The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Francoise K. LeGoues sits on this spectrum.
This scientist: 157 publications — 16th percentile
16% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Francoise K. LeGoues sits on this spectrum.
This scientist: 64 D-Index — 55th percentile
55% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Francoise K. LeGoues is affiliated with IBM in the United States, contributing to research within this institution. Their work has been recognized with the Fellow of the American Physical Society (APS) award in 1998. The award citation highlights contributions to electron microscopy techniques used to understand mechanisms of strain relaxation in heteroepitaxial growth of semiconductor thin films.
LeGoues's scientific activities predominantly involve the application of microscopy methods to materials science problems, specifically in semiconductor thin films. This indicates a specialization in characterizing and analyzing the physical properties and growth processes at the microscale level in heteroepitaxial systems.
No published papers, frequent co-authors, publication venues, or book publications are listed for LeGoues, which limits detailed insight into the breadth of their publication record or collaboration network.
Their recognized work contributes to the fields of physics and materials science as evidenced by APS fellowship, which typically honors researchers in physical sciences. The specific focus on heteroepitaxial growth and strain relaxation processes suggests expertise in condensed matter physics and semiconductor technology.
D. Dimos;P. Chaudhari;J. Mannhart;F. K. LeGoues
J. Tersoff;F. K. LeGoues
Bernard S. Meyerson;Kevin J. Uram;Francoise K. LeGoues
F. K. LeGoues;B. S. Meyerson;J. F. Morar
R. Tromp;G. W. Rubloff;P. Balk;F. K. LeGoues
F. K. LeGoues;R. Rosenberg;T. Nguyen;F. Himpsel
K. Eberl;S. S. Iyer;S. Zollner;J. C. Tsang
F. K. LeGoues;B. S. Meyerson;J. F. Morar;P. D. Kirchner
M. Horn-Von Hoegen;F. K. Legoues;M. Copel;M. C. Reuter
James R. Heath;Francoise K. LeGoues
Paul S Ho;P. O. Hahn;J. W. Bartha;G. W. Rubloff
F. K. LeGoues;M. C. Reuter;J. Tersoff;M. Hammar
F. K. LeGoues;M. Copel;R. M. Tromp
A. R. Powell;S. S. Iyer;F. K. LeGoues
F. K. LeGoues;R. Rosenberg;B. S. Meyerson
M. A. Lutz;R. M. Feenstra;F. K. LeGoues;P. M. Mooney
B. S. Meyerson;F. K. LeGoues;T. N. Nguyen;D. L. Harame
M. Hammar;F.K. LeGoues;J. Tersoff;M.C. Reuter
F. K. LeGoues;V. P. Kesan;S. S. Iyer;J. Tersoff
Francoise Kolmer Legoues;Bernard Steele Meyerson
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