The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Mathieu Leroux sits on this spectrum.
This scientist: 307 publications — 61st percentile
61% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Mathieu Leroux sits on this spectrum.
This scientist: 51 D-Index — 24th percentile
24% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Mathieu Leroux is affiliated with the Centre national de la recherche scientifique (CNRS) in France. Their research is situated primarily in the field of engineering, with significant contributions across multiple specialized subfields.
Their work spans several domains, particularly:
Leroux's research topics focus largely on semiconductor materials and device physics, including:
Their recent publications include:
Leroux frequently collaborates with several researchers, including:
The main venues for their publications reflect the interdisciplinary nature of Leroux's work and include:
M. Leroux;N. Grandjean;B. Beaumont;G. Nataf
Mathieu Leroux;Nicolas Grandjean;M. Laügt;Jean Massies
N. Grandjean;B. Damilano;S. Dalmasso;M. Leroux
Eric Feltin;B. Beaumont;M. Laügt;P. de Mierry
B. Damilano;N. Grandjean;F. Semond;J. Massies
N. Grandjean;J. Massies;M. Leroux
Mathieu Leroux;Nicolas Grandjean;Jean Massies;Bernard Gil
Feng Li;Feng Li;Laurent Orosz;Olfa Kamoun;Sophie Bouchoule
Pierre Lefebvre;Jacques Allègre;Bernard Gil;Henry Mathieu
H Lahrèche;P Vennéguès;O Tottereau;M Laügt
P. Vennéguès;M. Benaissa;B. Beaumont;E. Feltin
Thierry Guillet;Meletios Mexis;J. Levrat;G. Rossbach
M Leroux;B Beaumont;N Grandjean;P Lorenzini
T. Gühne;Z. Bougrioua;P. Vennéguès;M. Leroux
N. Grandjean;J. Massies;M. Leroux
H. P. D. Schenk;M. Leroux;P. de Mierry
H. Lahrèche;M. Leroux;M. Laügt;M. Vaille
F. Semond;B. Damilano;S. Vézian;N. Grandjean
N. Antoine-Vincent;F. Natali;D. Byrne;A. Vasson
P. Vennéguès;M. Leroux;S. Dalmasso;M. Benaissa
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