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Research.com Recognitions

  • 2016 - Fellow of American Physical Society (APS) Citation For outstanding contributions to the fundamental understanding of directed selfassembly of block copolymer films

Overview

Ricardo Ruiz is a researcher affiliated with the Lawrence Berkeley National Laboratory in the United States. Their work spans several fields with a primary focus on engineering and materials science, supported by extensive research in related subfields such as materials chemistry, electrical and electronic engineering, and biomedical engineering.

The scientist's research concentrates on topics involving block copolymer self-assembly, advanced polymer synthesis and characterization, and developments in photolithography and nanofabrication techniques. Additional areas of study include polymer surface interaction studies, electron and X-ray spectroscopy techniques, as well as dielectric materials and actuators.

Some of Ruiz's recent publications include the following:

  • Nanopatterned Monolayers of Bioinspired, Sequence-Defined Polypeptoid Brushes for Semiconductor/Bio Interfaces, 2024, ACS Nano
  • High-performing polysulfate dielectrics for electrostatic energy storage under harsh conditions, 2023, Joule
  • Determining Structure and Thermodynamics of A-b-(B-r-C) Copolymers, 2023, ACS Macro Letters
  • Optimized design of block copolymers with covarying properties for nanolithography, 2022, Nature Materials
  • Self-assembly for electronics, 2020, MRS Bulletin

Ruiz frequently publishes in several scientific venues, such as:

  • Journal of Micro/Nanopatterning Materials and Metrology
  • Macromolecules
  • Joule
  • Nature Materials
  • ACS Nano

The scientist collaborates regularly with coauthors including Paul F. Nealey, Whitney S. Loo, Boyce S. Chang, Hongbo Feng, and Gordon S. W. Craig.

In 2016, Ricardo Ruiz was recognized as a Fellow of the American Physical Society (APS) for contributions related to the fundamental understanding of directed self-assembly of block copolymer films.

Best Publications

  • Density multiplication and improved lithography by directed block copolymer assembly

    Paul Franklin Nealey;Huiman Kang;Francois Detcheverry;Juan J. Depablo

  • Pentacene Thin Film Growth

    Ricardo Ruiz;Devashish Choudhary;Bert Nickel;Tullio Toccoli

  • Magnetic recording at 1.5 Pb m −2 using an integrated plasmonic antenna

    Barry C. Stipe;Timothy C. Strand;Chie C. Poon;Hamid Balamane

  • Polymer self assembly in semiconductor microelectronics

    C. T. Black;R. Ruiz;Gregory Breyta;J. Y. Cheng

  • Thickness Dependence of Mobility in Pentacene Thin‐Film Transistors

    Ricardo Ruiz;Alexios Papadimitratos;Alex C. Mayer;George G. Malliaras

  • Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance

    Thomas R. Albrecht;Hitesh Arora;Vipin Ayanoor-Vitikkate;Jean-Marc Beaujour

  • Nanoscale chemical imaging by photoinduced force microscopy

    Derek Nowak;William Morrison;H. Kumar Wickramasinghe;Junghoon Jahng

  • Directed Assembly of Lamellae- Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates†

    Sang-Min Park;Mark P. Stoykovich;Ricardo Ruiz;Ying Zhang

  • Pentacene ultrathin film formation on reduced and oxidized Si surfaces

    Ricardo Ruiz;Bert Nickel;Norbert Koch;Leonard C. Feldman

  • Dynamic scaling, island size distribution, and morphology in the aggregation regime of submonolayer pentacene films.

    Ricardo Ruiz;Bert Nickel;Norbert Koch;Leonard C. Feldman

  • Structure of pentacene thin films

    Ricardo Ruiz;Alex C. Mayer;George G. Malliaras;Bert Nickel

  • Induced Orientational Order in Symmetric Diblock Copolymer Thin Films

    Ricardo Ruiz;Ricardo Ruiz;Robert L. Sandstrom;Charles T. Black;Charles T. Black

  • Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis

    Yves-Andre Chapuis;Ricardo Ruiz;Lei Wan

  • Control of self-assembly of lithographically patternable block copolymer films.

    Joan K. Bosworth;Marvin Y. Paik;Ricardo Ruiz;Evan L. Schwartz

  • Bit Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance

    Thomas R. Albrecht;Hitesh Arora;Vipin Ayanoor-Vitikkate;Jean-Marc Beaujour

  • Patterned block copolymer structure with oxide lines for line density multiplication

    Hitesh Arora;Ricardo Ruiz

  • The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography

    Lei Wan;Ricardo Ruiz;He Gao;Kanaiyalal C. Patel

  • Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution

    O Hellwig;J.K. Bosworth;E Dobisz;D Kercher

  • Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media

    Ricardo Ruiz;Elizabeth Dobisz;Thomas R. Albrecht

  • Polymer self assembly in semiconductor microelectronics

    C.T. Black;K.W. Guarini;R. Ruiz;E.M. Sikorski

Frequent Co-Authors

Paul F. Nealey
Paul F. Nealey University of Chicago
Charles T. Black
Charles T. Black Brookhaven National Laboratory
Bert Nickel
Bert Nickel Ludwig-Maximilians-Universität München
George G. Malliaras
George G. Malliaras University of Cambridge
Olav Hellwig
Olav Hellwig Chemnitz University of Technology
Leonard C. Feldman
Leonard C. Feldman Rutgers, The State University of New Jersey
Norbert Koch
Norbert Koch Humboldt-Universität zu Berlin
Antoine Kahn
Antoine Kahn Princeton University
Dieter Weller
Dieter Weller University of York
Juan J. de Pablo
Juan J. de Pablo New York University

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