World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
55
Citations
13089
World Ranking
8508
National Ranking
2094

Eric Chason publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Eric Chason sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 224 publications — 39th percentile

39% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Eric Chason D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Eric Chason sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 55 D-Index — 34th percentile

34% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Eric Chason is affiliated with Brown University in the United States and has contributed extensively to the fields of Engineering and Materials Science. Their research primarily focuses on Electrical and Electronic Engineering, Mechanics of Materials, Electronic, Optical and Magnetic Materials, Materials Chemistry, and Aerospace Engineering.

Their work covers several specialized topics including Metal and Thin Film Mechanics, Copper Interconnects and Reliability, Semiconductor Materials and Devices, Electronic Packaging and Soldering Technologies, High-Temperature Coating Behaviors, Diamond and Carbon-based Materials Research, and 3D IC and TSV technologies.

Eric Chason has published multiple papers in a range of scientific venues. Frequent publication venues include:

  • Surface and Coatings Technology
  • SSRN Electronic Journal
  • Journal of Applied Physics
  • Journal of Electronic Materials
  • Scripta Materialia

Among their recent papers are:

  • Whisker growth under a controlled driving force: Pressure induced whisker nucleation and growth, 2020, Scripta Materialia
  • The microstructural and stress evolution in sputter deposited Ni thin films, 2021, Surface and Coatings Technology
  • A unified kinetic model for stress relaxation and recovery during and after growth interruptions in polycrystalline thin films, 2020, Acta Materialia
  • Understanding residual stress in thin films: Analyzing wafer curvature measurements for Ag, Cu, Ni, Fe, Ti, and Cr with a kinetic model, 2021, Journal of Applied Physics
  • Measurements and modeling of residual stress in sputtered TiN and ZrN: Dependence on growth rate and pressure, 2020, Surface and Coatings Technology

Eric Chason collaborates frequently with other researchers, with notable coauthors including:

  • Tong Su
  • Zhaoxia Rao
  • Piyush Jagtap
  • Gregory B. Thompson
  • Diederik Depla

Best Publications

  • Review Article: Stress in thin films and coatings: Current status, challenges, and prospects

    Grégory Abadias;Eric Chason;Jozef Keckes;Marco Sebastiani

  • Making waves: Kinetic processes controlling surface evolution during low energy ion sputtering

    Wai Lun Chan;Eric Chason

  • Origin of compressive residual stress in polycrystalline thin films.

    E. Chason;B. W. Sheldon;L. B. Freund;J. A. Floro

  • Roughening instability and evolution of the Ge(001) surface during ion sputtering.

    E Chason;TM Mayer;BK Kellerman;DT McIlroy

  • The dynamic competition between stress generation and relaxation mechanisms during coalescence of Volmer–Weber thin films

    J.A. Floro;S.J. Hearne;J.A. Hunter;P.G. Kotula

  • Spontaneous Pattern Formation on Ion Bombarded Si(001)

    Jonah Erlebacher;Michael J. Aziz;Eric Chason;Michael B. Sinclair

  • Extensions of the Stoney formula for substrate curvature to configurations with thin substrates or large deformations

    L. B. Freund;J. A. Floro;E. Chason

  • Roughening instability and ion‐induced viscous relaxation of SiO2 surfaces

    T. M. Mayer;E. Chason;A. J. Howard

  • Physical Origins of Intrinsic Stresses in Volmer–Weber Thin Films

    Jerrold A. Floro;Eric Chason;Robert C. Cammarata;David J. Srolovitz

  • Ion beams in silicon processing and characterization

    E. Chason;S. T. Picraux;J. M. Poate;J. O. Borland

  • Thin film and surface characterization by specular X-ray reflectivity

    E. Chason;T. M. Mayer

  • Stress evolution during metalorganic chemical vapor deposition of GaN

    S. Hearne;E. Chason;J. Han;J. A. Floro

  • Model for stress generated upon contact of neighboring islands on the surface of a substrate

    L. B. Freund;Eric Chason

  • Stress and Defect Control in GaN Using Low Temperature Interlayers

    Hiroshi Amano;Motoaki Iwaya;Takayuki Kashima;Maki Katsuragawa

  • Tutorial: Understanding residual stress in polycrystalline thin films through real-time measurements and physical models

    Eric Chason;Pradeep R. Guduru

  • SiGe Island Shape Transitions Induced by Elastic Repulsion

    J. A. Floro;G. A. Lucadamo;E. Chason;L. B. Freund

  • Evolution of coherent islands in Si 1 − x Ge x / Si ( 001 )

    J. A. Floro;E. Chason;L. B. Freund;R. D. Twesten

  • SiGe Coherent Islanding and Stress Relaxation in the High Mobility Regime

    J. A. Floro;E. Chason;R. D. Twesten;R. Q. Hwang

  • A kinetic analysis of residual stress evolution in polycrystalline thin films

    Eric Chason

  • Real-time stress evolution during Si 1-x Ge x heteroepitaxy: dislocations, islanding, and segregation

    J. A. Floro;E. Chason;S. R. Lee;R. D. Twesten

Frequent Co-Authors

S. T. Picraux
S. T. Picraux Los Alamos National Laboratory
Allan F. Bower
Allan F. Bower Brown University
Michael B. Sinclair
Michael B. Sinclair Sandia National Laboratories
Michael J. Aziz
Michael J. Aziz Harvard University
Vivek B. Shenoy
Vivek B. Shenoy University of Pennsylvania
Brian W. Sheldon
Brian W. Sheldon Brown University
Jonah Erlebacher
Jonah Erlebacher Johns Hopkins University
Pradeep R. Guduru
Pradeep R. Guduru Brown University
Alex V. Hamza
Alex V. Hamza Lawrence Livermore National Laboratory
David M. Follstaedt
David M. Follstaedt Sandia National Laboratories

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