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Best Scientists - Electronics and Electrical Engineering
Steven J. Holmes

Steven J. Holmes

IBM (United States)
United States

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name Citations Publications World Ranking National Ranking

Electronics and Electrical Engineering D-index 38 Citations 6,052 243 World Ranking 3126 National Ranking 1216

Overview

What are the main themes of his work throughout his whole career to date

His research investigates the connection between Structural basin and topics such as Paleontology that intersect with issues in Context (archaeology). Context (archaeology) is closely attributed to Paleontology in his work. In his work, Steven J. Holmes performs multidisciplinary research in Lithography and Electron-beam lithography. He integrates Electron-beam lithography with Next-generation lithography in his research. Steven J. Holmes combines Next-generation lithography and Extreme ultraviolet lithography in his studies. His multidisciplinary approach integrates Extreme ultraviolet lithography and Multiple patterning in his work. Steven J. Holmes brings together Multiple patterning and Photoresist to produce work in his papers. He undertakes multidisciplinary investigations into Photoresist and Resist in his work. He combines topics linked to Layer (electronics) with his work on Resist.

Steven J. Holmes most often published in these fields:

Lithography (42.86%)
Nanotechnology (42.86%)
Optoelectronics (42.86%)

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Negative photoresists for optical lithography

Jane M. Shaw;Jeffrey D. Gelorme;Nancy C. LaBianca;Will E. Conley.
Ibm Journal of Research and Development (1997)

493 Citations

Accessible chip stack and process of manufacturing thereof

Furukawa Toshiharu Hakey Mark.
(2005)

306 Citations

Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

Joy Y. Cheng;Daniel P. Sanders;Hoa D. Truong;Stefan Harrer.
ACS Nano (2010)

280 Citations

Forming capping layer over metal wire structure using selective atomic layer deposition

Toshiharu Furukawa;Steven J. Holmes;David V. Horak;Charles W. Koburger.
(2005)

246 Citations

Novel structure for folded architecture pillar memory cell

Furukawa Toshiharu;Hakey Mark C;Holmes Steven J;Horak David.
(2000)

234 Citations

Airborne chemical contamination of a chemically amplified resist

Scott A. MacDonald;Nicholas J. Clecak;H. R. Wendt;C. Grant Willson.
Advances in Resist Technology and Processing VIII (1991)

227 Citations

Methods of directed self-assembly and layered structures formed therefrom

Daniel Paul Sanders;Joy Cheng;William Hinsberg;Ho-Cheol Kim.
(2009)

212 Citations

Methods for forming uniform lithographic features

Toshiharu Furukawa;Mark Charles Hakey;Steven J. Holmes;David V. Horak.
(2006)

199 Citations

Dsa grapho-epitaxy process with etch stop material

Jassem A. Abdallah;Matthew E. Colburn;Steven J. Holmes;Daiji Kawamura.
(2013)

159 Citations

Method for forming quadruple density sidewall image transfer (SIT) structures

Toshiharu Furukawa;Mark Charles Hakey;Steven John Holmes;David Vaclav Horak.
(2004)

153 Citations

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Frequent Co-Authors

External Links

Personal Website for Steven J. Holmes