World's Best Scientists 2026 revealed!

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Materials Science

D-Index
59
Citations
13013
World Ranking
7357
National Ranking
1826

Research.com Recognitions

  • 2014 - Fellow, National Academy of Inventors
  • 1985 - Fellow of American Physical Society (APS) Citation For significant contributions to experimental condensed matter physics, especially electronic properties of graphite, its intercalation compounds, and amorphous carbon, and superconductivity of intercalated layered chalcogenides and ternary Chevrel compounds

Overview

John A. Woollam is affiliated with the University of Nebraska-Lincoln in the United States. Their recent scholarly contributions include research focused on electron transport properties under specific physical conditions.

Their latest publication is titled Electron transport properties of metallic tin in high magnetic fields and at liquid helium temperatures, published in 2024 in the venue PhDT.

  • Electron transport properties of metallic tin in high magnetic fields and at liquid helium temperatures, 2024, PhDT

The scientist's frequent publication venue is:

  • PhDT

John A. Woollam's recognized awards include:

  • Fellow, National Academy of Inventors, 2014
  • Fellow of American Physical Society (APS), 1985 - Citation for significant contributions to experimental condensed matter physics, especially electronic properties of graphite, its intercalation compounds, and amorphous carbon, and superconductivity of intercalated layered chalcogenides and ternary Chevrel compounds

Best Publications

  • Use of Raman scattering to investigate disorder and crystallite formation in as-deposited and annealed carbon films

    R. O. Dillon;John A. Woollam;V. Katkanant

  • Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation

    C. M. Herzinger;B. Johs;W. A. McGahan;John A. Woollam

  • Extension of rotating-analyzer ellipsometry to generalized ellipsometry: determination of the dielectric function tensor from uniaxial TiO 2

    Mathias Schubert;Bernd Rheinländer;John A. Woollam;Blaine Johs

  • Carrier concentration and lattice absorption in bulk and epitaxial silicon carbide determined using infrared ellipsometry

    Thomas E. Tiwald;John A. Woollam;Stefan Zollner;Jim Christiansen

  • Application of IR variable angle spectroscopic ellipsometry to the determination of free carrier concentration depth profiles

    Thomas E. Tiwald;Daniel W. Thompson;John A. Woollam;Wayne Paulson

  • Techniques for ellipsometric measurement of the thickness and optical constants of thin absorbing films

    William A. McGahan;Blaine Johs;John A. Woollam

  • Giant photoresistivity and optically controlled switching in self-assembled nanowires

    N. Kouklin;L. Menon;A. Z. Wong;Daniel W. Thompson

  • InP optical constants between 0.75 and 5.0 eV determined by variable‐angle spectroscopic ellipsometry

    C. M. Herzinger;Paul G. Snyder;B. Johs;John A. Woollam

  • Optical constants of GaxIn1−xP lattice matched to GaAs

    Mathias Schubert;V. Gottschalch;Craig M. Herzinger;Huade Yao

  • Variable angle of incidence spectroscopic ellipsometry: Application to GaAs‐AlxGa1−xAs multiple heterostructures

    Paul G. Snyder;Martin C. Rost;George H. Bu‐Abbud;John A. Woollam

  • Optical properties of bulk and thin-film SrTiO3 on Si and Pt

    Stefan Zollner;Alexander A Demkov;R. Liu;P. L. Fejes

  • Infrared switching electrochromic devices based on tungsten oxide

    E. B. Franke;E. B. Franke;C. L. Trimble;J. S. Hale;Mathias Schubert

  • Modeling AlxGa1−xAs optical constants as functions of composition

    Paul G. Snyder;John A. Woollam;Samuel A. Alterovitz;Blaine D. Johs

  • Temperature dependence of optical properties of GaAs

    Huade Yao;Paul G. Snyder;John A. Woollam

  • Positive Curvature of the H c 2 -versus- T c Boundaries in Layered Superconductors

    John A. Woollam;Robert B. Somoano;Paul O'Connor

  • Superconducting critical fields of alkali and alkaline-earth intercalates of MoS2

    John A. Woollam;Robert B. Somoano

  • Variable wavelength, variable angle ellipsometry including a sensitivities correlation test

    G.H. Bu-Abbud;N.M. Bashara;John A. Woollam

  • Determination of AlAs optical constants by variable angle spectroscopic ellipsometry and a multisample analysis

    C. M. Herzinger;H. Yao;Paul G. Snyder;F. G. Celii

  • Prospects for IR emissivity control using electrochromic structures

    Jeffrey S. Hale;John A. Woollam

  • Visible and infrared optical constants of electrochromic materials for emissivity modulation applications

    Jeffrey S. Hale;Michael DeVries;Brad Dworak;John A. Woollam

  • High-Pressure and Low-Temperature Physics

    Ching-wu Chu;John A. Woollam

Frequent Co-Authors

Mathias Schubert
Mathias Schubert University of Nebraska–Lincoln
David J. Sellmyer
David J. Sellmyer University of Nebraska–Lincoln
Hans Arwin
Hans Arwin Linköping University
Subir Sarkar
Subir Sarkar University of Oxford
Stephen Ducharme
Stephen Ducharme University of Nebraska–Lincoln
Pallab Bhattacharya
Pallab Bhattacharya University of Michigan–Ann Arbor
William J. Schaff
William J. Schaff Cornell University
Detlef Hommel
Detlef Hommel University of Wrocław
Alexander A. Demkov
Alexander A. Demkov The University of Texas at Austin
Thomas Wagner
Thomas Wagner Max Planck Institute for Chemistry

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