World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
55
Citations
9889
World Ranking
3047
National Ranking
61

Jordi Suñé publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Jordi Suñé sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 330 publications — 81st percentile

81% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Jordi Suñé D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Jordi Suñé sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 55 D-Index — 70th percentile

70% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Research.com Recognitions

  • 2010 - IEEE Fellow For contributions to the understanding of gate oxide failure and reliability methodology

Overview

Jordi Suñé is affiliated with the Autonomous University of Barcelona in Spain. The primary research fields include Engineering and Neuroscience, with significant contributions in Electrical and Electronic Engineering, Cellular and Molecular Neuroscience, and Cognitive Neuroscience among other subfields.

Their scholarly work has focused extensively on Advanced Memory and Neural Computing, Ferroelectric and Negative Capacitance Devices, Neuroscience and Neural Engineering, Semiconductor materials and devices, Neural dynamics and brain function, CCD and CMOS Imaging Sensors, and stochastic dynamics and bifurcation.

Recent publications by Jordi Suñé include:

  • Hardware implementation of memristor-based artificial neural networks, 2024, Nature Communications
  • Standards for the Characterization of Endurance in Resistive Switching Devices, 2021, ACS Nano
  • On the Thermal Models for Resistive Random Access Memory Circuit Simulation, 2021, Nanomaterials
  • Memristors for Neuromorphic Circuits and Artificial Intelligence Applications, 2020, Materials
  • SPICE Implementation of the Dynamic Memdiode Model for Bipolar Resistive Switching Devices, 2022, Micromachines

Jordi Suñé frequently collaborates with researchers such as E. Miranda, Fernando Aguirre, F. Campabadal, Mireia Bargalló González, and Eszter Piros.

Common publication venues for their work include IEEE Electron Device Letters, Solid-State Electronics, Micromachines, Materials, and IEEE Transactions on Nanotechnology.

In addition to journal articles, Jordi Suñé has contributed to academic books, including a publication with Springer Nature titled Resistive Switching: Oxide Materials, Mechanisms, Devices and Operations released in 2021.

Jordi Suñé received the IEEE Fellow award in 2010 for contributions to the understanding of gate oxide failure and reliability methodology.

Best Publications

  • Recommended Methods to Study Resistive Switching Devices

    Mario Lanza;H.-S. Philip Wong;Eric Pop;Daniele Ielmini

  • Continuous analytic I-V model for surrounding-gate MOSFETs

    D. Jimenez;B. Iniguez;J. Sune;L.F. Marsal

  • On the breakdown statistics of very thin SiO2 films

    J. Suñé;I. Placencia;N. Barniol;E. Farrés

  • New physics-based analytic approach to the thin-oxide breakdown statistics

    J. Sune

  • Reliability Wearout Mechanisms in Advanced CMOS Technologies

    Alvin W. Strong;Ernest Y. Wu;Rolf-Peter Vollertsen;Jordi Sune

  • Standards for the Characterization of Endurance in Resistive Switching Devices.

    Mario Lanza;Rainer Waser;Rainer Waser;Daniele Ielmini;J. Joshua Yang

  • Power-law voltage acceleration: A key element for ultra-thin gate oxide reliability

    Ernest Y. Wu;Jordi Suñé

  • Quantum-size effects in hafnium-oxide resistive switching

    Shibing Long;Xiaojuan Lian;Carlo Cagli;Xavier Cartoixà

  • Voltage and Power-Controlled Regimes in the Progressive Unipolar RESET Transition of HfO2-Based RRAM

    Shibing Long;Luca Perniola;Carlo Cagli;Julien Buckley

  • Interplay of voltage and temperature acceleration of oxide breakdown for ultra-thin gate oxides

    Ernest Y. Wu;Jordi Suñé;Wing L. Lai;Edward J. Nowak

  • Modeling of nanoscale gate-all-around MOSFETs

    D. Jimenez;J.J. Saenz;B. Iniguez;J. Sune

  • Electron transport through broken down ultra-thin SiO2 layers in MOS devices

    Enrique Miranda;Enrique Miranda;Jordi Suñé

  • Cycle-to-Cycle Intrinsic RESET Statistics in ${ m HfO}_{2}$ -Based Unipolar RRAM Devices

    Shibing Long;Xiaojuan Lian;Tianchun Ye;Carlo Cagli

  • A Model for the Set Statistics of RRAM Inspired in the Percolation Model of Oxide Breakdown

    Shibing Long;Xiaojuan Lian;Carlo Cagli;Luca Perniola

  • Experimental evidence of T/sub BD/ power-law for voltage dependence of oxide breakdown in ultrathin gate oxides

    E.Y. Wu;A. Vayshenker;E. Nowak;J. Sune

  • Quantum-mechanical modeling of accumulation layers in MOS structure

    J. Sune;P. Olivo;B. Ricco

  • Soft breakdown conduction in ultrathin (3-5 nm) gate dielectrics

    E. Miranda;J. Sune;R. Rodriguez;M. Nafria

  • On the Weibull shape factor of intrinsic breakdown of dielectric films and its accurate experimental determination. Part II: experimental results and the effects of stress conditions

    E.Y. Wu;J. Sune;W. Lai

  • Analytic modeling of leakage current through multiple breakdown paths in SiO/sub 2/ films

    E. Miranda;J. Sune

  • Self-consistent solution of the Poisson and Schrödinger equations in accumulated semiconductor-insulator interfaces

    J. Suñé;P. Olivo;B. Riccó

Frequent Co-Authors

Enrique Miranda
Enrique Miranda Autonomous University of Barcelona
Ernest Y. Wu
Ernest Y. Wu IBM (United States)
Shibing Long
Shibing Long University of Science and Technology of China
Ming Liu
Ming Liu Fudan University
Montserrat Nafría
Montserrat Nafría Autonomous University of Barcelona
Ferran Martin
Ferran Martin Autonomous University of Barcelona
Hangbing Lv
Hangbing Lv Chinese Academy of Sciences
Riccardo Rurali
Riccardo Rurali Institut de Ciència de Materials de Barcelona
Paul K. Hurley
Paul K. Hurley Tyndall National Institute
Hiroshi Iwai
Hiroshi Iwai Tokyo Institute of Technology

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Best Scientists Citing Jordi Suñé

Trending Scientists

Recently Published Articles