The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Rudolf M. Tromp sits on this spectrum.
This scientist: 265 publications — 51st percentile
51% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Rudolf M. Tromp sits on this spectrum.
This scientist: 76 D-Index — 75th percentile
75% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Rudolf M. Tromp is affiliated with IBM in the United States. Their research focuses primarily on materials science and biochemistry, genetics, and molecular biology. Within these fields, their work delves into subfields such as materials chemistry, surfaces, coatings and films, structural biology, electrical and electronic engineering, and atomic and molecular physics and optics.
Their research topics include electron and X-ray spectroscopy techniques, advanced electron microscopy techniques and applications, graphene research and applications, 2D materials and applications, advancements in photolithography techniques, surface and thin film phenomena, and integrated circuits and semiconductor failure analysis.
Frequent co-authors in their work include Sense Jan van der Molen, Thomas Juffmann, Peter S. Neu, E. E. Krasovskii, and W. G. Stam.
Rudolf M. Tromp has published extensively in several venues, with multiple articles in Ultramicroscopy. Other common publication venues include Physical Review B, APL Materials, arXiv (Cornell University), and ACS Applied Materials & Interfaces.
Their contributions to nanoscale characterization methods and their applications in materials science have been formally recognized. This includes election as a Member of the National Academy of Engineering in 2020, specifically for contributions to the development and commercialization of nanoscale characterization techniques. They were also named a Fellow of the Materials Research Society in 2009 and received the MRS Medal in 1995 for pioneering experiments related to atomic structure, surface stress, and surfactants in heteroepitaxial growth.
Xuesong Li;Carl W. Magnuson;Archana Venugopal;Rudolf M. Tromp
R. J. Hamers;R. M. Tromp;J. E. Demuth
M. Copel;M. C. Reuter;Efthimios Kaxiras;R. M. Tromp
Hamers Rj;Tromp Rm;Demuth Je
R. J. Hamers;R. M. Tromp;J. E. Demuth
J. B. Hannon;S. Kodambaka;F. M. Ross;R. M. Tromp
J. Tersoff;R. M. Tromp
Frank-J. Meyer zu Heringdorf;M. C. Reuter;R. M. Tromp
MJ Williamson;RM Tromp;Philippe Vereecken;R Hull
F. M. Ross;J. Tersoff;R. M. Tromp
R. M. Tromp;R. J. Hamers;J. E. Demuth
F. M. Ross;R. M. Tromp;M. C. Reuter
J. Tersoff;A. W. Denier van der Gon;R. M. Tromp
R. Tromp;G. W. Rubloff;P. Balk;F. K. LeGoues
M. Copel;M. C. Reuter;M. Horn von Hoegen;R. M. Tromp
R.J. Hamers;R.M. Tromp;J.E. Demuth
M. Horn-Von Hoegen;F. K. Legoues;M. Copel;M. C. Reuter
F. K. LeGoues;M. C. Reuter;J. Tersoff;M. Hammar
E. J. van Loenen;J. E. Demuth;R. M. Tromp;R. J. Hamers
R. M. Tromp;M. C. Reuter
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