World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
60
Citations
12104
World Ranking
1666
National Ranking
672

Jerry G. Fossum publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Jerry G. Fossum sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 242 publications — 42nd percentile

42% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Jerry G. Fossum D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Jerry G. Fossum sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 60 D-Index — 77th percentile

77% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 1983 - IEEE Fellow For contributions to the theory and technology of silicon solar cells and transistors.

Overview

What is he best known for?

The fields of study he is best known for:

  • Quantum mechanics
  • MOSFET
  • Transistor

MOSFET, Electrical engineering, Silicon on insulator, Optoelectronics and CMOS are his primary areas of study. His MOSFET study combines topics from a wide range of disciplines, such as Threshold voltage, Electronic engineering and Electron mobility, Condensed matter physics. His work deals with themes such as Electronic circuit and Nanoelectronics, which intersect with Electronic engineering.

His study in Silicon on insulator is interdisciplinary in nature, drawing from both Field-effect transistor, Equivalent circuit, Bipolar junction transistor and Work function. His Optoelectronics research is multidisciplinary, incorporating perspectives in Polysilicon depletion effect and Leakage. His work in the fields of CMOS, such as Semiconductor device modeling, intersects with other areas such as Process.

His most cited work include:

  • Threshold voltage of thin-film Silicon-on-insulator (SOI) MOSFET's (566 citations)
  • Anomalous leakage current in LPCVD PolySilicon MOSFET's (265 citations)
  • Nanoscale FinFETs with gate-source/drain underlap (231 citations)

What are the main themes of his work throughout his whole career to date?

Jerry G. Fossum focuses on MOSFET, Electrical engineering, Silicon on insulator, Optoelectronics and CMOS. The study incorporates disciplines such as Threshold voltage, Subthreshold conduction, Electronic circuit and Electronic engineering in addition to MOSFET. His study in the field of Field-effect transistor, Voltage and Depletion region is also linked to topics like Communication channel.

His Silicon on insulator research incorporates themes from Integrated circuit design, Very-large-scale integration, Circuit design and Low voltage. His Optoelectronics research integrates issues from Passivation and Ultra thin body. His work in CMOS addresses issues such as Logic gate, which are connected to fields such as Low-power electronics.

He most often published in these fields:

  • MOSFET (57.39%)
  • Electrical engineering (48.30%)
  • Silicon on insulator (42.05%)

What were the highlights of his more recent work (between 2008-2017)?

  • Optoelectronics (39.77%)
  • Electrical engineering (48.30%)
  • Silicon on insulator (42.05%)

In recent papers he was focusing on the following fields of study:

Jerry G. Fossum mainly investigates Optoelectronics, Electrical engineering, Silicon on insulator, MOSFET and CMOS. His study looks at the relationship between Optoelectronics and fields such as Ultra thin body, as well as how they intersect with chemical problems. His study in Field-effect transistor and Power switching falls under the purview of Electrical engineering.

His Silicon on insulator study incorporates themes from Dram, Electronic engineering and Nanotechnology. His research in MOSFET tackles topics such as Threshold voltage which are related to areas like Bipolar junction transistor. Jerry G. Fossum works mostly in the field of CMOS, limiting it down to topics relating to Logic gate and, in certain cases, Low-power electronics.

Between 2008 and 2017, his most popular works were:

  • Physical Insights on BJT-Based 1T DRAM Cells (60 citations)
  • A novel low cost 25μm thin exfoliated monocrystalline Si solar cell technology (44 citations)
  • A Simplified Superior Floating-Body/Gate DRAM Cell (28 citations)

In his most recent research, the most cited papers focused on:

  • Quantum mechanics
  • Transistor
  • Semiconductor

His primary areas of investigation include Electrical engineering, MOSFET, Silicon on insulator, Dram and CMOS. Logic gate is the focus of his Electrical engineering research. MOSFET is closely attributed to Silicon in his study.

Jerry G. Fossum combines subjects such as Nanoscopic scale, Nanotechnology, Nanoscale cmos, Engineering physics and Soi finfet with his study of Silicon on insulator. His research integrates issues of AND gate, Diode, Electronic engineering and Integrated circuit in his study of Dram. Jerry G. Fossum focuses mostly in the field of CMOS, narrowing it down to topics relating to Transistor and, in certain cases, Optoelectronics.

Best Publications

  • Threshold voltage of thin-film Silicon-on-insulator (SOI) MOSFET's

    Hyung-Kyu Lim;J.G. Fossum

  • Nanoscale FinFETs with gate-source/drain underlap

    V. Trivedi;J.G. Fossum;M.M. Chowdhury

  • Short-channel effects in SOI MOSFETs

    S. Veeraraghavan;J.G. Fossum

  • Anomalous leakage current in LPCVD PolySilicon MOSFET's

    J.G. Fossum;A. Ortiz-Conde;H. Shichijo;S.K. Banerjee

  • Analysis and control of floating-body bipolar effects in fully depleted submicrometer SOI MOSFET's

    J.-Y. Choi;J.G. Fossum

  • Analytical modeling of quantization and volume inversion in thin Si-film DG MOSFETs

    Lixin Ge;J.G. Fossum

  • Double-gate CMOS: symmetrical- versus asymmetrical-gate devices

    Keunwoo Kim;J.G. Fossum

  • A physical model for the dependence of carrier lifetime on doping density in nondegenerate silicon

    J.G. Fossum;D.S. Lee

  • Application of the superposition principle to solar-cell analysis

    F.A. Lindholm;J.G. Fossum;E.L. Burgess

  • Comparison of threshold-voltage shifts for uniaxial and biaxial tensile-stressed n-MOSFETs

    Ji-Song Lim;S.E. Thompson;J.G. Fossum

  • Quantum-mechanical effects on the threshold voltage of undoped double-gate MOSFETs

    V.P. Trivedi;J.G. Fossum

  • Carrier recombination and lifetime in highly doped silicon

    J.G. Fossum;R.P. Mertens;D.S. Lee;J.F. Nijs

  • Physical operation of back-surface-field silicon solar cells

    Unknown

  • Theory of grain-boundary and intragrain recombination currents in polysilicon p-n-junction solar cells

    J.G. Fossum;F.A. Lindholm

  • Physical insights regarding design and performance of independent-gate FinFETs

    Weimin Zhang;J.G. Fossum;L. Mathew;Yang Du

  • Suppression of corner effects in triple-gate MOSFETs

    J.G. Fossum;J.-W. Yang;V.P. Trivedi

  • Physical subthreshold MOSFET modeling applied to viable design of deep-submicrometer fully depleted SOI low-voltage CMOS technology

    Ping Chin Yeh;J.G. Fossum

  • The ballistic nanotransistor: a simulation study

    Zhibin Ren;R. Venugopal;S. Datta;M. Lundstrom

  • Scaling fully depleted SOI CMOS

    V.P. Trivedi;J.G. Fossum

  • On the threshold Voltage of strained-Si-Si/sub 1-x/Ge/sub x/ MOSFETs

    Weimin Zhang;J.G. Fossum

  • Low-voltage transient bipolar effect induced by dynamic floating-body charging in PD/SOI MOSFETs

    M.M. Pelella;J.G. Fossum;Dongwook Suh;S. Krishnan

Frequent Co-Authors

Sanjay K. Banerjee
Sanjay K. Banerjee The University of Texas at Austin
Bich-Yen Nguyen
Bich-Yen Nguyen Soitec (France)
Sorin Cristoloveanu
Sorin Cristoloveanu Grenoble Institute of Technology
Daniela Munteanu
Daniela Munteanu Aix-Marseille University
Mark Lundstrom
Mark Lundstrom Purdue University West Lafayette
Scott E. Thompson
Scott E. Thompson University of Florida
Ajeet Rohatgi
Ajeet Rohatgi Georgia Institute of Technology
Andres Cuevas
Andres Cuevas Australian National University

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