World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
53
Citations
10447
World Ranking
2420
National Ranking
935

Materials Science

D-Index
54
Citations
10978
World Ranking
8874
National Ranking
2170

James J. Coleman publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where James J. Coleman sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 505 publications — 85th percentile

85% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

James J. Coleman D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where James J. Coleman sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 53 D-Index — 66th percentile

66% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

James J. Coleman is affiliated with The University of Texas at Dallas in the United States. Their research primarily spans the fields of Engineering and Physics and Astronomy, with a particular focus on Electrical and Electronic Engineering and Atomic and Molecular Physics, and Optics.

Their work covers several main topics in photonics and related technologies. These include:

  • Photonic and Optical Devices
  • Advanced Fiber Laser Technologies
  • Advanced Fiber Optic Sensors
  • Photonic Crystals and Applications
  • Semiconductor Lasers and Optical Devices

James J. Coleman has authored publications in notable venues including:

  • Optics Express
  • IEEE Journal of Quantum Electronics

Noteworthy recent papers authored or co-authored by Coleman are:

  • Polarization-independent one-dimensional grating coupler design on hybrid silicon/LNOI platform, 2020, Optics Express
  • Scaling Challenges in High Power Photonic Crystal Surface-Emitting Lasers, 2022, IEEE Journal of Quantum Electronics

Frequently collaborating with other researchers, Coleman has worked with:

  • Weidong Zhou
  • Xinyu Ma
  • Chijie Zhuang
  • Rong Zeng
  • Akhil Kalapala

Best Publications

  • Disorder of an AlAs‐GaAs superlattice by impurity diffusion

    W. D. Laidig;N. Holonyak;M. D. Camras;K. Hess

  • GaAs photovoltaics and optoelectronics using releasable multilayer epitaxial assemblies

    Jongseung Yoon;Sungjin Jo;Sungjin Jo;Ik Su Chun;Inhwa Jung

  • Disorder of an AlAs‐GaAs superlattice by silicon implantation

    J. J. Coleman;P. D. Dapkus;C. G. Kirkpatrick;M. D. Camras

  • IR‐red GaAs‐AlAs superlattice laser monolithically integrated in a yellow‐gap cavity

    N. Holonyak;W. D. Laidig;M. D. Camras;J. J. Coleman

  • Microdisk lasers vertically coupled to output waveguides

    Seung June Choi;K. Djordjev;Sang Jun Choi;P.D. Dapkus

  • Epitaxial growth of three-dimensionally architectured optoelectronic devices

    Erik C. Nelson;Neville L. Dias;Kevin P. Bassett;Simon N. Dunham

  • Semiconductor quantum dots

    Weidong Zhou;James J. Coleman

  • Characterization of InGaAs‐GaAs strained‐layer lasers with quantum wells near the critical thickness

    K. J. Beernink;P. K. York;J. J. Coleman;R. G. Waters

  • Trap-mediated excitation of Er3+ photoluminescence in Er-implanted GaN

    S. Kim;S. J. Rhee;D. A. Turnbull;Xiuling Li

  • The incorporation of arsenic in GaN by metalorganic chemical vapor deposition

    X. Li;S. Kim;E. E. Reuter;S. G. Bishop

  • Observation of multiple Er3+ sites in Er-implanted GaN by site-selective photoluminescence excitation spectroscopy

    S. Kim;S. J. Rhee;D. A. Turnbull;E. E. Reuter

  • Two-dimensional transient simulation of an idealized high electron mobility transistor

    D.J. Widiger;I.C. Kizilyalli;K. Hess;J.J. Coleman

  • Implantation disordering of AlxGa1−xAs superlattices

    P. Gavrilovic;D. G. Deppe;K. Meehan;N. Holonyak

  • New ultrafast switching mechanism in semiconductor heterostructures

    K. Hess;T. K. Higman;M. A. Emanuel;J. J. Coleman

  • Measurement of the carrier dependence of differential gain, refractive index, and linewidth enhancement factor in strained-layer quantum well lasers

    W. Rideout;B. Yu;J. LaCourse;P. K York

  • High‐energy (Visible‐red) stimulated emission in GaAs

    B. A. Vojak;W. D. Laidig;N. Holonyak;M. D. Camras

  • InGaAs‐GaAs strained‐layer quantum well buried heterostructure lasers (λ>1 μm) by metalorganic chemical vapor deposition

    P. K. York;K. J. Beernink;G. E. Fernández;J. J. Coleman

  • A distributed feedback ridge waveguide quantum well heterostructure laser

    L.M. Miller;J.T. Verdeyen;J.J. Coleman;R.P. Bryan

  • Alloy Clustering in Al x Ga 1-x As-GaAs Quantum-Well Heterostructures

    N. Holonyak;W. D. Laidig;B. A. Vojak;K. Hess

  • Selective enhancement of 1540 nm Er3+ emission centers in Er-implanted GaN by Mg codoping

    S. Kim;S. J. Rhee;Xiuling Li;J. J. Coleman

Frequent Co-Authors

N. Holonyak
N. Holonyak University of Illinois at Urbana-Champaign
Xiuling Li
Xiuling Li University of Illinois at Urbana-Champaign
P.D. Dapkus
P.D. Dapkus University of Southern California
Robert S Averback
Robert S Averback University of Illinois at Urbana-Champaign
Ian M. Robertson
Ian M. Robertson University of Wisconsin–Madison
Xiaochun Li
Xiaochun Li University of California, Los Angeles
Kent D. Choquette
Kent D. Choquette University of Illinois at Urbana-Champaign
Robert P. H. Chang
Robert P. H. Chang Northwestern University
Richard P. Mirin
Richard P. Mirin National Institute of Standards and Technology
Ilesanmi Adesida
Ilesanmi Adesida University of Illinois at Urbana-Champaign

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Related Online Degrees & Career Pathways

For students pursuing Electronics and Electrical Engineering, exploring complementary online degrees can broaden career options. A bachelor of project management is a valuable addition, equipping graduates with skills to lead engineering projects effectively and meet industry demands for multidisciplinary expertise.

Many professionals balance work and study by enrolling in bachelor degree programs for working adults. These programs offer flexible schedules, often with accelerated formats, allowing students to gain new qualifications without interrupting their careers.

Another promising pathway is integrating technology with education through instructional design. This field focuses on creating effective e-learning materials, enabling engineers to contribute to training and development within technical industries.

Competency and skill mastery have become essential in today’s job market. Many institutions now offer competency based universities that emphasize measurable skills over traditional time-based learning. This model benefits engineering students by recognizing real-world experience alongside academic achievements.

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