His research investigates the connection between Structural basin and topics such as Paleontology that intersect with issues in Context (archaeology). Context (archaeology) is closely attributed to Paleontology in his work. In his work, Steven J. Holmes performs multidisciplinary research in Lithography and Electron-beam lithography. He integrates Electron-beam lithography with Next-generation lithography in his research. Steven J. Holmes combines Next-generation lithography and Extreme ultraviolet lithography in his studies. His multidisciplinary approach integrates Extreme ultraviolet lithography and Multiple patterning in his work. Steven J. Holmes brings together Multiple patterning and Photoresist to produce work in his papers. He undertakes multidisciplinary investigations into Photoresist and Resist in his work. He combines topics linked to Layer (electronics) with his work on Resist.
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Negative photoresists for optical lithography
Jane M. Shaw;Jeffrey D. Gelorme;Nancy C. LaBianca;Will E. Conley.
Ibm Journal of Research and Development (1997)
Accessible chip stack and process of manufacturing thereof
Furukawa Toshiharu Hakey Mark.
Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
Joy Y. Cheng;Daniel P. Sanders;Hoa D. Truong;Stefan Harrer.
ACS Nano (2010)
Forming capping layer over metal wire structure using selective atomic layer deposition
Toshiharu Furukawa;Steven J. Holmes;David V. Horak;Charles W. Koburger.
Novel structure for folded architecture pillar memory cell
Furukawa Toshiharu;Hakey Mark C;Holmes Steven J;Horak David.
Airborne chemical contamination of a chemically amplified resist
Scott A. MacDonald;Nicholas J. Clecak;H. R. Wendt;C. Grant Willson.
Advances in Resist Technology and Processing VIII (1991)
Methods of directed self-assembly and layered structures formed therefrom
Daniel Paul Sanders;Joy Cheng;William Hinsberg;Ho-Cheol Kim.
Methods for forming uniform lithographic features
Toshiharu Furukawa;Mark Charles Hakey;Steven J. Holmes;David V. Horak.
Dsa grapho-epitaxy process with etch stop material
Jassem A. Abdallah;Matthew E. Colburn;Steven J. Holmes;Daiji Kawamura.
Method for forming quadruple density sidewall image transfer (SIT) structures
Toshiharu Furukawa;Mark Charles Hakey;Steven John Holmes;David Vaclav Horak.
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