The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Edmund H. Linfield sits on this spectrum.
This scientist: 883 publications — 97th percentile
97% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Edmund H. Linfield sits on this spectrum.
This scientist: 82 D-Index — 94th percentile
94% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Edmund H. Linfield is affiliated with the University of Leeds in the United Kingdom and has a substantial body of research primarily within the fields of engineering, physics and astronomy, and chemistry. Their work has a strong focus on electrical and electronic engineering, atomic and molecular physics and optics, and spectroscopy.
The scientist's research topics concentrate on spectroscopy and laser applications, photonic and optical devices, terahertz technology and applications, advanced fiber laser technologies, semiconductor lasers and optical devices, strong light-matter interactions, as well as plasmonic and surface plasmon research.
Linfield has contributed to multiple publication venues, including:
Frequent co-authors working with Linfield include Lianhe Li, A. G. Davies, Paul Dean, Miriam S. Vitiello, and Joshua R. Freeman.
Among the recent papers authored or co-authored by Linfield are:
Rüdeger Köhler;Alessandro Tredicucci;Fabio Beltram;Harvey E. Beere
S S Dhillon;M S Vitiello;E H Linfield;A G Davies
Ruth M Woodward;Bryan E Cole;Vincent P Wallace;Richard J Pye
A. Giles Davies;Andrew D. Burnett;Wenhui Fan;Edmund H. Linfield
Ruth M Woodward;Vincent P Wallace;Richard J Pye;Bryan E Cole
Yongquan Zeng;Udvas Chattopadhyay;Bofeng Zhu;Bo Qiang
M. B. Johnston;D. M. Whittaker;A. Corchia;A. G. Davies
R.M. Woodward;Vincent Wallace;D.D. Arnone;E.H. Linfield
S. S. Dhillon;Vitiello;E. H. Linfield;A. G. Davies
Y. Chassagneux;R. Colombelli;W. Maineult;S. Barbieri
Nanfang Yu;Qi Jie Wang;Qi Jie Wang;Mikhail A. Kats;Jonathan A. Fan
M. Y. Simmons;A. R. Hamilton;M. Pepper;E. H. Linfield
S. Gardelis;C. G. Smith;C. H. W. Barnes;E. H. Linfield
Michel Rochat;Lassaad Ajili;Harald Willenberg;Jérôme Faist
S. Barbieri;J. Alton;H. E. Beere;J. Fowler
V. I. Talyanskii;J. M. Shilton;M. Pepper;C. G. Smith
Lianhe Li;Li Chen;Jingxuan Zhu;J. Freeman
Giacomo Scalari;Lassaad Ajili;Jérôme Faist;Harvey Beere
Y. C. Shen;P. C. Upadhya;E. H. Linfield;H. E. Beere
Mikhail A. Belkin;Jonathan A. Fan;Sahand Hormoz;Federico Capasso
A Tredicucci;R Köhler;F Beltram;H.E Beere
JérÔme Faist;Lassaad Ajili;Giacomo Scalari;Marcella Giovannini
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