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Materials Science

D-Index
60
Citations
11174
World Ranking
7164
National Ranking
420

Overview

Armin Dadgar is affiliated with Otto-von-Guericke University Magdeburg in Germany. Their research primarily spans several interrelated fields including engineering, physics and astronomy, and materials science.

The main areas of study in Dadgar's work cover the following subfields:

  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics
  • Mechanics of Materials
  • Biomedical Engineering

Key research topics explored by Dadgar include:

  • GaN-based semiconductor devices and materials
  • Acoustic Wave Resonator Technologies
  • Metal and Thin Film Mechanics
  • Advanced MEMS and NEMS Technologies
  • Semiconductor Quantum Structures and Devices
  • Semiconductor materials and devices
  • Mechanical and Optical Resonators

The scientist has contributed to several recent publications, among which notable papers include:

  • "Reliable GaN-Based THz Gunn Diodes With Side-Contact and Field-Plate Technologies" (2020), IEEE Access
  • "Sputter Epitaxy of AlN and GaN on Si(111)" (2022), physica status solidi (a)
  • "Demonstration of lateral epitaxial growth of AlN on Si (1 1 1) at low temperatures by pulsed reactive sputter epitaxy" (2021), Journal of Crystal Growth
  • "Structural properties and epitaxial relation of cubic rock salt ScxAl1−xN/ScN/Si" (2023), Journal of Applied Physics
  • "Understanding High-Energy 75-MeV Sulfur-Ion Irradiation-Induced Degradation in GaN-Based Heterostructures: The Role of the GaN Channel Layer" (2020), IEEE Transactions on Electron Devices

Dadgar's work has appeared frequently in respected publication venues such as:

  • Journal of Applied Physics
  • Applied Physics Letters
  • arXiv (Cornell University)
  • Journal of Physics D Applied Physics
  • Japanese Journal of Applied Physics

The scientist frequently collaborates with several coauthors, including:

  • A. Strittmatter
  • J. Bläsing
  • Florian Hörich
  • Gordon Schmidt
  • J. Christen

Best Publications

  • Metalorganic Chemical Vapor Phase Epitaxy of Crack-Free GaN on Si (111) Exceeding 1 µm in Thickness

    Armin Dadgar;Jürgen Bläsing;Annette Diez;Assadullah Alam

  • GaN-based optoelectronics on silicon substrates

    Alois Krost;Armin Dadgar

  • Gallium nitride vertical power devices on foreign substrates: a review and outlook

    Yuhao Zhang;Armin Dadgar;Tomás Palacios

  • Thick, crack-free blue light-emitting diodes on Si(111) using low-temperature AlN interlayers and in situ SixNy masking

    A. Dadgar;M. Poschenrieder;J. Bläsing;K. Fehse

  • Template-assisted large-scale ordered arrays of ZnO pillars for optical and piezoelectric applications.

    Hong Jin Fan;Woo Lee;Robert Hauschild;Marin Alexe

  • High Si and Ge n-type doping of GaN doping - Limits and impact on stress

    S. Fritze;A. Dadgar;H. Witte;M. Bügler

  • GaN-Based Devices on Si

    A. Krost;A. Dadgar

  • MOVPE growth of GaN on Si(1 1 1) substrates

    Armin Dadgar;M. Poschenrieder;J. Bläsing;O. Contreras

  • Arrays of vertically aligned and hexagonally arranged ZnO nanowires: a new template-directed approach

    Hong Jin Fan;Woo Lee;Roland Scholz;Armin Dadgar

  • Band gap renormalization and Burstein-Moss effect in silicon- and germanium-doped wurtzite GaN up to 10 20 cm − 3

    Martin Feneberg;Sarah Osterburg;Karsten Lange;Christian Lidig

  • GaN‐based epitaxy on silicon: stress measurements

    A. Krost;A. Dadgar;G. Strassburger;R. Clos

  • High-sheet-charge–carrier-density AlInN∕GaN field-effect transistors on Si(111)

    A. Dadgar;F. Schulze;J. Bläsing;A. Diez

  • Atomic arrangement at the AlN/Si (111) interface

    R. Liu;Fernando Ponce;A. Dadgar;A. Krost

  • Recording of cell action potentials with AlGaN∕GaN field-effect transistors

    Georg Steinhoff;Barbara Baur;Günter Wrobel;Sven Ingebrandt

  • Epitaxy of GaN on silicon—impact of symmetry and surface reconstruction

    A Dadgar;F Schulze;M Wienecke;A Gadanecz

  • The origin of stress reduction by low-temperature AlN interlayers

    J. Bläsing;A. Reiher;A. Dadgar;A. Diez

  • Growth of blue GaN LED structures on 150-mm Si(1 1 1)

    A. Dadgar;C. Hums;A. Diez;J. Bläsing

  • Reduction of stress at the initial stages of GaN growth on Si(111)

    A. Dadgar;M. Poschenrieder;A. Reiher;J. Bläsing

  • Efficient stress relief in GaN heteroepitaxy on Si(1 1 1) using low-temperature AlN interlayers

    A. Reiher;J. Bläsing;A. Dadgar;A. Diez

  • Metal-organic vapor phase epitaxy and properties of AlInN in the whole compositional range

    C. Hums;J. Bläsing;A. Dadgar;A. Diez

Frequent Co-Authors

Alois Krost
Alois Krost Otto-von-Guericke University Magdeburg
Jürgen Bläsing
Jürgen Bläsing Otto-von-Guericke University Magdeburg
Jürgen Christen
Jürgen Christen Otto-von-Guericke University Magdeburg
Dieter Bimberg
Dieter Bimberg Changchun Institute of Optics, Fine Mechanics and Physics (CIOMP)
Herbert Schumann
Herbert Schumann Technical University of Berlin
Axel Hoffmann
Axel Hoffmann University of Illinois at Urbana-Champaign
Fernando Ponce
Fernando Ponce Arizona State University
Erhard Kohn
Erhard Kohn North Carolina State University
Margit Zacharias
Margit Zacharias University of Freiburg
Hong Jin Fan
Hong Jin Fan Nanyang Technological University

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