Derick J. Wristers

What is he best known for?

The fields of study he is best known for:

• Semiconductor
• Transistor
• Integrated circuit

Derick J. Wristers focuses on Optoelectronics, Electronic engineering, Dopant, Transistor and Layer. His Optoelectronics study incorporates themes from Electrical engineering and Gate oxide. His work in Electronic engineering addresses subjects such as Substrate, which are connected to disciplines such as Oxide and MOSFET.

His Dopant research incorporates themes from Heating element, Gate dielectric and Dielectric. His study looks at the relationship between Transistor and fields such as Annealing, as well as how they intersect with chemical problems. His work on Polysilicon depletion effect as part of his general Layer study is frequently connected to Communication channel, thereby bridging the divide between different branches of science.

His most cited work include:

• Ultrathin oxynitride structure and process for VLSI applications (128 citations)
• Integrated circuit gate conductor which uses layered spacers to produce a graded junction (83 citations)
• Low temperature solid-phase epitaxy fabrication process for MOS devices built on strained semiconductor substrate (70 citations)

What are the main themes of his work throughout his whole career to date?

Optoelectronics, Electronic engineering, Layer, Transistor and Substrate are his primary areas of study. He interconnects Semiconductor device, Electrical engineering and Gate oxide in the investigation of issues within Optoelectronics. His Electronic engineering research incorporates elements of Substrate, Doping, Silicon, Ion implantation and Dielectric.

The study incorporates disciplines such as Electrical conductor, Oxide, Masking and MOSFET in addition to Layer. When carried out as part of a general Transistor research project, his work on Gate insulator is frequently linked to work in Fabrication, therefore connecting diverse disciplines of study. His work carried out in the field of Substrate brings together such families of science as Trench, Silicide and Insulator.

He most often published in these fields:

• Optoelectronics (83.89%)
• Electronic engineering (43.62%)
• Layer (38.26%)

What were the highlights of his more recent work (between 2001-2007)?

• Optoelectronics (83.89%)
• Transistor (37.58%)
• Semiconductor device (20.13%)

In recent papers he was focusing on the following fields of study:

His primary scientific interests are in Optoelectronics, Transistor, Semiconductor device, Electrical engineering and Semiconductor. His biological study spans a wide range of topics, including Field-effect transistor, Electronic engineering, Active layer and Gate oxide. His study brings together the fields of Layer and Electronic engineering.

The study incorporates disciplines such as Oxide, Silicon and Dielectric in addition to Layer. Nitride is closely connected to Composite number in his research, which is encompassed under the umbrella topic of Transistor. His Electrical engineering course of study focuses on Substrate and Ring oscillator and Inverter.

Between 2001 and 2007, his most popular works were:

• Low temperature solid-phase epitaxy fabrication process for MOS devices built on strained semiconductor substrate (70 citations)
• Semiconductor device with tensile strain silicon introduced by compressive material in a buried oxide layer (47 citations)
• Semiconductor device formed over a multiple thickness buried oxide layer, and methods of making same (33 citations)

In his most recent research, the most cited papers focused on:

• Semiconductor
• Integrated circuit
• Transistor

His primary areas of investigation include Optoelectronics, Semiconductor, Semiconductor device, Field effect and Halo. His Semiconductor study deals with the bigger picture of Electrical engineering. His research on Semiconductor device often connects related areas such as Electronic engineering.

In his study, Silicon is inextricably linked to Active layer, which falls within the broad field of Electronic engineering. His Silicon research is multidisciplinary, incorporating elements of Layer, Substrate and Masking. Field effect is frequently linked to Gate oxide in his study.