D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 33 Citations 4,365 158 World Ranking 4216 National Ranking 1586

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Integrated circuit
  • Electrical engineering

His primary areas of study are Optoelectronics, Layer, Wafer, Electronic engineering and Optics. The study incorporates disciplines such as Transistor and Photoresist in addition to Optoelectronics. His research in Layer intersects with topics in Electrical conductor, Silicon and Dopant.

His work carried out in the field of Wafer brings together such families of science as Chip and Integrated circuit. His research in Electronic engineering tackles topics such as Conductor which are related to areas like Read-only memory, Diode and Groove. His study looks at the intersection of Optics and topics like Immersion lithography with Refractive index and Absorption.

His most cited work include:

  • Accessible chip stack and process of manufacturing thereof (202 citations)
  • Moving lens for immersion optical lithography (137 citations)
  • SOI stacked DRAM logic (131 citations)

What are the main themes of his work throughout his whole career to date?

Mark C. Hakey mainly investigates Optoelectronics, Layer, Electrical engineering, Electronic engineering and Nanotechnology. His studies deal with areas such as Trench, Substrate, Conductor and Semiconductor device as well as Optoelectronics. His study looks at the relationship between Substrate and fields such as Resist, as well as how they intersect with chemical problems.

His Layer research incorporates themes from Electrical conductor, Oxide and Dielectric. His work deals with themes such as Dram and Silicon on insulator, which intersect with Electrical engineering. His Silicon on insulator study combines topics in areas such as Wafer and Static random-access memory.

He most often published in these fields:

  • Optoelectronics (60.27%)
  • Layer (28.77%)
  • Electrical engineering (22.83%)

What were the highlights of his more recent work (between 2006-2020)?

  • Optoelectronics (60.27%)
  • Layer (28.77%)
  • Electrical engineering (22.83%)

In recent papers he was focusing on the following fields of study:

His primary areas of investigation include Optoelectronics, Layer, Electrical engineering, Dielectric and Electrical conductor. His Optoelectronics study frequently draws connections between related disciplines such as Substrate. His Layer study integrates concerns from other disciplines, such as Oxide, Electronic engineering and Optics.

The various areas that Mark C. Hakey examines in his Electrical engineering study include Heavy ion and Conductor. The Dielectric study combines topics in areas such as Resistor and Semiconductor device. His work investigates the relationship between Electrical conductor and topics such as Perpendicular that intersect with problems in Chip.

Between 2006 and 2020, his most popular works were:

  • Single-Event Upsets and Multiple-Bit Upsets on a 45 nm SOI SRAM (130 citations)
  • Low Energy Proton Single-Event-Upset Test Results on 65 nm SOI SRAM (123 citations)
  • Simultaneous conditioning of a plurality of memory cells through series resistors (86 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Integrated circuit

Mark C. Hakey mostly deals with Optoelectronics, Electrical engineering, Nanotechnology, Single event upset and Integrated circuit. Mark C. Hakey studies Doping, a branch of Optoelectronics. His work in the fields of Non-volatile memory and Resistor overlaps with other areas such as Series.

In the field of Nanotechnology, his study on Carbon nanotube and Phase-change memory overlaps with subjects such as Fluid dynamics. His Single event upset study combines topics from a wide range of disciplines, such as Radiation and Silicon on insulator. His biological study spans a wide range of topics, including Dimension, Structural engineering and Lithography.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Accessible chip stack and process of manufacturing thereof

Furukawa Toshiharu Hakey Mark.
(2005)

306 Citations

Novel structure for folded architecture pillar memory cell

Furukawa Toshiharu;Hakey Mark C;Holmes Steven J;Horak David.
(2000)

234 Citations

MOVEMENT OF LENS FOR IMMERSION OPTICAL LITHOGRAPHY

Hakey Mark Charles;Horak David;Koburger Charles W;Mitchell Peter H.
(2005)

210 Citations

Methods for forming uniform lithographic features

Toshiharu Furukawa;Mark Charles Hakey;Steven J. Holmes;David V. Horak.
(2006)

199 Citations

SOI stacked DRAM logic

Ramachandra Divakauni;Mark C. Hakey;William H-L. Ma;Jack A. Mandclman.
(2001)

198 Citations

Liquid-filled balloons for immersion lithography

Mark C. Hakey;David V. Horak;Charles W. Koburger;Peter H. Mitchell.
(2004)

182 Citations

Single-Event Upsets and Multiple-Bit Upsets on a 45 nm SOI SRAM

D.F. Heidel;P.W. Marshall;J.A. Pellish;K.P. Rodbell.
IEEE Transactions on Nuclear Science (2009)

181 Citations

System and apparatus for photolithography

Mark Charles Hakey;David Vaclay Horak;Charles William Koburger;Peter H. Mitchell.
(2004)

166 Citations

Trench storage dynamic random access memory cell with vertical transfer device

Toshiharu Furukawa;Mark C. Hakey;David V. Horak;William H. Ma.
(1998)

159 Citations

Low Energy Proton Single-Event-Upset Test Results on 65 nm SOI SRAM

D.F. Heidel;P.W. Marshall;K.A. LaBel;J.R. Schwank.
IEEE Transactions on Nuclear Science (2008)

159 Citations

If you think any of the details on this page are incorrect, let us know.

Contact us

Best Scientists Citing Mark C. Hakey

Gurtej S. Sandhu

Gurtej S. Sandhu

Micron (United States)

Publications: 55

Kangguo Cheng

Kangguo Cheng

IBM (United States)

Publications: 46

Leonard Forbes

Leonard Forbes

L. Forbes and Associates LLC

Publications: 41

Chen-Hua Yu

Chen-Hua Yu

Taiwan Semiconductor Manufacturing Company (Taiwan)

Publications: 40

Jack A. Mandelman

Jack A. Mandelman

Independent Scientist / Consultant, US

Publications: 27

Hsiang-Lan Lung

Hsiang-Lan Lung

Macronix International (Taiwan)

Publications: 26

Steven J. Holmes

Steven J. Holmes

IBM (United States)

Publications: 25

Carl J. Radens

Carl J. Radens

IBM (United States)

Publications: 22

Robert A. Reed

Robert A. Reed

Vanderbilt University

Publications: 22

Toshiharu Furukawa

Toshiharu Furukawa

IBM (United States)

Publications: 21

William R. Tonti

William R. Tonti

Institute of Electrical and Electronics Engineers

Publications: 21

David V. Horak

David V. Horak

IBM (United States)

Publications: 20

Charles W. Koburger

Charles W. Koburger

IBM (United States)

Publications: 20

Matthew J. Breitwisch

Matthew J. Breitwisch

IBM (United States)

Publications: 19

Edward J. Nowak

Edward J. Nowak

Quantum Queries

Publications: 18

Belgacem Haba

Belgacem Haba

Stanford University

Publications: 16

Trending Scientists

Kar-Ann Toh

Kar-Ann Toh

Yonsei University

Edwin M. M. Ortega

Edwin M. M. Ortega

Universidade de São Paulo

Di Huang

Di Huang

Beihang University

Pascal Henry Biwole

Pascal Henry Biwole

PSL University

Dieter Oesterhelt

Dieter Oesterhelt

Max Planck Society

Wolfgang Weissflog

Wolfgang Weissflog

Martin Luther University Halle-Wittenberg

David J. Cantrill

David J. Cantrill

Royal Botanic Gardens

Thomas K. Rockwell

Thomas K. Rockwell

San Diego State University

Michel Warnau

Michel Warnau

International Atomic Energy Agency

Mark A. Delucchi

Mark A. Delucchi

University of California, Berkeley

Antal Rot

Antal Rot

Queen Mary University of London

Paolo Barone

Paolo Barone

University of Salerno

Shmuel Reis

Shmuel Reis

Hebrew University of Jerusalem

Azim F. Shariff

Azim F. Shariff

University of British Columbia

Ezequiel Treister

Ezequiel Treister

Pontificia Universidad Católica de Chile

Something went wrong. Please try again later.