The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Eicke R. Weber sits on this spectrum.
This scientist: 573 publications — 91st percentile
91% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Eicke R. Weber sits on this spectrum.
This scientist: 78 D-Index — 77th percentile
77% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Eicke R. Weber is affiliated with the University of California, Berkeley in the United States. Their research primarily focuses on the physics and engineering of semiconductor materials and devices, with a strong emphasis on GaN-based technologies.
Their work spans main fields such as Physics and Astronomy and Engineering, with specific contributions in subfields including Condensed Matter Physics, Atomic and Molecular Physics and Optics, Electrical and Electronic Engineering, Materials Chemistry, and Mechanics of Materials.
The research topics covered by Weber include:
Recent significant publications demonstrate active engagement with cutting-edge research in semiconductor lasers and materials:
Frequent co-authors in their collaborative research efforts include:
Weber frequently publishes in venues such as Materials, Optics Express, Scientific Reports, Optical Materials Express, and Micromachines. These journals reflect the interdisciplinary nature of their work bridging materials science and optics.
The scientist has been recognized as a Fellow of the American Physical Society in 2001. This acknowledgment cited pioneering studies in semiconductor defect research, particularly focusing on the microscopic properties and gettering behavior of transition metal impurities.
Michael H. Huang;Samuel Mao;Henning Feick;Haoquan Yan
Michael H. Huang;Yiying Wu;Henning Feick;Ngan Tran
Eicke R. Weber
C. Kisielowski;J. Krüger;S. Ruvimov;T. Suski
A.A. Istratov;H. Hieslmair;E.R. Weber
K. S. Jones;S. Prussin;E. R. Weber
Arun Majumdar;Ali Shakouri;Timothy D. Sands;Peidong Yang
Rong Fan;Henning Feick;Michael Huang;Hannes Kind
G Lindström;M Ahmed;S Albergo;P Allport
R. Sauer;J. Weber;J. Stolz;E. R. Weber
Eicke R Weber;H C Liu;Robert K Willardson
M. Kaminska;Z. Liliental-Weber;E. R. Weber;T. George
W. E. Spicer;Z. Liliental-Weber;E. Weber;N. Newman;N. Newman
Andrei A. Istratov;Eicke R. Weber
E. R. Weber;H. Ennen;U. Kaufmann;J. Windscheif
A.A. Istratov;H. Hieslmair;E.R. Weber
Nancy M. Haegel;Robert Margolis;Tonio Buonassisi;David Feldman
P. Omling;E. R. Weber;L. Montelius;H. Alexander
X. Liu;A. Prasad;J. Nishio;E. R. Weber
A.A. Istratov;E.R. Weber
R.K. Willardson;Albert C. Beer;Eicke R. Weber
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