D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 54 Citations 8,656 261 World Ranking 1455 National Ranking 31
Materials Science D-index 58 Citations 9,698 303 World Ranking 4933 National Ranking 52

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Oxygen
  • Organic chemistry

His scientific interests lie mostly in Optoelectronics, MOSFET, Dielectric, Gate dielectric and Germanium. His Optoelectronics study combines topics from a wide range of disciplines, such as Annealing, Oxide, Electronic engineering and Passivation. He has researched MOSFET in several fields, including Electron mobility, CMOS, Doping and Leakage.

His studies deal with areas such as Amorphous solid, Thin film and Condensed matter physics, Density of states as well as Dielectric. The study incorporates disciplines such as Substrate and Analytical chemistry in addition to Thin film. His work deals with themes such as Dissociation, Gate oxide and Permittivity, which intersect with Gate dielectric.

His most cited work include:

  • Trap-assisted tunneling in high permittivity gate dielectric stacks (302 citations)
  • Soft breakdown of ultra-thin gate oxide layers (292 citations)
  • Electrical properties of high-κ gate dielectrics: Challenges, current issues, and possible solutions (216 citations)

What are the main themes of his work throughout his whole career to date?

Optoelectronics, Analytical chemistry, Dielectric, Silicon and MOSFET are his primary areas of study. His studies deal with areas such as Gate dielectric, Passivation and Electrical engineering as well as Optoelectronics. While the research belongs to areas of Analytical chemistry, M.M. Heyns spends his time largely on the problem of Oxide, intersecting his research to questions surrounding Layer.

His studies in Dielectric integrate themes in fields like Annealing and Condensed matter physics. His Silicon research includes elements of Inorganic chemistry and Wafer. His MOSFET research is multidisciplinary, incorporating elements of Field-effect transistor, Metal gate, Electronic engineering and Germanium.

He most often published in these fields:

  • Optoelectronics (46.60%)
  • Analytical chemistry (24.38%)
  • Dielectric (20.99%)

What were the highlights of his more recent work (between 2010-2021)?

  • Optoelectronics (46.60%)
  • Condensed matter physics (14.81%)
  • Silicon (20.37%)

In recent papers he was focusing on the following fields of study:

M.M. Heyns mainly focuses on Optoelectronics, Condensed matter physics, Silicon, Quantum tunnelling and Nanotechnology. His Optoelectronics research integrates issues from Gate dielectric, Passivation, Logic gate and Voltage. M.M. Heyns interconnects Molecular physics, Wafer and Analytical chemistry in the investigation of issues within Silicon.

His study looks at the relationship between Quantum tunnelling and topics such as Doping, which overlap with Fermi level, Annealing and Indium gallium arsenide. His study in Nanotechnology is interdisciplinary in nature, drawing from both Metal–insulator transition, Semiconductor and Capacitor. The concepts of his Electron mobility study are interwoven with issues in Electronic engineering and Electrical engineering.

Between 2010 and 2021, his most popular works were:

  • An InGaAs/InP quantum well finfet using the replacement fin process integrated in an RMG flow on 300mm Si substrates (70 citations)
  • Advancing CMOS beyond the Si roadmap with Ge and III/V devices (55 citations)
  • Drive current enhancement in p-tunnel FETs by optimization of the process conditions (45 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Oxygen
  • Organic chemistry

The scientist’s investigation covers issues in Optoelectronics, Nanotechnology, Transmission electron microscopy, Silicon and Doping. His Optoelectronics study combines topics from a wide range of disciplines, such as Thin film, Molecular beam epitaxy and Passivation. His research in Passivation intersects with topics in Oxide, Deposition, Indium and Gate oxide.

His Silicon research incorporates themes from Scattering, Annealing, Ballistic conduction, MOSFET and Electronic engineering. His MOSFET research includes themes of Quantum well, Phonon, CMOS and Leakage. His Electronic engineering study integrates concerns from other disciplines, such as PMOS logic, Electron mobility and Germanium.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Soft breakdown of ultra-thin gate oxide layers

M. Depas;T. Nigam;M.M. Heyns.
IEEE Transactions on Electron Devices (1996)

447 Citations

Trap-assisted tunneling in high permittivity gate dielectric stacks

Michel Houssa;M Tuominen;M Naili;Valeri Afanas'ev.
Journal of Applied Physics (2000)

427 Citations

Germanium MOSFET Devices: Advances in Materials Understanding, Process Development, and Electrical Performance

D. P. Brunco;B. De Jaeger;G. Eneman;J. Mitard.
Journal of The Electrochemical Society (2008)

314 Citations

Electrical properties of high-κ gate dielectrics: Challenges, current issues, and possible solutions

M. Houssa;L. Pantisano;L.-Å. Ragnarsson;R. Degraeve.
Materials Science & Engineering R-reports (2006)

310 Citations

Band alignments in metal–oxide–silicon structures with atomic-layer deposited Al2O3 and ZrO2

Valeri Afanas'ev;Michel Houssa;Andre Stesmans;MM Heyns.
Journal of Applied Physics (2002)

265 Citations

Variation in the fixed charge density of SiOx/ZrO2 gate dielectric stacks during postdeposition oxidation

Michel Houssa;Valeri Afanas'ev;Andre Stesmans;MM Heyns.
Applied Physics Letters (2000)

259 Citations

Complementary Silicon-Based Heterostructure Tunnel-FETs With High Tunnel Rates

A.S. Verhulst;W.G. Vandenberghe;K. Maex;S. De Gendt.
IEEE Electron Device Letters (2008)

193 Citations

Electron energy barriers between (100)Si and ultrathin stacks of SiO2, Al2O3, and ZrO2 insulators

Valeri Afanas'ev;Michel Houssa;Andre Stesmans;MM Heyns.
Applied Physics Letters (2001)

189 Citations

Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy

H. Nohira;W. Tsai;W. Besling;E. Young.
Journal of Non-crystalline Solids (2002)

179 Citations

The Etching Mechanisms of SiO2 in Hydrofluoric Acid

S Verhaverbeke;I Teerlinck;Christiaan Vinckier;G Stevens.
Journal of The Electrochemical Society (1994)

168 Citations

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