The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Alex Zettl sits on this spectrum.
This scientist: 927 publications — 98th percentile
98% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Alex Zettl sits on this spectrum.
This scientist: 150 D-Index — 99th percentile
99% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Alex Zettl is affiliated with the University of California, Berkeley in the United States. Their research primarily focuses on materials science, physics and astronomy, and engineering. Within these broader fields, they have contributed extensively to subfields including materials chemistry, atomic and molecular physics and optics, electrical and electronic engineering, biomedical engineering, and electronic, optical, and magnetic materials.
The main topics of their work encompass graphene research and applications, 2D materials and applications, quantum and electron transport phenomena, topological materials and phenomena, molecular junctions and nanostructures, MXene and MAX phase materials, and advanced electron microscopy techniques and applications.
Alex Zettl has published frequently in several key venues, including:
Their recent papers include:
Frequent collaborators in research have included Takashi Taniguchi, Kenji Watanabe, Michael F. Crommie, Feng Wang, and Salman Kahn.
Alex Zettl's work has been recognized through several fellowships, such as:
Yuanbo Zhang;Tsung-Ta Tang;Tsung-Ta Tang;Caglar Girit;Zhao Hao
Philip G. Collins;Keith Bradley;Masa Ishigami;A. Zettl
Nasreen G. Chopra;R. J. Luyken;K. Cherrey;Vincent Henry Crespi
Long Ju;Baisong Geng;Baisong Geng;Jason Horng;Caglar Girit
J. Hone;J. Hone;M. Whitney;M. Whitney;C. Piskoti;C. Piskoti;A. Zettl;A. Zettl
N. Levy;S. A. Burke;K. L. Meaker;M. Panlasigui
Marc Bockrath;David H. Cobden;Paul L. McEuen;Nasreen G. Chopra
Feng Wang;Yuanbo Zhang;Chuanshan Tian;Caglar Girit
Xiaoqing Huang;Zipeng Zhao;Liang Cao;Yu Chen
John Cumings;A. Zettl
Kris Erickson;Rolf Erni;Zonghoon Lee;Nasim Alem
M. S. Fuhrer;J. Nygård;L. Shih;M. Forero
BG Demczyk;YM Wang;J Cumings;M Hetman
A. M. Fennimore;T. D. Yuzvinsky;Wei-Qiang Han;M. S. Fuhrer;M. S. Fuhrer
Çağlar Ö. Girit;Çağlar Ö. Girit;Çağlar Ö. Girit;Jannik C. Meyer;Jannik C. Meyer;Jannik C. Meyer;Rolf Erni;Rolf Erni;Rolf Erni;Marta D. Rossell;Marta D. Rossell;Marta D. Rossell
Jannik C. Meyer;C. Kisielowski;R. Erni;Marta D. Rossell
J. Hone;M. Whitney;A. Zettl
Chih-Wei Chang;Arunava Majumdar;Alexander K. Zettl
S. Dai;Z. Fei;Q. Ma;A. S. Rodin
K. Jensen;K. Jensen;Kwanpyo Kim;Kwanpyo Kim;A. Zettl;A. Zettl
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