What is he best known for?
The fields of study he is best known for:
- Optics
- Semiconductor
- Organic chemistry
Rudolf M. Tromp mostly deals with Nanotechnology, Epitaxy, Condensed matter physics, Optics and Crystal growth.
His Nanotechnology research includes elements of Catalysis and Diffusion.
Rudolf M. Tromp has researched Epitaxy in several fields, including Chemical physics and Relaxation.
His research integrates issues of Instability, Transmission electron microscopy, Island growth and Nucleation in his study of Condensed matter physics.
His Optics study incorporates themes from Surface diffusion, Molecular physics, Dimer and Scanning tunneling microscope.
His biological study spans a wide range of topics, including Thin film, Monolayer, Heterojunction and Germanium.
His most cited work include:
- Large-Area Graphene Single Crystals Grown by Low-Pressure Chemical Vapor Deposition of Methane on Copper (994 citations)
- Surfactants in epitaxial growth. (875 citations)
- The influence of the surface migration of gold on the growth of silicon nanowires (737 citations)
What are the main themes of his work throughout his whole career to date?
His scientific interests lie mostly in Optics, Condensed matter physics, Epitaxy, Nanotechnology and Low-energy electron microscopy.
Rudolf M. Tromp is interested in Dislocation, which is a branch of Condensed matter physics.
His work deals with themes such as Crystallography, Crystal growth, Nucleation, Thin film and Germanium, which intersect with Epitaxy.
In his research on the topic of Nucleation, Substrate is strongly related with Chemical physics.
His Thin film research incorporates elements of Monolayer, Scattering, Pentacene and Analytical chemistry.
Rudolf M. Tromp has included themes like Optoelectronics and Annealing in his Nanotechnology study.
He most often published in these fields:
- Optics (30.32%)
- Condensed matter physics (18.55%)
- Epitaxy (18.10%)
What were the highlights of his more recent work (between 2012-2021)?
- Optics (30.32%)
- Lens (8.60%)
- Low-energy electron microscopy (19.91%)
In recent papers he was focusing on the following fields of study:
Rudolf M. Tromp mainly focuses on Optics, Lens, Low-energy electron microscopy, Electron microscope and Optoelectronics.
His study on Low-energy electron microscopy also encompasses disciplines like
- Extreme ultraviolet which intersects with area such as Tin, Nanolithography, Photon energy, Electron-beam lithography and Atomic physics,
- Resist that connect with fields like Thin film.
Wave function is closely connected to Microscope in his research, which is encompassed under the umbrella topic of Electron microscope.
His Optoelectronics study integrates concerns from other disciplines, such as Annealing, Single crystal film, Bilayer graphene, Graphene and Moiré pattern.
His research in Graphene intersects with topics in In situ, Monolayer, Condensed matter physics and Crystallite.
The study incorporates disciplines such as Carbon and Silicon, Silicene in addition to Condensed matter physics.
Between 2012 and 2021, his most popular works were:
- A new aberration-corrected, energy-filtered LEEM/PEEM instrument II. Operation and results. (55 citations)
- Single-domain epitaxial silicene on diboride thin films (15 citations)
- Temporal and lateral electron pulse compression by a compact spherical electrostatic capacitor. (10 citations)
In his most recent research, the most cited papers focused on:
- Optics
- Semiconductor
- Organic chemistry
The scientist’s investigation covers issues in Optics, Low-energy electron microscopy, Lens, Contrast transfer function and Optoelectronics.
His study brings together the fields of Photocathode and Optics.
His work on Extreme ultraviolet expands to the thematically related Low-energy electron microscopy.
His Lens study combines topics from a wide range of disciplines, such as Electron microscope and Microscope.
Rudolf M. Tromp interconnects Diffraction, Optical axis and Microscopy in the investigation of issues within Contrast transfer function.
His Optoelectronics research incorporates themes from Resist, Nanolithography and Tin.
This overview was generated by a machine learning system which analysed the scientist’s
body of work. If you have any feedback, you can
contact us
here.
