Hongyu Yu mostly deals with Conductance, Electronic engineering, Resistive random-access memory, Composite material and Thermal stability. His biological study spans a wide range of topics, including Nanotechnology, Graphene, Field-effect transistor, Raman spectroscopy and Contact resistance. The various areas that Hongyu Yu examines in his Electronic engineering study include Computer data storage, Resistive switching memory, Doping and Defect engineering.
Hongyu Yu has researched Resistive random-access memory in several fields, including Optoelectronics, Resistive switching and Line. His study in the field of Material properties, Polyurethane and Moisture also crosses realms of Solvent and Acrylate. He has included themes like Electrically conductive adhesive, Mineralogy, Electrical resistivity and conductivity and Dielectric in his Thermal stability study.
His primary areas of study are Optoelectronics, High-electron-mobility transistor, Transistor, Threshold voltage and Gallium nitride. His study in Optoelectronics is interdisciplinary in nature, drawing from both Etching, Algan gan and Passivation. The concepts of his High-electron-mobility transistor study are interwoven with issues in Wide-bandgap semiconductor, Stress, Chemical vapor deposition and Dielectric.
The Transistor study combines topics in areas such as Condensed matter physics and Graphene. As a part of the same scientific study, Hongyu Yu usually deals with the Threshold voltage, concentrating on Breakdown voltage and frequently concerns with Raman spectroscopy, Thermal stability and Schottky diode. His work investigates the relationship between Quantum tunnelling and topics such as Electronic engineering that intersect with problems in Resistive random-access memory.
Hongyu Yu mainly focuses on Optoelectronics, Threshold voltage, Passivation, High-electron-mobility transistor and Gallium nitride. His Optoelectronics research is multidisciplinary, incorporating elements of Etching, Algan gan and Transistor. His Algan gan research includes themes of Surface roughness and Modulation.
The study incorporates disciplines such as Condensed matter physics and Graphene in addition to Transistor. His study looks at the intersection of Threshold voltage and topics like Breakdown voltage with Schottky diode, Raman spectroscopy, Thermal stability, Schottky barrier and Leakage. His studies in High-electron-mobility transistor integrate themes in fields like Ohmic contact, Electronic engineering, CMOS and Gallium arsenide.
Hongyu Yu focuses on Optoelectronics, Transistor, Algan gan, Electric field and Leakage. His work deals with themes such as Etching, High-electron-mobility transistor and Threshold voltage, which intersect with Optoelectronics. His High-electron-mobility transistor study combines topics from a wide range of disciplines, such as High electron and Saturation.
His Transistor research incorporates themes from Condensed matter physics, Heterojunction and Thin-film transistor. His Algan gan study combines topics in areas such as Alloy, Composite material, Ohmic contact and Electrical resistivity and conductivity. His Leakage research integrates issues from AND gate, Breakdown voltage, Schottky barrier, Thermal stability and Graphene.
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A Low Energy Oxide‐Based Electronic Synaptic Device for Neuromorphic Visual Systems with Tolerance to Device Variation
Shimeng Yu;Bin Gao;Zheng Fang;Hongyu Yu.
Advanced Materials (2013)
Design guidelines of periodic Si nanowire arrays for solar cell application
Junshuai Li;HongYu Yu;She Mein Wong;Xiaocheng Li.
Applied Physics Letters (2009)
A neuromorphic visual system using RRAM synaptic devices with Sub-pJ energy and tolerance to variability: Experimental characterization and large-scale modeling
Shimeng Yu;Bin Gao;Zheng Fang;Hongyu Yu.
international electron devices meeting (2012)
Stochastic learning in oxide binary synaptic device for neuromorphic computing
Shimeng Yu;Shimeng Yu;Bin Gao;Zheng Fang;Hongyu Yu.
Frontiers in Neuroscience (2013)
Improvement in Reliability of Tunneling Field-Effect Transistor With p-n-i-n Structure
Wei Cao;C J Yao;G F Jiao;Daming Huang.
IEEE Transactions on Electron Devices (2011)
Physical mechanisms of endurance degradation in TMO-RRAM
B. Chen;Y. Lu;B. Gao;Y.H. Fu.
international electron devices meeting (2011)
Influence of Channel Layer Thickness on the Electrical Performances of Inkjet-Printed In-Ga-Zn Oxide Thin-Film Transistors
Ye Wang;Xiao Wei Sun;G K L Goh;H V Demir.
IEEE Transactions on Electron Devices (2011)
Low aspect-ratio hemispherical nanopit surface texturing for enhancing light absorption in crystalline Si thin film-based solar cells
Junshuai Li;HongYu Yu;Yali Li;Fei Wang.
Applied Physics Letters (2011)
Broadband absorption enhancement in randomly positioned silicon nanowire arrays for solar cell applications
Qing Guo Du;Chan Hin Kam;Hilmi Volkan Demir;Hong Yu Yu.
Optics Letters (2011)
Thermal stability of nitrogen incorporated in HfNxOy gate dielectrics prepared by reactive sputtering
J. F. Kang;H. Y. Yu;C. Ren;M.-F. Li.
Applied Physics Letters (2004)
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