Chen
Zhi Chen University of Kentucky
Gregory S. Girolami
Gregory S. Girolami University of Illinois at Urbana-Champaign
Jeffrey S. Moore
Jeffrey S. Moore University of Illinois at Urbana-Champaign
Richard T. Haasch
Richard T. Haasch University of Illinois at Urbana-Champaign
Mark C. Hersam
Mark C. Hersam Northwestern University

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