Eduardo Alves mostly deals with Analytical chemistry, Thin film, Sputtering, Photoluminescence and Annealing. His Analytical chemistry research includes elements of Rutherford backscattering spectrometry, Amorphous solid, Mineralogy, Physical vapor deposition and Wide-bandgap semiconductor. His study in Thin film is interdisciplinary in nature, drawing from both Dielectric spectroscopy, Electrical resistivity and conductivity, Crystallite, Titanium and Microstructure.
Eduardo Alves combines subjects such as Titanium nitride and Metallurgy, Tin, Zirconium with his study of Sputtering. His research integrates issues of Luminescence, Exciton, Excitation, Lattice and Emission spectrum in his study of Photoluminescence. His Annealing research also works with subjects such as
Analytical chemistry, Annealing, Thin film, Ion implantation and Photoluminescence are his primary areas of study. His biological study spans a wide range of topics, including Rutherford backscattering spectrometry, Doping, Sputtering, Sapphire and Fluence. His Annealing research focuses on subjects like Crystallography, which are linked to Transmission electron microscopy.
His work carried out in the field of Thin film brings together such families of science as Metallurgy, Microstructure, Electrical resistivity and conductivity and Raman spectroscopy. His Ion implantation research incorporates elements of Gallium nitride, Europium, Channelling, Crystallographic defect and Atomic physics. His studies in Photoluminescence integrate themes in fields like Luminescence, Exciton, Band gap and Erbium.
Eduardo Alves focuses on Analytical chemistry, Thin film, Jet, Divertor and Annealing. His work deals with themes such as Deuterium, Rutherford backscattering spectrometry, Nuclear reaction analysis, Elastic recoil detection and Fluence, which intersect with Analytical chemistry. His study focuses on the intersection of Fluence and fields such as Ion implantation with connections in the field of Conductivity.
His research in Thin film intersects with topics in Optoelectronics, Doping, Nanoparticle and X-ray photoelectron spectroscopy. His Jet study also includes
His main research concerns Analytical chemistry, Divertor, Jet, Nuclear engineering and Rutherford backscattering spectrometry. The concepts of his Analytical chemistry study are interwoven with issues in Doping, Pulsed laser deposition, Deposition, Elastic recoil detection and Fluence. Eduardo Alves has researched Doping in several fields, including Crystal structure and Photoluminescence.
Thin film and Nanotechnology are closely tied to his Rutherford backscattering spectrometry research. Eduardo Alves has included themes like Nanoparticle and Surface plasmon resonance in his Thin film study. Annealing is closely connected to Optics in his research, which is encompassed under the umbrella topic of Molecular physics.
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Effect of post-annealing on the properties of copper oxide thin films obtained from the oxidation of evaporated metallic copper
V. Figueiredo;E. Elangovan;G. Gonçalves;P. Barquinha.
Applied Surface Science (2008)
Strain and composition distributions in wurtzite InGaN/GaN layers extracted from x-ray reciprocal space mapping
S. Pereira;M. R. Correia;E. Pereira;K. P. O’Donnell.
Applied Physics Letters (2002)
Characterisation of Ti1−xSixNy nanocomposite films
F Vaz;L Rebouta;P Goudeau;J Pacaud.
Surface & Coatings Technology (2000)
Compositional pulling effects in InxGa1-x N/GaN layers: A combined depth-resolved cathodoluminescence and Rutherford backscattering/channeling study
S. Pereira;M. R. Correia;E. Pereira;K. P. O’Donnell.
Physical Review B (2001)
Structural, optical and mechanical properties of coloured TiNxOy thin films
F Vaz;P Cerqueira;L Rebouta;S.M.C Nascimento.
Thin Solid Films (2004)
Anomalous ion channeling in AlInN/GaN bilayers: determination of the strain state.
K. Lorenz;N. Franco;E. Alves;I. M. Watson.
Physical Review Letters (2006)
Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films
F. Vaz;J. Ferreira;E. Ribeiro;L. Rebouta.
Surface & Coatings Technology (2005)
Overview of the JET results in support to ITER
X. Litaudon;S. Abduallev;M. Abhangi;P. Abreu.
Nuclear Fusion (2017)
Hard nanocomposite Ti–Si–N coatings prepared by DC reactive magnetron sputtering
L Rebouta;C.J Tavares;R Aimo;Z Wang.
Surface & Coatings Technology (2000)
Metal-organic vapor phase epitaxy and properties of AlInN in the whole compositional range
C. Hums;J. Bläsing;A. Dadgar;A. Diez.
Applied Physics Letters (2007)
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