The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where N. Holonyak sits on this spectrum.
This scientist: 623 publications — 93rd percentile
93% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where N. Holonyak sits on this spectrum.
This scientist: 72 D-Index — 69th percentile
69% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
N. Holonyak is affiliated with the University of Illinois at Urbana-Champaign in the United States. Their work spans multiple areas within semiconductor and materials science, focusing on the development and application of semiconductor devices.
N. Holonyak has been recognized by several scientific societies and institutions for contributions to the field. They have held prominent fellowships and memberships, including:
Additional awards include:
Holonyak's work has contributed to advancements in semiconductor technologies, particularly in light-emitting devices such as LEDs and diode lasers. The citation for the National Academy of Engineering membership references these specific developments, indicating a focus on optoelectronics within semiconductor research.
The absence of recent publication data or frequent coauthors in the available source suggests a research profile centered heavily on foundational and perhaps earlier influential contributions rather than continual recent publication output. This also reflects a science career that is well established and recognized by leading professional organizations.
W. D. Laidig;N. Holonyak;M. D. Camras;K. Hess
Unknown
Unknown
Unknown
R. Chin;N. Holonyak;G.E. Stillman;J.Y. Tang
D. G. Deppe;L. J. Guido;N. Holonyak;K. C. Hsieh
G. Walter;N. Holonyak;Milton Feng;R. Chan
J. J. Coleman;P. D. Dapkus;C. G. Kirkpatrick;M. D. Camras
N. Holonyak;W. D. Laidig;M. D. Camras;J. J. Coleman
M. Feng;N. Holonyak;G. Walter;R. Chan
R. D. Dupuis;P. D. Dapkus;Nick Holonyak;E. A. Rezek
B. T. Cunningham;L. J. Guido;J. E. Baker;J. S. R. Major
Milton Feng;N. Holonyak;W. Hafez
L. J. Guido;N. Holonyak;K. C. Hsieh;R. W. Kaliski
M. Feng;N. Holonyak;R. Chan
M. G. Craford;G. E. Stillman;J. A. Rossi;N. Holonyak
John Michael Dallesasse;N. Holonyak
K. Meehan;N. Holonyak;J. M. Brown;M. A. Nixon
H. Shichijo;R.M. Kolbas;N. Holonyak;R.D. Dupuis
R. Chin;N. Holonyak;B. A. Vojak;K. Hess
M. D. Camras;N. Holonyak;R. D. Burnham;W. Streifer
Milton Feng;N. Holonyak;H. W. Then;G. Walter
A. R. Sugg;N. Holonyak;J. E. Baker;F. A. Kish
N. Holonyak;M. Feng
Piotr Konrad Kondratko;Shun-Lien Chuang;Gabriel Walter;Theodore Chung
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