World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
49
Citations
9478
World Ranking
10483
National Ranking
2489

Paul M. Voyles publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Paul M. Voyles sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 335 publications — 67th percentile

67% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Paul M. Voyles D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Paul M. Voyles sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 49 D-Index — 19th percentile

19% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Paul M. Voyles is affiliated with the University of Wisconsin-Madison in the United States. Their research spans multiple areas within materials science and engineering, with a particular focus on microscopy techniques and material properties at the atomic and molecular levels.

The primary fields of study for Voyles include:

  • Materials Science
  • Engineering

Within these fields, their work is concentrated in several subfields:

  • Materials Chemistry
  • Mechanical Engineering
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Voyles' major research topics cover diverse aspects of materials and microscopy such as:

  • Metallic Glasses and Amorphous Alloys
  • Material Dynamics and Properties
  • Electron and X-Ray Spectroscopy Techniques
  • Advanced Electron Microscopy Techniques and Applications
  • Machine Learning in Materials Science
  • Theoretical and Computational Physics
  • Phase-change materials and chalcogenides

Some of their recent papers include:

  • "Machine learning in scanning transmission electron microscopy," 2022, Nature Reviews Methods Primers
  • "Supertwisted spirals of layered materials enabled by growth on non-Euclidean surfaces," 2020, Science
  • "Radiation-induced segregation in a ceramic," 2020, Nature Materials
  • "Epitaxy, exfoliation, and strain-induced magnetism in rippled Heusler membranes," 2021, Nature Communications
  • "Memristive Behavior Enabled by Amorphous-Crystalline 2D Oxide Heterostructure," 2020, Advanced Materials

The frequent co-authors with whom Voyles has collaborated most include:

  • Dane Morgan
  • Chenyu Zhang
  • Jingrui Wei
  • Carter Francis
  • Debaditya Chatterjee

Voyles has contributed extensively to several publication venues, with multiple works in:

  • Microscopy and Microanalysis
  • arXiv (Cornell University)
  • Ultramicroscopy
  • The Journal of Chemical Physics
  • Physical Review Materials

Best Publications

  • H2V3O8 Nanowire/Graphene Electrodes for Aqueous Rechargeable Zinc Ion Batteries with High Rate Capability and Large Capacity

    Qiang Pang;Qiang Pang;Congli Sun;Yanhao Yu;Kangning Zhao

  • Atomic-scale imaging of individual dopant atoms and clusters in highly n -type bulk Si

    P. M. Voyles;D. A. Muller;J. L. Grazul;P. H. Citrin

  • Picometre-precision analysis of scanning transmission electron microscopy images of platinum nanocatalysts

    Andrew B. Yankovich;Benjamin Berkels;W. Dahmen;P. Binev

  • Imaging individual atoms inside crystals with ADF-STEM

    P.M. Voyles;J.L. Grazul;D.A. Muller

  • Nanoscale structure and structural relaxation in Zr50Cu45Al5 bulk metallic glass.

    Jinwoo Hwang;Z. H. Melgarejo;Y. E. Kalay;I. Kalay

  • Stabilization of copper catalysts for liquid-phase reactions by atomic layer deposition.

    Brandon J. O'Neill;David H. K. Jackson;Anthony J. Crisci;Carrie A. Farberow

  • Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition

    M.-Y. Ho;H. Gong;G. D. Wilk;B. W. Busch

  • Fluctuation microscopy in the STEM.

    P.M. Voyles;D.A. Muller

  • Evaluation of connectivity, flux pinning, and upper critical field contributions to the critical current density of bulk pure and SiC-alloyed MgB2

    A. Matsumoto;H. Kumakura;H. Kitaguchi;B. J. Senkowicz

  • High‐Performance, Quantum Dot Nanocomposites for Nonlinear Optical and Optical Gain Applications

    Melissa A. Petruska;Anton V. Malko;Paul M. Voyles;Victor I. Klimov

  • Atom pair persistence in disordered materials from fluctuation microscopy

    J.M Gibson;M.M.J Treacy;P.M Voyles;P.M Voyles

  • Tm3Fe5O12/Pt Heterostructures with Perpendicular Magnetic Anisotropy for Spintronic Applications

    Andy Quindeau;Can O. Avci;Wenqing Liu;Wenqing Liu;Congli Sun

  • Quantitative Measurement of Density in a Shear Band of Metallic Glass Monitored Along its Propagation Direction.

    Vitalij Schmidt;Harald Rösner;Martin Peterlechner;Gerhard Wilde

  • Fast flexible electronics with strained silicon nanomembranes

    Han Zhou;Jung Hun Seo;Deborah M. Paskiewicz;Ye Zhu

  • Aluminum nanoscale order in amorphous Al92Sm8 measured by fluctuation electron microscopy

    William G. Stratton;Joseph Hamann;John H. Perepezko;Paul M. Voyles

  • Influence of film composition in quaternary Heusler alloy Co2(Mn,Fe)Si thin films on tunnelling magnetoresistance of Co2(Mn,Fe)Si/MgO-based magnetic tunnel junctions

    Hong-xi Liu;Takeshi Kawami;Kidist Moges;Tetsuya Uemura

  • Fluctuation microscopy: a probe of atomic correlations in disordered materials

    P. M. Voyles;J. M. Gibson;M. M. J. Treacy

  • Supertwisted spirals of layered materials enabled by growth on non-Euclidean surfaces.

    Yuzhou Zhao;Chenyu Zhang;Daniel D. Kohler;Jason M. Scheeler

  • Structure and physical properties of paracrystalline atomistic models of amorphous silicon

    P. M. Voyles;P. M. Voyles;N. Zotov;S. M. Nakhmanson;S. M. Nakhmanson;D. A. Drabold

  • Absence of an Abrupt Phase Change from Polycrystalline to Amorphous in Silicon with Deposition Temperature

    P. M. Voyles;P. M. Voyles;J. E. Gerbi;M. M. J. Treacy;J. M. Gibson

  • Medium-range order in amorphous silicon measured by fluctuation electron microscopy

    Paul M. Voyles;John R. Abelson

Frequent Co-Authors

Dane Morgan
Dane Morgan University of Wisconsin–Madison
John R. Abelson
John R. Abelson University of Illinois at Urbana-Champaign
David A. Muller
David A. Muller Cornell University
J. M. Gibson
J. M. Gibson Northeastern University
Jinwoo Hwang
Jinwoo Hwang The Ohio State University
David C. Larbalestier
David C. Larbalestier Florida State University
Ümit Özgür
Ümit Özgür Virginia Commonwealth University
Hadis Morkoç
Hadis Morkoç Virginia Commonwealth University
Matthew J. Kramer
Matthew J. Kramer Ames Laboratory
John H. Perepezko
John H. Perepezko University of Wisconsin–Madison

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