The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where H. Jim Fulford sits on this spectrum.
This scientist: 221 publications — 36th percentile
36% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where H. Jim Fulford sits on this spectrum.
This scientist: 50 D-Index — 60th percentile
60% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
The scientist’s investigation covers issues in Optoelectronics, Electronic engineering, Dielectric, Gate dielectric and Layer. His studies in Optoelectronics integrate themes in fields like Electrical engineering, Gate oxide and Conductor. The Electronic engineering study combines topics in areas such as Ion implantation, Oxide, Capacitance and Silicon.
His Dielectric research is multidisciplinary, incorporating elements of Substrate, Trench, Semiconductor, Composite material and Deposition. His Gate dielectric research integrates issues from High-κ dielectric, Semiconductor device, Dielectric layer and Permittivity. In the subject of general Layer, his work in Polysilicon depletion effect and Photoresist is often linked to Communication channel, thereby combining diverse domains of study.
H. Jim Fulford spends much of his time researching Optoelectronics, Layer, Substrate, Electronic engineering and Gate oxide. His work carried out in the field of Optoelectronics brings together such families of science as Semiconductor device, Gate dielectric and Electrical engineering. His Layer study integrates concerns from other disciplines, such as Oxide and Masking.
His study focuses on the intersection of Substrate and fields such as Silicon with connections in the field of Wafer and Getter. As part of one scientific family, H. Jim Fulford deals mainly with the area of Electronic engineering, narrowing it down to issues related to the Dopant, and often Annealing and Barrier layer. His work in Dielectric addresses issues such as Semiconductor, which are connected to fields such as Chemical-mechanical planarization.
H. Jim Fulford mainly focuses on Optoelectronics, Layer, Gate oxide, Electrical engineering and Gate dielectric. His Optoelectronics study combines topics in areas such as Semiconductor device, Substrate, Electronic engineering, Substrate and Conductor. He has researched Substrate in several fields, including High-κ dielectric and Silicon.
As a part of the same scientific study, H. Jim Fulford usually deals with the Gate oxide, concentrating on Oxide and frequently concerns with Doping. His is involved in several facets of Electrical engineering study, as is seen by his studies on Electrical conductor and Integrated circuit. His Gate dielectric research incorporates elements of Drain-induced barrier lowering and Dielectric.
Robert Dawson;Mark W. Michael;Basab Bandyopadhyay;H. Jim Fulford
Mark I. Gardner;H. Jim Fulford;Charles E. May;Fred Hause
Mark I. Gardner;Fred N. Hause;H. Jim Fulford
Dirk J. Wristers;H. Jim Fulford;Dim L. Kwong
H. Jim Fulford;Mark I. Gardner;Derick J. Wristers
Mark I. Gardner;H. Jim Fulford;Dim-Lee Kwong
Mark I. Gardner;H. Jim Fulford
H. Jim Fulford;Robert Dawson;Fred N. Hause;Basab Bandyopadhyay
Robert Dawson;H. Jim Fulford;Mark I. Gardner;Frederick N. Hause
Fred N. Hause;Basab Bandyopadhyay;Robert Dawson;H. Jim Fulford
Mark I. Gardner;H. Jim Fulford;Derick J. Wristers
Mark I. Gardner;Fred N. Hause;H. Jim Fulford
Mark I. Gardner;Robert Dawson;H. Jim Fulford;Frederick N. Hause
Basab Bandyopadhyay;H. Jim Fulford;Robert Dawson;Fred N. Hause
Mark I. Gardner;H. Jim Fulford;Derrick J. Wristers
H. Jim Fulford;Robert Dawson;Mark I. Gardner;Frederick N. Hause
Mark I. Gardner;H. Jim Fulford
Mark I. Gardner;Dim-Lee Kwong;H. Jim Fulford
Bradley T. Moore;Robert Dawson;H. Jim Fulford;Mark I. Gardner
Mark I. Gardner;H. Jim Fulford
Robert Dawson;Mark W. Michael;William S. Brennan;Basab Bandyopadhyay
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