World's Best Scientists 2026 revealed!

Research.com Recognitions

  • 2012 - Fellow of the Materials Research Society
  • 2009 - ASM Fellow For scientific contributions to the understanding of how point and line defects influence the performance of ion implanted semiconductors.

Overview

Kevin S. Jones is affiliated with the University of Florida in the United States and specializes in research at the intersection of engineering and materials science. Their work predominantly focuses on semiconductor materials and devices, nanowire synthesis and applications, and advanced fabrication techniques in electronic materials.

The primary fields of study for this researcher include:

  • Engineering
  • Materials Science

Within these fields, they focus on subfields such as:

  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Electronic, Optical and Magnetic Materials
  • Biomedical Engineering
  • Polymers and Plastics

Key topics covered in their publications are:

  • Semiconductor materials and devices
  • Nanowire synthesis and applications
  • Silicon nanostructures and photoluminescence
  • Supercapacitor materials and fabrication
  • Conducting polymers and applications
  • Silicon and solar cell technologies
  • GaN-based semiconductor devices and materials

Kevin S. Jones has published in several frequent venues, including:

  • Journal of Applied Physics
  • Nano Letters
  • Journal of Power Sources
  • Applied Surface Science
  • SAE technical papers on CD-ROM/SAE technical paper series

Notable recent publications by Jones include:

  • Ultralow Voltage GaN Vacuum Nanodiodes in Air (2021) in Nano Letters
  • Fabrication and field emission properties of vertical, tapered GaN nanowires etched via phosphoric acid (2021) in Nanotechnology
  • On the rate capability of supercapacitors characterized by a constant-phase element (2021) in Journal of Power Sources
  • Wet-chemical etching of FIB lift-out TEM lamellae for damage-free analysis of 3-D nanostructures (2020) in Ultramicroscopy
  • Single step bonding of thick anodized aluminum oxide templates to silicon wafers for enhanced system-on-a-chip performance (2020) in Journal of Power Sources

Frequent co-authors collaborating with Jones include:

  • George T. Wang
  • Emily M. Turner
  • Gibson P. Scisco
  • Kirk J. Ziegler
  • Keshab Sapkota

Jones has been recognized with professional honors such as:

  • Fellow of the Materials Research Society (2012)
  • ASM Fellow (2009) for contributions related to point and line defects in ion implanted semiconductors

Best Publications

  • A systematic analysis of defects in ion-implanted silicon

    K. S. Jones;S. Prussin;E. R. Weber

  • Three-Dimensional Reconstruction of Porous LSCF Cathodes

    D. Gostovic;J. R. Smith;D. P. Kundinger;K. S. Jones

  • Ion implantation technology

    DF Downey;KS Jones;M Farley;G Ryding

  • In0.6Ga0.4As/GaAs quantum-dot infrared photodetector with operating temperature up to 260 K

    Lin Jiang;Sheng S. Li;Nien Tze Yeh;Jen Inn Chyi

  • Ambient measurements and source apportionment of fossil fuel and biomass burning black carbon in Ontario

    R.M. Healy;U. Sofowote;Y. Su;J. Debosz

  • Transient enhanced diffusion without {311} defects in low energy B + -implanted silicon

    L. H. Zhang;K. S. Jones;P. H. Chi;D. S. Simons

  • Evaluation of the relationship between cathode microstructure and electrochemical behavior for SOFCs

    J.R. Smith;A. Chen;D. Gostovic;D. Hickey

  • Effect of fluorine on the diffusion of boron in ion implanted Si

    Daniel F. Downey;Judy W. Chow;Emi Ishida;Kevin S. Jones

  • {311} defects in silicon: The source of the loops

    Jinghong Li;Kevin S. Jones

  • Direct comparison of the quantized Hall resistance in gallium arsenide and silicon.

    A. Hartland;K. Jones;J. M. Williams;B. L. Gallagher

  • SiO2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry

    D. A. Cole;J. R. Shallenberger;S. W. Novak;R. L. Moore

  • Amorphization and graphitization of single-crystal diamond — A transmission electron microscopy study

    D P Hickey;K S Jones;Robert Elliman

  • Nanostructured ion beam-modified Ge films for high capacity Li ion battery anodes

    N. G. Rudawski;B. L. Darby;B. R. Yates;K. S. Jones

  • The effect of implant energy, dose, and dynamic annealing on end‐of‐range damage in Ge+‐implanted silicon

    K. S. Jones;D. Venables

  • The Effect of Impurities on Diffusion and Activation of ion Implanted Boron in Silicon

    L. S. Robertson;R. Brindos;K. S. Jones;M. E. Law

  • Effects of hydrostatic pressure on dopant diffusion in silicon

    Heemyong Park;Kevin S. Jones;Jim A. Slinkman;Mark E. Law

  • Notch signaling reveals developmental plasticity of Pax4+ pancreatic endocrine progenitors and shunts them to a duct fate

    Amy L. Greenwood;Sui Li;Kevin Jones;Douglas A. Melton;Douglas A. Melton

  • Ion milling damage in InP and GaAs

    S. J. Pearton;U. K. Chakrabarti;A. P. Perley;K. S. Jones

  • Enhanced elimination of implantation damage upon exceeding the solid solubility

    Kevin S. Jones;S. Prussin;E. R. Weber

  • Nanostructured Ion Beam-Modified Ge Films for High Capacity Li-Ion Battery Anodes

    Nicholas G. Rudawski;Blake L. Darby;Bradley R. Yates;Robert G. Elliman

Frequent Co-Authors

Stephen J. Pearton
Stephen J. Pearton University of Florida
Robert Elliman
Robert Elliman Australian National University
Fan Ren
Fan Ren University of Florida
C. R. Abernathy
C. R. Abernathy University of Florida
Paul H. Holloway
Paul H. Holloway University of Florida
Eric D. Wachsman
Eric D. Wachsman University of Maryland, College Park
John M. Poate
John M. Poate Nokia (United States)
Brent P. Gila
Brent P. Gila University of Florida
Eicke R. Weber
Eicke R. Weber University of California, Berkeley
A. Alec Talin
A. Alec Talin Sandia National Laboratories

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