His scientific interests lie mostly in Optoelectronics, MOSFET, Dielectric, Gate dielectric and Germanium. His Optoelectronics study combines topics from a wide range of disciplines, such as Annealing, Oxide, Electronic engineering and Passivation. He has researched MOSFET in several fields, including Electron mobility, CMOS, Doping and Leakage.
His studies deal with areas such as Amorphous solid, Thin film and Condensed matter physics, Density of states as well as Dielectric. The study incorporates disciplines such as Substrate and Analytical chemistry in addition to Thin film. His work deals with themes such as Dissociation, Gate oxide and Permittivity, which intersect with Gate dielectric.
Optoelectronics, Analytical chemistry, Dielectric, Silicon and MOSFET are his primary areas of study. His studies deal with areas such as Gate dielectric, Passivation and Electrical engineering as well as Optoelectronics. While the research belongs to areas of Analytical chemistry, M.M. Heyns spends his time largely on the problem of Oxide, intersecting his research to questions surrounding Layer.
His studies in Dielectric integrate themes in fields like Annealing and Condensed matter physics. His Silicon research includes elements of Inorganic chemistry and Wafer. His MOSFET research is multidisciplinary, incorporating elements of Field-effect transistor, Metal gate, Electronic engineering and Germanium.
M.M. Heyns mainly focuses on Optoelectronics, Condensed matter physics, Silicon, Quantum tunnelling and Nanotechnology. His Optoelectronics research integrates issues from Gate dielectric, Passivation, Logic gate and Voltage. M.M. Heyns interconnects Molecular physics, Wafer and Analytical chemistry in the investigation of issues within Silicon.
His study looks at the relationship between Quantum tunnelling and topics such as Doping, which overlap with Fermi level, Annealing and Indium gallium arsenide. His study in Nanotechnology is interdisciplinary in nature, drawing from both Metal–insulator transition, Semiconductor and Capacitor. The concepts of his Electron mobility study are interwoven with issues in Electronic engineering and Electrical engineering.
The scientist’s investigation covers issues in Optoelectronics, Nanotechnology, Transmission electron microscopy, Silicon and Doping. His Optoelectronics study combines topics from a wide range of disciplines, such as Thin film, Molecular beam epitaxy and Passivation. His research in Passivation intersects with topics in Oxide, Deposition, Indium and Gate oxide.
His Silicon research incorporates themes from Scattering, Annealing, Ballistic conduction, MOSFET and Electronic engineering. His MOSFET research includes themes of Quantum well, Phonon, CMOS and Leakage. His Electronic engineering study integrates concerns from other disciplines, such as PMOS logic, Electron mobility and Germanium.
This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.
Soft breakdown of ultra-thin gate oxide layers
M. Depas;T. Nigam;M.M. Heyns.
IEEE Transactions on Electron Devices (1996)
Trap-assisted tunneling in high permittivity gate dielectric stacks
Michel Houssa;M Tuominen;M Naili;Valeri Afanas'ev.
Journal of Applied Physics (2000)
Germanium MOSFET Devices: Advances in Materials Understanding, Process Development, and Electrical Performance
D. P. Brunco;B. De Jaeger;G. Eneman;J. Mitard.
Journal of The Electrochemical Society (2008)
Electrical properties of high-κ gate dielectrics: Challenges, current issues, and possible solutions
M. Houssa;L. Pantisano;L.-Å. Ragnarsson;R. Degraeve.
Materials Science & Engineering R-reports (2006)
Band alignments in metal–oxide–silicon structures with atomic-layer deposited Al2O3 and ZrO2
Valeri Afanas'ev;Michel Houssa;Andre Stesmans;MM Heyns.
Journal of Applied Physics (2002)
Variation in the fixed charge density of SiOx/ZrO2 gate dielectric stacks during postdeposition oxidation
Michel Houssa;Valeri Afanas'ev;Andre Stesmans;MM Heyns.
Applied Physics Letters (2000)
Complementary Silicon-Based Heterostructure Tunnel-FETs With High Tunnel Rates
A.S. Verhulst;W.G. Vandenberghe;K. Maex;S. De Gendt.
IEEE Electron Device Letters (2008)
Electron energy barriers between (100)Si and ultrathin stacks of SiO2, Al2O3, and ZrO2 insulators
Valeri Afanas'ev;Michel Houssa;Andre Stesmans;MM Heyns.
Applied Physics Letters (2001)
Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
H. Nohira;W. Tsai;W. Besling;E. Young.
Journal of Non-crystalline Solids (2002)
The Etching Mechanisms of SiO2 in Hydrofluoric Acid
S Verhaverbeke;I Teerlinck;Christiaan Vinckier;G Stevens.
Journal of The Electrochemical Society (1994)
If you think any of the details on this page are incorrect, let us know.
We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:
KU Leuven
KU Leuven
KU Leuven
Hasselt University
Imec
KU Leuven
Intel (United States)
KU Leuven
KU Leuven
Imec
MIT
Vanderbilt University
Tel Aviv University
Google (United States)
Imec
Bilkent University
TU Dresden
University of Strasbourg
University of Sydney
University of Brasília
University of Amsterdam
China University of Geosciences
National Marine Fisheries Service
Nathan Kline Institute for Psychiatric Research
Leiden University Medical Center
George Washington University