What is he best known for?
The fields of study he is best known for:
- Semiconductor
- Organic chemistry
- Oxygen
The scientist’s investigation covers issues in Condensed matter physics, Thin film, Dislocation, Epitaxy and Transmission electron microscopy.
When carried out as part of a general Condensed matter physics research project, his work on Superlattice is frequently linked to work in Inverse, therefore connecting diverse disciplines of study.
The Thin film study combines topics in areas such as Crystal growth, Mineralogy, Optics and Analytical chemistry.
His Dislocation study frequently links to other fields, such as Substrate.
His studies deal with areas such as Relaxation, Chemical vapor deposition and Nucleation as well as Epitaxy.
His Transmission electron microscopy research includes themes of Crystallography and Strain.
His most cited work include:
- Orientation dependence of grain-boundary critical currents in YBa2Cu3O7- delta bicrystals (1227 citations)
- Competing relaxation mechanisms in strained layers. (613 citations)
- Cooperative growth phenomena in silicon/germanium low-temperature epitaxy (342 citations)
What are the main themes of his work throughout his whole career to date?
His scientific interests lie mostly in Condensed matter physics, Epitaxy, Thin film, Transmission electron microscopy and Silicon.
His work carried out in the field of Condensed matter physics brings together such families of science as Crystallography and Nucleation.
His Epitaxy study combines topics in areas such as Silicide, Solid solution, Optoelectronics, Germanium and Microstructure.
Francoise K. LeGoues combines subjects such as Crystal growth, Optics, Inorganic compound, Mineralogy and Alloy with his study of Thin film.
His Transmission electron microscopy study incorporates themes from Scattering, Molecular beam epitaxy, Metastability, Analytical chemistry and Substrate.
His Silicon research is multidisciplinary, incorporating perspectives in Secondary ion mass spectrometry, Impurity and Chemical vapor deposition.
He most often published in these fields:
- Condensed matter physics (33.93%)
- Epitaxy (31.25%)
- Thin film (26.79%)
What were the highlights of his more recent work (between 1992-1998)?
- Condensed matter physics (33.93%)
- Dislocation (17.86%)
- Crystallography (20.54%)
In recent papers he was focusing on the following fields of study:
Francoise K. LeGoues mainly investigates Condensed matter physics, Dislocation, Crystallography, Epitaxy and Nucleation.
The study incorporates disciplines such as Thin film and Silicon in addition to Condensed matter physics.
In his research on the topic of Dislocation, Strain is strongly related with Transmission electron microscopy.
The various areas that he examines in his Crystallography study include Electron mobility, Stress relaxation, Chemical vapor deposition and Germanium.
His Epitaxy research incorporates elements of Optoelectronics and Optics.
Francoise K. LeGoues has included themes like Chemical physics, Monolayer, Activation energy and Diffraction in his Nucleation study.
Between 1992 and 1998, his most popular works were:
- Competing relaxation mechanisms in strained layers. (613 citations)
- New approach to the growth of low dislocation relaxed SiGe material (188 citations)
- Cyclic growth of strain-relaxed islands. (185 citations)
In his most recent research, the most cited papers focused on:
- Semiconductor
- Organic chemistry
- Oxygen
His primary scientific interests are in Condensed matter physics, Epitaxy, Transmission electron microscopy, Crystallography and Dislocation.
His work deals with themes such as Lattice constant and Single crystal substrate, which intersect with Condensed matter physics.
His Transmission electron microscopy study combines topics from a wide range of disciplines, such as Stress relaxation and Strain.
Francoise K. LeGoues usually deals with Dislocation and limits it to topics linked to Substrate and Nucleation.
His Nucleation research is multidisciplinary, relying on both Monolayer and Core.
His research in Relaxation intersects with topics in Surface roughening and Tilt.
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