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D-Index & Metrics

Materials Science

D-Index
61
Citations
13734
World Ranking
6769
National Ranking
1704

Leonard J. Brillson publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Leonard J. Brillson sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 430 publications — 80th percentile

80% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Leonard J. Brillson D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Leonard J. Brillson sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 61 D-Index — 48th percentile

48% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2013 - Fellow of the Materials Research Society
  • 2001 - Fellow of the American Association for the Advancement of Science (AAAS)
  • 2000 - IEEE Fellow For contributions to the understanding and control of semiconductor interfaces and electrical contacts by atomic-scale techniques.
  • 1984 - Fellow of American Physical Society (APS) Citation For contributions to the physics and chemistry of metalsemiconductor interferes which have provided insight into the electronic properties of the interfaces

Overview

Leonard J. Brillson is affiliated with The Ohio State University in the United States. Their research spans primarily the field of Materials Science, with a strong focus on Materials Chemistry, Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Condensed Matter Physics, and Renewable Energy, Sustainability and the Environment.

The topics of their work concentrate on the following areas:

  • ZnO doping and properties
  • Ga2O3 and related materials
  • Electronic and Structural Properties of Oxides
  • Semiconductor materials and devices
  • Advanced Photocatalysis Techniques
  • GaN-based semiconductor devices and materials
  • Transition Metal Oxide Nanomaterials

Brillson has authored publications in various scientific venues, with notable frequencies in:

  • Journal of materials research/Pratt's guide to venture capital sources (9 publications)
  • Journal of Applied Physics (5 publications)
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (4 publications)
  • MRS Communications (4 publications)
  • Chemistry of Materials (2 publications)

Some recent papers illustrating the scope of Brillson's work include:

  • "Strain-driven disproportionation at a correlated oxide metal-insulator transition," 2020, Physical Review B
  • "Elucidating Structural Transformations in LixV2O5 Electrochromic Thin Films by Multimodal Spectroscopies," 2020, Chemistry of Materials
  • "Deep level defects and cation sublattice disorder in ZnGeN2," 2020, Journal of Applied Physics
  • "Neutron irradiation and forming gas anneal impact on β-Ga2O3 deep level defects," 2020, Journal of Physics D Applied Physics
  • "Recovery from plasma etching-induced nitrogen vacancies in p-type gallium nitride using UV/O3 treatments," 2020, Applied Physics Letters

Frequent collaborators in Brillson's research include Griselda Bonilla, Kristen Brosnan, Coray M. Colina, Catherine Dubourdieu, and Sarah Heilshorn, each contributing to a substantial number of joint publications.

Throughout their career, Brillson has been recognized by several professional societies and holds fellowships that highlight contributions in their field:

  • Fellow of the Materials Research Society (2013)
  • Fellow of the American Association for the Advancement of Science (AAAS) (2001)
  • IEEE Fellow (2000) for contributions to the understanding and control of semiconductor interfaces and electrical contacts by atomic-scale techniques
  • Fellow of the American Physical Society (APS) (1984) for work on the physics and chemistry of metal-semiconductor interfaces providing insight into the electronic properties of the interfaces

Best Publications

  • The structure and properties of metal-semiconductor interfaces

    L.J. Brillson

  • ZnO Schottky barriers and Ohmic contacts

    Leonard J. Brillson;Yicheng Lu

  • Transition in Schottky Barrier Formation with Chemical Reactivity

    L. J. Brillson

  • Role of Near-Surface States in Ohmic-Schottky Conversion of Au Contacts to ZnO

    H. L. Mosbacker;Y. M. Strzhemechny;B. D. White;P. E. Smith

  • Self-compensation in semiconductors: the Zn-vacancy in Ga-doped ZnO

    David C. Look;K. D. Leedy;L. Vines;B. G. Svensson

  • Characterization of electronic structure and defect states of thin epitaxial BiFeO3 films by UV-visible absorption and cathodoluminescence spectroscopies

    A. J. Hauser;J. Zhang;L. Mier;R. A. Ricciardo

  • Direct observation of a two-dimensional hole gas at oxide interfaces.

    H. Lee;N. Campbell;J. Lee;T. J. Asel

  • Proton-irradiation effects on AlGaN/AlN/GaN high electron mobility transistors

    Xinwen Hu;A.P. Karmarkar;Bongim Jun;D.M. Fleetwood

  • Observation of 4H–SiC to 3C–SiC polytypic transformation during oxidation

    Robert S. Okojie;Ming Xhang;Pirouz Pirouz;Sergey Tumakha

  • Dominant effect of near-interface native point defects on ZnO Schottky barriers

    L. J. Brillson;H. L. Mosbacker;M. J. Hetzer;Y. Strzhemechny

  • Remote hydrogen plasma doping of single crystal ZnO

    Yuri M. Strzhemechny;Howard L. Mosbacker;David C. Look;Donald C. Reynolds

  • Electronic Structure of Tantalum Oxynitride Perovskite Photocatalysts

    Snjezana Balaz;Spencer H. Porter;Patrick M. Woodward;Leonard J. Brillson

  • Optical signatures of deep level defects in Ga2O3

    Hantian Gao;Shreyas Muralidharan;Nicholas Pronin;Rezaul Karim

  • Contacts to Semiconductors: Fundamentals and Technology

    Leonard J. Brillson

  • Direct observation of copper depletion and potential changes at copper indium gallium diselenide grain boundaries

    M. J. Hetzer;Y. M. Strzhemechny;M. Gao;M. A. Contreras

  • Surfaces and Interfaces of Electronic Materials

    Leonard J Brillson

  • Vacancy defect and defect cluster energetics in ion-implanted ZnO

    Yufeng Dong;Filip Tuomisto;B.G. Svensson;A.Yu. Kuznetsov

  • Electron energy loss spectroscopy and the optical properties of polymethylmethacrylate from 1 to 300 eV

    J. J. Ritsko;L. J. Brillson;R. W. Bigelow;T. J. Fabish

  • Chemical reaction and charge redistribution at metal–semiconductor interfaces

    L. J. Brillson

  • Chemically induced charge redistribution at Al-GaAs interfaces

    L.J. Brillson;R.Z. Bachrach;R.S. Bauer;J. McMenamin

Frequent Co-Authors

David C. Look
David C. Look Wright State University
Jerry M. Woodall
Jerry M. Woodall University of California, Davis
William J. Schaff
William J. Schaff Cornell University
Giorgio Margaritondo
Giorgio Margaritondo École Polytechnique Fédérale de Lausanne
Roland Kawakami
Roland Kawakami The Ohio State University
Steven A. Ringel
Steven A. Ringel The Ohio State University
Umesh K. Mishra
Umesh K. Mishra University of California, Santa Barbara
Marius Grundmann
Marius Grundmann Leipzig University
Daniel M. Fleetwood
Daniel M. Fleetwood Vanderbilt University

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