The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Edward H. Sargent sits on this spectrum.
This scientist: 825 publications — 96th percentile
96% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Edward H. Sargent sits on this spectrum.
This scientist: 199 D-Index — 100th percentile
100% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Edward H. Sargent is affiliated with Northwestern University in the United States. Their research spans multiple fields with a focus on Engineering and Materials Science, with a significant number of publications in Electrical and Electronic Engineering, Materials Chemistry, Renewable Energy, Sustainability and the Environment, Catalysis, and Biomedical Engineering.
Their main research themes include Perovskite Materials and Applications, Quantum Dots Synthesis and Properties, CO2 Reduction Techniques and Catalysts, Chalcogenide Semiconductor Thin Films, Electrocatalysts for Energy Conversion, Ionic Liquids properties and applications, and Advanced Battery Technologies Research.
Recent notable publications include the following:
Frequent co-authors in their research include:
The scientist has published extensively in the following venues:
Their work has been recognized through several awards, including the Izaak Walton Killam Memorial Prize from the Canada Council in 2020, fellowship in the Royal Society of Canada in 2014, fellowship of the American Association for the Advancement of Science (AAAS) in 2009, and membership in The Canadian Academy of Engineering.
Dong Shi;Valerio Adinolfi;Riccardo Comin;Mingjian Yuan
Kebin Lin;Jun Xing;Li Na Quan;F. Pelayo García de Arquer
Phil De Luna;Phil De Luna;Phil De Luna;Christopher Hahn;Christopher Hahn;Drew Higgins;Drew Higgins;Drew Higgins;Shaffiq A. Jaffer
Bo Zhang;Bo Zhang;Xueli Zheng;Xueli Zheng;Oleksandr Voznyy;Riccardo Comin
Hairen Tan;Ankit Jain;Oleksandr Voznyy;Xinzheng Lan
Steven A. McDonald;Gerasimos Konstantatos;Shiguo Zhang;Paul W. Cyr
Cao-Thang Dinh;Thomas Burdyny;Golam Kibria;Ali Seifitokaldani
Mingjian Yuan;Li Na Quan;Li Na Quan;Riccardo Comin;Grant Walters
Gerasimos Konstantatos;Ian Howard;Armin Fischer;Sjoerd Hoogland
Jiajun Luo;Xiaoming Wang;Shunran Li;Jing Liu
Yaoguang Rong;Yue Hu;Anyi Mei;Anyi Mei;Hairen Tan;Hairen Tan
Min Liu;Yuanjie Pang;Bo Zhang;Bo Zhang;Phil De Luna
Jiang Tang;Kyle W. Kemp;Sjoerd H. Hoogland;Kwangseob Jeong
Brandon R. Sutherland;Edward H. Sargent
F. Pelayo García de Arquer;Dmitri V. Talapin;Victor I. Klimov;Yasuhiko Arakawa
Oleksandr S. Bushuyev;Phil De Luna;Cao Thang Dinh;Ling Tao
Gerasimos Konstantatos;Edward H. Sargent
F. Pelayo García de Arquer;Ardalan Armin;Paul Meredith;Paul Meredith;Edward H. Sargent
Alexander H. Ip;Susanna M. Thon;Sjoerd Hoogland;Oleksandr Voznyy
Li Na Quan;Li Na Quan;Mingjian Yuan;Riccardo Comin;Oleksandr Voznyy
Miao Zhong;Miao Zhong;Kevin Tran;Yimeng Min;Chuanhao Wang
Edward H. Sargent
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