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Materials Science

D-Index
50
Citations
7601
World Ranking
10336
National Ranking
2455

Mark Holtz publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Mark Holtz sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 298 publications — 59th percentile

59% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Mark Holtz D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Mark Holtz sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 50 D-Index — 22nd percentile

22% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Mark Holtz is affiliated with Texas State University in the United States. Their research spans primarily across the fields of Engineering and Materials Science, with a focus on several subfields including Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials, Condensed Matter Physics, and Atomic and Molecular Physics, and Optics.

The main topics covered in their research include:

  • Semiconductor materials and devices
  • Diamond and Carbon-based Materials Research
  • Metal and Thin Film Mechanics
  • GaN-based semiconductor devices and materials
  • Silicon Carbide Semiconductor Technologies
  • Chalcogenide Semiconductor Thin Films
  • Quantum Dots Synthesis And Properties

Recent publications by Mark Holtz demonstrate a diverse involvement in materials science and semiconductor research. Selected works include:

  • Integration of GaN and Diamond Using Epitaxial Lateral Overgrowth (2020) published in ACS Applied Materials & Interfaces
  • Improved Electrical Properties of AlGaN/GaN High-Electron-Mobility Transistors by In Situ Tailoring the SiNx Passivation Layer (2021) published in ACS Applied Materials & Interfaces
  • Effects of post-deposition CdCl2 annealing on electronic properties of CdTe solar cells (2020) published in Solar Energy
  • Effect of seeding density on the growth of diamond films by hot-filament chemical vapor deposition from sparse to dense range (2021) published in Journal of Applied Physics
  • Effect of precursor stoichiometry on morphology, phase purity, and texture formation of hot filament CVD diamond films grown on Si (100) substrate (2020) published in Journal of Materials Science Materials in Electronics

Mark Holtz frequently publishes in the following venues:

  • Journal of Applied Physics
  • ACS Applied Materials & Interfaces
  • Journal of Materials Science
  • Solar Energy
  • Applied Physics Letters

The scientist collaborates regularly with several coauthors, notably:

  • E. L. Piner
  • Jonathan Anderson
  • K. C. Anupam
  • Anwar Siddique
  • Rony Saha

Best Publications

  • Thermal conductivity in metallic nanostructures at high temperature: Electrons, phonons, and the Wiedemann-Franz law

    N. Stojanovic;D. H. S. Maithripala;J. M. Berg;M. Holtz

  • HIGH QUALITY GAN GROWN ON SI(111) BY GAS SOURCE MOLECULAR BEAM EPITAXY WITH AMMONIA

    S. A. Nikishin;N. N. Faleev;V. G. Antipov;S. Francoeur

  • Vibrational properties of AlN grown on (111)-oriented silicon

    T. Prokofyeva;M. Seon;J. Vanbuskirk;M. Holtz

  • Structural, electrical, and terahertz transmission properties of VO2 thin films grown on c-, r-, and m-plane sapphire substrates

    Yong Zhao;Joon Hwan Lee;Yanhan Zhu;M. Nazari

  • Enhanced Signal-to-Background Ratios in Voltammetric Measurements Made at Diamond Thin-Film Electrochemical Interfaces.

    Jerzy W. Strojek;Michael C. Granger;Greg M. Swain;Tim Dallas

  • Tunable dual-band terahertz metamaterial bandpass filters

    Yanhan Zhu;Subash Vegesna;Yong Zhao;Vladimir Kuryatkov

  • Raman studies of nitrogen incorporation in GaAs1−xNx

    T. Prokofyeva;T. Sauncy;M. Seon;M. Holtz

  • Raman Spectroscopy of Carbon Materials

    JR Dennison;M. Holtz;G. Swain

  • Visible and ultraviolet Raman scattering studies of Si1−xGex alloys

    M. Holtz;W. M. Duncan;S. Zollner;R. Liu

  • Microfabrication and characterization of teflon AF-coated liquid core waveguide channels in silicon

    A. Datta;In-Yong Eom;A. Dhar;P. Kuban

  • Dependence of the stress–temperature coefficient on dislocation density in epitaxial GaN grown on α-Al2O3 and 6H–SiC substrates

    I. Ahmad;M. Holtz;N. N. Faleev;H. Temkin

  • Effect of substrate orientation on terahertz optical transmission through VO_2 thin films and application to functional antireflection coatings

    Yanhan Zhu;Yong Zhao;Mark Holtz;Zhaoyang Fan

  • Si-doped AlxGa1−xN(0.56⩽×⩽1) layers grown by molecular beam epitaxy with ammonia

    B. Borisov;V. Kuryatkov;Yu. Kudryavtsev;R. Asomoza

  • Influence of defects on structural and electrical properties of VO2 thin films

    Changhong Chen;Changhong Chen;Yong Zhao;Xuan Pan;V. Kuryatkov

  • Self-heating study of an AlGaN∕GaN-based heterostructure field-effect transistor using ultraviolet micro-Raman scattering

    I. Ahmad;V. Kasisomayajula;M. Holtz;J. M. Berg

  • AlN/AlGaInN superlattice light-emitting diodes at 280 nm

    G. Kipshidze;V. Kuryatkov;K. Zhu;B. Borisov

  • A two-stage discrete peristaltic micropump

    J.M. Berg;R. Anderson;M. Anaya;B. Lahlouh

  • AlGaInN-based ultraviolet light-emitting diodes grown on Si 111

    G. Kipshidze;V. Kuryatkov;B. Borisov;M. Holtz

  • VO2 multidomain heteroepitaxial growth and terahertz transmission modulation

    Changhong Chen;Changhong Chen;Yanhan Zhu;Yong Zhao;Joon Hwan Lee

  • High-quality AlN grown on Si(111) by gas-source molecular-beam epitaxy with ammonia

    S. A. Nikishin;V. G. Antipov;S. Francoeur;N. N. Faleev

  • Vibrational properties of AlN grown on 111 -oriented siliconPHYSICAL REVIEW B, VOLUME 63, 125313

    S. Zollner;H. Temkin;N. Faleev;S. Nikishin

Frequent Co-Authors

Henryk Temkin
Henryk Temkin Texas Tech University
Zhaoyang Fan
Zhaoyang Fan Texas Tech University
Edwin L. Piner
Edwin L. Piner Texas State University
K. Syassen
K. Syassen Max Planck Society
K. H. Ploog
K. H. Ploog National Sun Yat-sen University
Michael Wraback
Michael Wraback United States Army Research Laboratory
Yanfa Yan
Yanfa Yan University of Toledo
Samuel Graham
Samuel Graham Georgia Institute of Technology
Purnendu K. Dasgupta
Purnendu K. Dasgupta The University of Texas at Arlington

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